From mahnaz at stanford.edu  Fri Jan  8 11:51:27 2010
From: mahnaz at stanford.edu (Mahnaz Mansourpour)
Date: Fri, 08 Jan 2010 11:51:27 -0800
Subject: Exposure change
Message-ID: <4B478CBF.1020203@stanford.edu>



Hello all,

Due to low lamp intensity the exposure has changed a lot, you need to 
refer to the log sheet next to the tool and to help all your labmembers 
please start logging the exposure in the log sheet.
*These are huge changes so please make a note of it.*

1 um 3612 requires 1.8 seconds of exposure, I used hard contact.
1.6 um  3612 requires 2.8 to 3  seconds of exposure, I used hard contact.
 3 um 220-3  requires 4.2 to 4.5  seconds of exposure, I used hard contact.

I noticed that the right side ( flat toward me) did not perform as well 
as the rest of the wafer.

mahnaz