Problem evalign SNF 2010-11-02 12:31:06: 1.0um 3612, hard cont, 1.2s
mahnaz at stanford.edu
Tue Nov 2 13:13:38 PDT 2010
If you look at the update Mario had attached to the system the intensity
reads about 11mw so at least needed about 1.7 seconds of exposure.
On 11/2/2010 12:31 PM, gyama at snf.stanford.edu wrote:
> didn't develop around edge, ~1cm.
> tried respinning twice& developing twice, still problem.
> wafers spun at same time& exposed on ASML, fine
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