Epi2 water flow/Arsine/SiH4 update
maurice at stanford.edu
Tue May 29 15:32:30 PDT 2012
The quick disconnects and the hoses were changed this morning and we now have a water flow above the minimum set point of 0.5 g/min. We have run 6 or 7 etches with no problems.
The arsine has been turned back on.
The SiH4 is also back on line.
On May 24, 2012, at 4:19 PM, maurice stevens wrote:
> Both the new water flow switch and the new quick disconnects have been ordered. We have also ordered new water hose to replaced the old cracking hose. We expect everything to arrive tomorrow.
> On 5/21/2012 10:28 AM, maurice stevens wrote:
>> We are working on few of things to resolve the contactor/water flow faults . We are replacing the cooling water flow switch, looking for a better type of quick disconnect and looking for a spot in the system to put in water filter(s).
>> The flow switch could be replaced as soon as tomorrow afternoon (we don't have a delivery date yet). That may get to the point were the system is not kicking off.
>> Our current style of quick disconnects in the various water loops in the chamber dramatically reduce the water flow and have been problematic for years. We are looking for a less restrictive design. AMAT field service is also looking for a connector different than the one they originally supplied to us.
>> Long term, we are also looking at installing water filters to reduce the amount of "gunk" that can get into the Epi's internal cooling loops and cause flow restrictions.
> maurice at stanford.edu
> Maurice Stevens
> Stanford Nanofabrication Facility
> CIS Room 142, Mail Code 4070
> Stanford, CA 94305
> P. (650)725-3660
> F. (650)725.6278
More information about the epi2