From maurice at stanford.edu  Wed Jan 13 11:30:01 2010
From: maurice at stanford.edu (maurice stevens)
Date: Wed, 13 Jan 2010 11:30:01 -0800
Subject: [Fwd: Fwd: SQI Invitation to Lawrence Epi Symposium 2/24-2/26 2010
  in Arizona]
Message-ID: <4B4E1F39.5050007@stanford.edu>

FYI

-------- Original Message --------
Subject: 	Fwd: SQI Invitation to Lawrence Epi Symposium 2/24-2/26 2010 
in Arizona
Date: 	Wed, 06 Jan 2010 16:21:09 -0800
From: 	Ed Myers <edmyers at stanford.edu>
To: 	maurice stevens <maurice at stanford.edu>



Maurice,

Is this something the epi community would be interested in?

Ed


>From: "Fariba Zaeni" <Fariba at siliconquest.com>
>To: <edmyers at stanford.edu>
>X-OriginalArrivalTime: 06 Jan 2010 23:49:44.0895 (UTC) 
>FILETIME=[EC46ECF0:01CA8F2A]
>
>
>Happy New Year!
>
>I would like to personally invite you to the Lawrence Symposium on 
>Epitaxy taking place on February 24-26th 2010 in Scottsdale, Arizona.
>
>Silicon Quest has worked with ASU, UC Santa Barbara, Lawrence 
>Semiconductor Research Labs, Cemat Silicon and Cornell University to 
>put this symposium together to bring you valuable information and 
>key speakers on this topic.  We hope you and your colleagues are 
>able to attend.
>
>Please see the html link in the attachment for all of the details of 
>this amazing once a year event!  Please don't hesitate to call me if 
>you have any further questions.
>
>Kind Regards,
>Len Anderson
>
>Account Representative
>Silicon Quest International, Inc.
>ISO:9001:2000 Quality Assured
>Ph (408) 496-1000 x 111
>Fx (408) 496-1133
><mailto:len at siliconquest.com>len at siliconquest.com
>  www.siliconquest.com
>
>New year 2010
>    * SQI is a full service provider and your One-Stop Shop of 
> Silicon Wafers products with many "in house" services: 2" - 12" 
> Test, Prime and Float zone wafers; in house services include, but 
> are not limited to; Thermal oxide, Backgrinding and/or Wafer 
> Thinning, Polish, Reclaim Services, Cut down and Laser 
> scribe.  Please check our website or call if you don't see it 
> listed here or on our website!  Let us help you SAVE money and time!
>    * SQI is the sole U.S. distributor of Topsil Float Zone products!
>    * SQI is the World Wide distributor of Lawrence Semiconductor 
> Research Services for Group IV Epitaxial Services!
>
>This email and all attachments contain Silicon Quest International 
>PROPRIETARY INFORMATION unless such information is specifically 
>excluded in any Non-disclosure Agreement that exists between the 
>parties.  Any such information is intended solely for the use of the 
>addressee.  If the reader of this message is not the intended 
>recipient, you are hereby notified that any reading, dissemination, 
>distribution, copying, or other use of this message or its 
>attachments is strictly prohibited.  If you have received this 
>message in error, please notify the sending immediately by email and 
>delete this message and all copies and backups thereof.
>
>
>


-- 
maurice at stanford.edu

Maurice Stevens
Stanford Nanofabrication Facility
CIS Room 142, Mail Code 4070
Stanford, CA  94305
P. (650)725-3660
F. (650)725.6278

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From slcheng at stanford.edu  Wed Jan 13 13:32:44 2010
From: slcheng at stanford.edu (Szu-Lin Cheng)
Date: Wed, 13 Jan 2010 13:32:44 -0800
Subject: EPI 2 release from 16:00 to 24:00
Message-ID: <000001ca9497$f22b7fb0$d6827f10$@edu>

Samples not ready.

Sorry for the late notice.

