Problem evalign 2004-03-24 18:29:41: wafer bonded to mask

adaven at snf.stanford.edu adaven at snf.stanford.edu
Wed Mar 24 18:29:42 PST 2004


wafer is bonded to mask under hard contact (500 mbar) - correct chuck pressure (0.290) still has some photoresist (1um) stuck on mask




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