10 micron resist

Yahong Yao yy7343 at hotmail.com
Sat Aug 17 10:38:02 PDT 2002


Tze Wee,

See below website:
http://snf.stanford.edu/Process/Lithography/SPR220.html

I am also interested in whether the EValign can resolve 2um feature with 
10um PR.  Thanks.

Yahong


>From: "Chen Tze Wee" <tzewee at stanford.edu>
>To: <evalign at snf.stanford.edu>
>Subject: 10 micron resist
>Date: Fri, 16 Aug 2002 22:27:41 -0700
>
>Dear all,
>   Does anybody know how can I lay a 10 micron layer thick of photoresist 
>on a Si wafer?
>
>   I know it is not part of the standard programs, so I would appreciate 
>any tips and advise on layering the resist on, and the modifications needed 
>to develop it. Any post bake instructions will be helpful too.
>
>   I would also like to know if 10.0 sec of exposure under the EV is good 
>enough to resolve ~2 micron features.
>
>   Thanks.
>
>Tze Wee




----
Yahong Yao, Ph. D.
Staff MEMS Engineer
Intpax, Inc.
6 Results Way
Cupertino, CA 95014
Phone: (408)252-6410 x.407
Mobile:(408)718-8831
Fax:   (408)252-6430


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