 

 

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From edmyers at stanford.edu  Thu Jan 14 12:27:29 2010
From: edmyers at stanford.edu (Ed Myers)
Date: Thu, 14 Jan 2010 12:27:29 -0800
Subject: Epitaxy  Pre-registration deadline!
Message-ID: <6.2.5.6.2.20100114122640.04fa75f0@stanford.edu>


>
>
>2010 LAWRENCE SYMPOSIUM ON EPITAXY
>
>February 24th (Wed.) - 26th (Fri.), 2010
>at the Millennium Resort, Scottsdale, AZ, 85253
>
>
>
>Plenary and invited speakers.
>
>John Bowers Microwave hybrid InGaAlAs-silicon photonics, UCSB
>
>Scott A Chambers, Epitaxial growth & properties of thin film oxides, 
>Pacific Northwest National Laboratory
>
>Uli Dhamen, Advances in aberration-corrected microscopy, Lawrence 
>Berkeley National Labs
>
>Russell Dupuis, Recent advances in MOCVD growth of III-N 
>semiconductors, Georgia Tech
>
>Marty Green, Si solar cell development, University of New South Wales
>
>Art Gossard, Fast photodectors, UCSB
>
>Walter de Heer, Epitaxy of graphite, graphene, & carbon nanotubes, 
>Georgia Tech
>
>David Herame, High speed silicon germanium electronics, IBM
>
>Richard King, Quest to record performance III-V tandem solar cells, Spectrolab
>
>Vladimir Matias, Critical issues in growing textured superconductors 
>on tapes, Sandia National Laboratories
>
>David Muller, Advances in aberration-corrected  microscopy, Cornell University
>
>Shuji Nakamura, LED materials fundamentals & current challenges, UCSB
>
>Frances M Ross, In-situ microscopy, IBM
>
>Lars Samuelson, Epitaxial nanowires for electronics and photonics 
>applications,  Lund University
>
>BANQUET SPEAKER, Marlene Bourne, Exciting recent advances in micro & 
>nanotechnology, Bourne Research LLC
>
>Steering Committee
>Nathan Newman (chair), Arizona State University
>Subhash Mahajan, Arizona State University
>Chris Palmstrom, U.C. Santa Barbara
>Michael Richardson, Silicon Quest International
>McDonald Robinson, Lawrence Semiconductor
>   Research Laboratory
>Darrell Schlom, Cornell University
>
>
>
>Attention: Pre-registration ends tomorrow, January 15th, 2010! If 
>you've been putting off your registration for the Lawrence Symposium 
>on Epitaxy, your time to pre-register at a reduced rate is nearly 
>gone. Take it from all of us here at Silicon Quest International - 
>register now, while there's still time!
>
>
>
>This workshop provides a forum for presentations and discussions of 
>recent developments, critical issues and potential future directions 
>in the investigation of epitaxy.  This forum will address 
>fundamental and practical challenges in materials that are used in 
>advanced photovoltaic, light emitting diodes, high power, high speed 
>digital and microwave devices.  Participation is limited to 150 
>attendees to keep it both interactive & yet comprehensive. Areas of 
>particular interest include, but not limited to:
>
>
>    * Kinetics and thermodynamics of growth
>    * Engineered precursors for MOCVD and MBE synthesis
>    * State of the Art in-situ and ex-situ Characterization Methods
>    * Integration of Dissimilar Materials
>        * Phase segregation and ordering
>        * Nucleation and coalescence
>        * Charge imbalance at hetero-interfaces and their influence 
> on morphology
>        * Origins of threading dislocations in lattice mismatched structures
>        * Dislocation reduction using novel schemes (e.g. buffer 
> layer, lateral epitaxial growth, interfacial nanoepitaxy, Si3N4 
> masks and diffusion bonding)
>        * Mechanism for establishing orientation relationships in 
> lattice-mismatched systems
>    * Epitaxial properties and influence on device behavior
>        * LEDs
>        * Photovoltaic devices
>        * High power semiconductor electronics
>        * High speed digital and microwave device
>
>
>Important deadlines
>    * Abstract:  Jan 15, 2010
>    * Student support request: Jan 15, 2010
>    * Early registration: Jan 15, 2010
>    * Hotel registration: Jan 24, 2010
>
>
>
>Website:
><http://cmpgnr.com/r.html?c=1576289&r=1574941&t=1826413416&l=1&d=91475537&u=http%3a%2f%2fwww%2easu%2eedu%2fclas%2fcsss%2fworkshops%2fls%2findex%2ehtml&g=0&f=-1>http://www.asu.edu/clas/csss/workshops/ls/index.html 
>
>
>Sponsors:
>
>Hosted
>
>
>Hosted
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>
>Hosted
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>You are subscribed as edmyers at stanford.edu. To unsubscribe please 
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><http://www.campaigner.com/?testdrive_1>
>[]
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>[]




