10 micron resist

Yahong Yao yy7343 at hotmail.com
Sat Aug 17 10:38:02 PDT 2002

Tze Wee,

See below website:

I am also interested in whether the EValign can resolve 2um feature with 
10um PR.  Thanks.


>From: "Chen Tze Wee" <tzewee at stanford.edu>
>To: <evalign at snf.stanford.edu>
>Subject: 10 micron resist
>Date: Fri, 16 Aug 2002 22:27:41 -0700
>Dear all,
>   Does anybody know how can I lay a 10 micron layer thick of photoresist 
>on a Si wafer?
>   I know it is not part of the standard programs, so I would appreciate 
>any tips and advise on layering the resist on, and the modifications needed 
>to develop it. Any post bake instructions will be helpful too.
>   I would also like to know if 10.0 sec of exposure under the EV is good 
>enough to resolve ~2 micron features.
>   Thanks.
>Tze Wee

Yahong Yao, Ph. D.
Staff MEMS Engineer
Intpax, Inc.
6 Results Way
Cupertino, CA 95014
Phone: (408)252-6410 x.407
Fax:   (408)252-6430

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