Comment evalign SNF 2004-09-16 18:51:05: exposure times longer for 7um resist

crichter at snf.stanford.edu crichter at snf.stanford.edu
Thu Sep 16 18:51:05 PDT 2004


A few days ago I used an exposure time of 8 seconds for resist at a nominal thickness of 7microns. Today, it takes 14.5 seconds to clear all of the resist using the 7 micron developer recipe on the svgdev track. 




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