From slcheng at stanford.edu  Thu Jan 14 17:23:56 2010
From: slcheng at stanford.edu (Szu-Lin Cheng)
Date: Thu, 14 Jan 2010 17:23:56 -0800
Subject: EPI 2 free due to flow deviaiton in DOP1
Message-ID: <001001ca9581$6a1a9fd0$3e4fdf70$@edu>

As titled.

You can find the details from Coral if you also use DOP1.

I believe the machine still works fine for depositions not related to
Arsenic or Phosphorous doping. 

 

Szulin

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From maurice at stanford.edu  Wed Jan 20 10:57:37 2010
From: maurice at stanford.edu (maurice stevens)
Date: Wed, 20 Jan 2010 10:57:37 -0800
Subject: AMAT scheduled to come in today
Message-ID: <4B575221.60009@stanford.edu>

AMAT scheduled to come in today to look at the dopant issue.

-m

-- 
maurice at stanford.edu

Maurice Stevens
Stanford Nanofabrication Facility
CIS Room 142, Mail Code 4070
Stanford, CA  94305
P. (650)725-3660
F. (650)725.6278



From maurice at stanford.edu  Wed Jan 20 15:18:16 2010
From: maurice at stanford.edu (maurice stevens)
Date: Wed, 20 Jan 2010 15:18:16 -0800
Subject: AMAT FS resolves issues
Message-ID: <4B578F38.6010208@stanford.edu>

Epi2 is back up

AMAT FS:
mixed dopant air valve replaced
both mixed dopant back pressure valves adjusted (should be 25 psi while 
flowing gas)
water flow sensor adjusted

SNF:
ran dopant flow recipe several times at different flows to check valves 
and back pressure setting
cycled from cold to hot idle several times to check water flow

-- 
maurice at stanford.edu

Maurice Stevens
Stanford Nanofabrication Facility
CIS Room 142, Mail Code 4070
Stanford, CA  94305
P. (650)725-3660
F. (650)725.6278



From maurice at stanford.edu  Wed Jan 20 15:36:39 2010
From: maurice at stanford.edu (maurice stevens)
Date: Wed, 20 Jan 2010 15:36:39 -0800
Subject: New!!  Dopant Purge Procedure
Message-ID: <4B579387.5050905@stanford.edu>

Hi All,

We (Ted Kamins, Shen, Yiwen, Serene and I) have worked on a new dopant 
purge document that should make the purging more effective, reproducible 
and reduce our gas consumption.

The document is on the table in front of Epi2 and will be on the wiki 
soon.  Please use this new procedure and let us know if you have any 
suggestions.

-m

-- 
maurice at stanford.edu

Maurice Stevens
Stanford Nanofabrication Facility
CIS Room 142, Mail Code 4070
Stanford, CA  94305
P. (650)725-3660
F. (650)725.6278



From maurice at stanford.edu  Thu Jan 28 07:17:29 2010
From: maurice at stanford.edu (maurice stevens)
Date: Thu, 28 Jan 2010 07:17:29 -0800
Subject: Epi2 update 1/28/10
Message-ID: <4B61AA89.9020305@stanford.edu>

 From Elmer:

-------- Original Message --------
Subject: 	Comment epi2 SNF 2010-01-27 17:13:38: Update HCl
Date: 	Wed, 27 Jan 2010 17:13:38 -0800
From: 	eenriquez at snf.stanford.edu
To: 	epi2-pcs at snf.stanford.edu



HCl line has a leak at the last VCR fitting before it exits the gas cabinet.  Need to plan for how we can replace this fitting.



-- 
maurice at stanford.edu

Maurice Stevens
Stanford Nanofabrication Facility
CIS Room 142, Mail Code 4070
Stanford, CA  94305
P. (650)725-3660
F. (650)725.6278