Problem evalign SNF 2011-03-08 16:59:53: severe underexposure

dasgupta at snf.stanford.edu dasgupta at snf.stanford.edu
Tue Mar 8 16:59:53 PST 2011


I tested 4 wafers with 1 um resist on bare Si for various exposure times from 1.5-1.9 s, and experienced severe underexposure/residual resist on the wafer after standard development.




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