Comment evalign SNF 2004-11-02 22:46:51: Now the exposure is not uniform

xpxie at snf.stanford.edu xpxie at snf.stanford.edu
Tue Nov 2 22:46:52 PST 2004


Using SPR3612 and ~2 seconds exposure time on an 3-inch wafer (our usual recipe), the 2um-wide lines in the alignment markers on the left side were fully exposed while those on the the right side were not exposed at all. The uniformity of the machine might be much worse than before.




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