From maurice at stanford.edu Fri Mar 1 09:27:56 2013 From: maurice at stanford.edu (maurice stevens) Date: Fri, 1 Mar 2013 09:27:56 -0800 Subject: [epi2] Epi SIMS data Message-ID: Pleased see the attached SIMS data. I just got it. O2 level is significantly lower in the new chamber B. We will talk about this in the 11:00 meeting. -m Maurice Stevens Stanford Nanofabrication Facility Allen Room 145, Mail Code 4070 Stanford, CA 94305 P. (650)725-3660 F. (650)725.6278 -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: sample 2-13chamberA.xls Type: application/vnd.ms-excel Size: 241152 bytes Desc: not available URL: -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... 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URL: From tberg at stanford.edu Mon Mar 4 13:57:56 2013 From: tberg at stanford.edu (Ted Berg) Date: Mon, 04 Mar 2013 13:57:56 -0800 Subject: [epi2] Finished testing Message-ID: <513518E4.4000108@stanford.edu> Tool is available From maurice at stanford.edu Mon Mar 4 16:41:09 2013 From: maurice at stanford.edu (maurice stevens) Date: Mon, 4 Mar 2013 16:41:09 -0800 Subject: [epi2] Chamber A for Ge/Chamber B for Si Message-ID: <192422CD-20D5-4711-A3FC-807A04A22B09@stanford.edu> Hi gang, Some highlights from the users meeting last Friday: Chamber A All Ge growths in Chamber A only Low doping (B ,PH3, As ) less than 1e18 only Depositions less than 3 um SiGe with Ge above 15% Use "normal" sequence (tells machine to put wafers in Chamber A) Chamber B No Ge Thick Si depositions (in multiple runs) allowed Si or low concentration SiGe (Ge less than 15%) High doped layers (above 1e18) allowed Use "normal B" sequence (tells machine to put wafers in Chamber b) HCl We have corrected the HCl configuration. The HCl will now show the correct value and have a full scale reading of 500 sccm. I made the changes in the standard etch recipes but you will need to make the changes in any of your recipes that use HCl. Contact me if you don't understand this message or need help changing your recipes. -m Maurice Stevens Stanford Nanofabrication Facility Allen Room 145, Mail Code 4070 Stanford, CA 94305 P. (650)725-3660 F. (650)725.6278 -------------- next part -------------- An HTML attachment was scrubbed... URL: From junam at stanford.edu Tue Mar 5 05:09:12 2013 From: junam at stanford.edu (Ju Hyung Nam) Date: Tue, 5 Mar 2013 05:09:12 -0800 (PST) Subject: [epi2] epi2 free: from now to 10am Message-ID: <1429688035.18883439.1362488952280.JavaMail.root@stanford.edu> EOM From raisul at stanford.edu Tue Mar 5 19:19:33 2013 From: raisul at stanford.edu (Raisul Islam) Date: Tue, 5 Mar 2013 19:19:33 -0800 Subject: [epi2] Epi reservation released by Ju Hyung Message-ID: Hi All, user junam will not be able to run epi from 8. Since he does not have access to badger at this moment, he can not release the reservation. But if anyone wants to use it he/she can use it. Sorry for the inconvenience. -Raisul -- Raisul Islam PhD Candidate Electrical Engineering Stanford University CA - USA Ph: +1-408-708-6007 -------------- next part -------------- An HTML attachment was scrubbed... URL: From maurice at stanford.edu Tue Mar 12 16:39:02 2013 From: maurice at stanford.edu (maurice stevens) Date: Tue, 12 Mar 2013 16:39:02 -0700 Subject: [epi2] Don't modify Epi etch programs References: <17168217.41.1363129792306.JavaMail.coral@snc-coraldb.stanford.edu> Message-ID: Hey Gang, We went through a bottle of HCl in less than a week. This is an incredibly short amount of time for a bottle to last. A month is more reasonable. It turns out that someone changed the etch time in the Ge etch program in two steps from 300 sec to 1500 sec. Don't change the etch recipes without talking to staff. thanks -m Maurice Stevens Stanford Nanofabrication