From maurice at stanford.edu Mon Apr 9 15:19:48 2012 From: maurice at stanford.edu (maurice stevens) Date: Mon, 09 Apr 2012 15:19:48 -0700 Subject: Epi2 Chamber A up! Message-ID: <4F836084.8070807@stanford.edu> Good News, We ran silicon tests this morning and they look good. No Haze and deposition rate is normal. The dopant gases are still off ( phos, arsine, diborane) until tomorrow morning. The Ge, silane, DCS and HCL are on. The system has been off for several months... so expect that you will need to recharacterize your processes. -- maurice at stanford.edu Maurice Stevens Stanford Nanofabrication Facility CIS Room 142, Mail Code 4070 Stanford, CA 94305 P. (650)725-3660 F. (650)725.6278 From rthowe at stanford.edu Mon Apr 9 18:00:07 2012 From: rthowe at stanford.edu (Roger T. Howe) Date: Mon, 09 Apr 2012 18:00:07 -0700 Subject: Epi2 Chamber A up! In-Reply-To: <4F836084.8070807@stanford.edu> References: <4F836084.8070807@stanford.edu> Message-ID: <4F838617.5020308@stanford.edu> Maurice, Great that it's back in action -- look forward to the processes being dialed in. (And, chamber B coming up!) Roger On 4/9/12 3:19 PM, maurice stevens wrote: > Good News, > > We ran silicon tests this morning and they look good. No Haze and > deposition rate is normal. > > The dopant gases are still off ( phos, arsine, diborane) until > tomorrow morning. > > The Ge, silane, DCS and HCL are on. > > The system has been off for several months... so expect that you will > need to recharacterize your processes. > > From jasonlin at stanford.edu Tue Apr 10 15:57:05 2012 From: jasonlin at stanford.edu (J. Jason Lin) Date: Tue, 10 Apr 2012 15:57:05 -0700 Subject: Epi2 silane, HCl deviation Message-ID: Deviation error for silane (during Ed's recipe), and HCl (during Ge Etch Coat). Looks like a valve's closed or out of gas? It doesn't seem usable, but not shutting it down so Ed can retrieve his wafers from LL. -------------- next part -------------- An HTML attachment was scrubbed... URL: From maurice at stanford.edu Thu Apr 12 11:24:12 2012 From: maurice at stanford.edu (maurice stevens) Date: Thu, 12 Apr 2012 11:24:12 -0700 Subject: Silane delivery tomorrow Message-ID: <4F871DCC.9090702@stanford.edu> The new bottle of Silane is scheduled for delivery tomorrow. The order was placed last week but it didn't get past purchasing until this morning. -- maurice at stanford.edu Maurice Stevens Stanford Nanofabrication Facility CIS Room 142, Mail Code 4070 Stanford, CA 94305 P. (650)725-3660 F. (650)725.6278 From maurice at stanford.edu Tue Apr 17 11:21:25 2012 From: maurice at stanford.edu (maurice stevens) Date: Tue, 17 Apr 2012 11:21:25 -0700 Subject: HCl update Message-ID: <4F8DB4A5.90101@stanford.edu> Hi All, We have been struggling with an HCl issue for the last few days. When we run the hi flow etch to clean the epi chamber we see a drop in the delivery pressure at the gas bottle. We got an fancy new auto purge gas panel for the epi HCl over the renovation shutdown. It is very nice and will make bottle changes safer. But the new gas cabinet measures the delivery pressure and shuts down the cabinet if the delivery flow is too low. We have tried reducing the trip point of the delivery pressure transducer and are waiting for the cabinet vendor to get back to us about what they believe the pressure should be with the reduced flow orifice we have. We also had to change the HCl bottle in the middle of all this (we ran the bottle down while running multiple etches and reducing the trip point). We have actually run 6 etches this morning without the HCl kicking off. Unfortunately, we are now getting a contactor/ water flow error on every etch. We are checking the water flow to the tool now. We will send an update this afternoon. -m -- maurice at stanford.edu Maurice Stevens Stanford Nanofabrication Facility CIS Room 142, Mail Code 4070 Stanford, CA 94305 P. (650)725-3660 F. (650)725.6278 From maurice at stanford.edu Wed Apr 18 15:45:18 2012 From: maurice at stanford.edu (Maurice M Stevens) Date: Wed, 18 Apr 2012 15:45:18 -0700 (PDT) Subject: epi up/siline MFC issue In-Reply-To: <1558706456.15617299.1334788984345.JavaMail.root@zm03.stanford.edu> Message-ID: <1056196955.15619178.1334789118160.JavaMail.root@zm03.stanford.edu> HCl Issue: Setpoint for hi side pressure transducer adjusted . HCl bottle changed . Contactor Issue: Step 7 time reduced from 120 sec to 100sec Step 7 time reduced from 120 sec to 100sec Step 8 temp reduced from 1100c to 950c Program is now running without waferflow/contactor error New problem: Silane MFC is not working properly. New MFC ordered. (Thanks Ed for your help on this) -m From jasonlin at stanford.edu Tue Apr 24 14:33:29 2012 From: jasonlin at stanford.edu (J. Jason Lin) Date: Tue, 24 Apr 2012 14:33:29 -0700 Subject: epi2 free now - 3am Message-ID: Sorry for late notice, didn't know about the dopant MFC problems. -------------- next part -------------- An HTML attachment was scrubbed... URL: From cachang at stanford.edu Fri Apr 27 09:26:32 2012 From: cachang at stanford.edu (Chia-Ming Chang) Date: Fri, 27 Apr 2012 09:26:32 -0700 (PDT) Subject: epi2 time slots released 10am-2pm today In-Reply-To: <1352417323.65925909.1335543956008.JavaMail.root@zm06.stanford.edu> Message-ID: <360151944.65929096.1335543992208.JavaMail.root@zm06.stanford.edu> Sorry for the late email. Wafers are not ready. From junam at stanford.edu Fri Apr 27 09:43:18 2012 From: junam at stanford.edu (Ju Hyung Nam) Date: Fri, 27 Apr 2012 09:43:18 -0700 (PDT) Subject: epi2 reservation released: 6p~12a tonight eom Message-ID: <256038248.113210497.1335544998470.JavaMail.root@zm07.stanford.edu>