Problem evalign 2004-03-24 18:29:41: wafer bonded to mask

adaven at snf.stanford.edu adaven at snf.stanford.edu
Wed Mar 24 18:29:42 PST 2004

Previous message: Problem evalign 2004-03-07 23:59:58: machine locked
Next message: Problem evalign 2004-03-24 18:29:41: wafer bonded to mask
Messages sorted by: [ date ] [ thread ] [ subject ] [ author ]

wafer is bonded to mask under hard contact (500 mbar) - correct chuck pressure (0.290) still has some photoresist (1um) stuck on mask

Previous message: Problem evalign 2004-03-07 23:59:58: machine locked
Next message: Problem evalign 2004-03-24 18:29:41: wafer bonded to mask
Messages sorted by: [ date ] [ thread ] [ subject ] [ author ]

More information about the evalign-pcs mailing list