Facility Allen Room 145, Mail Code 4070 Stanford, CA 94305 P. (650)725-3660 F. (650)725.6278 Begin forwarded message: > From: maurice at stanford.edu > Subject: [epi2-pcs] Comment epi2 SNF 2013-03-12 16:09:51: Modified Ge Etch program > Date: March 12, 2013 4:09:52 PM PDT > To: epi2-pcs at snf.stanford.edu > > Returned time in steps 3 and 4 to 300 seconds. Someone had changed the time to 1500sec in each of the steps. > - > We went through a bottle of HCl in less than a week because of the changed time. Etch recipes changes should go through staff. > _______________________________________________ > epi2-pcs mailing list > epi2-pcs at snf.stanford.edu > http://snf.stanford.edu/mailman/listinfo/epi2-pcs -------------- next part -------------- An HTML attachment was scrubbed... URL: From maurice at stanford.edu Tue Mar 19 16:38:59 2013 From: maurice at stanford.edu (maurice stevens) Date: Tue, 19 Mar 2013 16:38:59 -0700 Subject: [epi2] Chamber B (silicon) is down Message-ID: The water pump on the scrubber for chamber B has died (no pump?no scrubber?no growths in Chamber B). Ted is locating a replacement pump. Once we have more info on timing of getting the new pump we will let you know. -m Maurice Stevens Stanford Nanofabrication Facility Allen Room 145, Mail Code 4070 Stanford, CA 94305 P. (650)725-3660 F. (650)725.6278 -------------- next part -------------- An HTML attachment was scrubbed... URL: From goebel at acorntech.com Thu Mar 21 21:49:03 2013 From: goebel at acorntech.com (Andreas Goebel) Date: Thu, 21 Mar 2013 21:49:03 -0700 Subject: [epi2] HCl 100% flow deviation Message-ID: <514BE2BF.4040203@acorntech.com> Bringing up ChA, it faulted during the GeEtch-Coat::::: Might there be a spare cylinder on site? Cheers, Andreas -- Andreas Goebel cell 650-224-2690 From maurice at stanford.edu Fri Mar 22 10:01:44 2013 From: maurice at stanford.edu (maurice stevens) Date: Fri, 22 Mar 2013 10:01:44 -0700 Subject: [epi2] Reservation policy Draft References: <3959BD30-617C-4C7A-BFF4-DD40FC0F63EC@stanford.edu> Message-ID: <5907E2F8-6BB6-4C16-A49E-8AC68ABD3E34@stanford.edu> Hi All, Please look this over and send back comments (positive and negative). > > > > Make all reservations on Chamber A in Badger. Leave a comment in process field of reservation screen telling users which chamber you want to use ( see figure below) > > > > > By clicking on a reservation a user can see the process comments ( see figure below) > > > > > > When using the tool enable the chamber that you actually use. > > > The user having the reservation (Chamber A) has priority over the gases and loading wafers. The reservation holder should try to accommodate other users on the other chamber. > (If a Ross has a 7 hour Ge run and Chia-Min wants to run a 1 hr H2 anneal in the other chamber? If Angie runs a 2 Hr undoped Si deposition and Woo-Shik 2 hr Ge?) If lab member is using both chambers then they will enable both chambers. We will be pulling chamber usage from badger and comparing it to gas usage so we need to have this as accurate as possible. We may need to adjust the amount of gas we stock (and have the vendor stock for us) if chambers used simultaneously on a regular basis. -m -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: Screen Shot 2013-03-05 at 9.47.49 AM.png Type: image/png Size: 30306 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: Screen Shot 2013-03-05 at 9.58.16 AM.png Type: image/png Size: 24240 bytes Desc: not available URL: From cachang at stanford.edu Thu Mar 28 12:34:26 2013 From: cachang at stanford.edu (Chia-Ming Chang) Date: Thu, 28 Mar 2013 12:34:26 -0700 (PDT) Subject: [epi2] epi2 time release 1:30pm-4:30pm Message-ID: <1960448679.2729832.1364499266104.JavaMail.root@stanford.edu> Samples not ready.