From kevhuang at stanford.edu Thu Mar 1 17:08:15 2007 From: kevhuang at stanford.edu (Kevin Huang) Date: Thu, 1 Mar 2007 17:08:15 -0800 Subject: exposure time variation Message-ID: <93586f8c0703011708lef2591aud18b9a1d0c17e5d2@mail.gmail.com> Hi, I used to expose 1.6 um resist with 1.5 seconds but when I did it today, it was badly under-exposed. Some parts are fine but some places have resist visible to the bare eye. I checked the log and a few other people noticed under-exposure. Could anyone tell me what the exposure time is now for 1.6 um? Thanks. Kevin -- ================================== Kevin Huang Ph.D. Candidate Stanford Organic Electronics Lab Dept. of Electrical Engineering Email: kevhuang at stanford.edu Phone: (650) 725-6924 ================================== -------------- next part -------------- An HTML attachment was scrubbed... URL: