From rissman at snf.stanford.edu Tue Mar 2 11:29:30 2010 From: rissman at snf.stanford.edu (rissman at snf.stanford.edu) Date: Tue, 2 Mar 2010 11:29:30 -0800 Subject: Comment evg-imprint SNF 2010-03-02 11:29:29: exhaust housing Message-ID: exhaust housing replaced From rissman at snf.stanford.edu Tue Mar 2 15:24:11 2010 From: rissman at snf.stanford.edu (rissman at snf.stanford.edu) Date: Tue, 2 Mar 2010 15:24:11 -0800 Subject: Problem evg-imprint SNF 2010-03-02 15:24:10: exposure Message-ID: no longer will even expose to 1000 mJ/cm2. Crashes at ~ 50 mJ/cm2. From mahnaz at snf.stanford.edu Wed Mar 3 16:12:40 2010 From: mahnaz at snf.stanford.edu (mahnaz at snf.stanford.edu) Date: Wed, 3 Mar 2010 16:12:40 -0800 Subject: Comment evg-imprint SNF 2010-03-03 16:12:39: update from Richard Message-ID: Installed .NET Frameworks SP1 2.0 reinstalled software. No longer getting backup wrapper error but still getting exposure error. Investigated light integrater and and adjusted still seeing same issue. Sending log files to TS SD for review. Intensity was at 10mW/cm2 calibrated PS now intensity is at 14.9mW/cm2. From mahnaz at snf.stanford.edu Thu Mar 4 16:20:17 2010 From: mahnaz at snf.stanford.edu (mahnaz at snf.stanford.edu) Date: Thu, 4 Mar 2010 16:20:17 -0800 Subject: Problem evg-imprint SNF 2010-03-04 16:20:17: Message-ID: From mahnaz at snf.stanford.edu Thu Mar 4 16:26:36 2010 From: mahnaz at snf.stanford.edu (mahnaz at snf.stanford.edu) Date: Thu, 4 Mar 2010 16:26:36 -0800 Subject: Shutdown evg-imprint SNF 2010-03-04 16:26:36: Exposure failing Message-ID: Light integrator fluctuate 20% and then stops the exposure within 30 seconds Richard thinks that might be the photo diode that sits on the right site of the panel. He did put a new lamp in yesterday. He is trying to get more info from Austria. From mahnaz at snf.stanford.edu Tue Mar 9 11:26:09 2010 From: mahnaz at snf.stanford.edu (mahnaz at snf.stanford.edu) Date: Tue, 9 Mar 2010 11:26:09 -0800 Subject: Shutdown evg-imprint SNF 2010-03-04 16:26:36: Exposure failing Message-ID: System lock up during exposure. Errors encountered during exposure "CEVG_ExternalBackupWrapper::PerformedBackupFailed:Class not registered!" and "CCmdProvider_UC04-Exposure_ConstantTime [ 30 ] Failed!". Installed microsoft .Net Frameworks 2.0 SP1 and reinstalled EVG6XX software this elminated the "CEVG_ExternalBackupWrapper::PerformedBackupFailed:Class not registered!", but still getting "CCmdProvider_UC04-Exposure_ConstantTime [ 30 ] Failed!". Measured lamp temp @ 160?C, performed uniformity check and power supply calibration, still having same error. Monitored integrator value in low IO found this value fluctuating >20% possible cause for errors. Installed new lamp still having same errors. Adjusted photo diode to different positions but still experiencing same errors. For testing purposes took light integrator from another EVG620 monitored in low IO and value did not fluctuate. Installed new light integrator performed lamp intensity check and PS From mahnaz at snf.stanford.edu Tue Mar 9 11:27:48 2010 From: mahnaz at snf.stanford.edu (mahnaz at snf.stanford.edu) Date: Tue, 9 Mar 2010 11:27:48 -0800 Subject: Problem evg-imprint SNF 2010-03-04 16:20:17: Message-ID: System lock up during exposure. Errors encountered during exposure "CEVG_ExternalBackupWrapper::PerformedBackupFailed:Class not registered!" and "CCmdProvider_UC04-Exposure_ConstantTime [ 30 ] Failed!". Installed microsoft .Net Frameworks 2.0 SP1 and reinstalled EVG6XX software this elminated the "CEVG_ExternalBackupWrapper::PerformedBackupFailed:Class not registered!", but still getting "CCmdProvider_UC04-Exposure_ConstantTime [ 30 ] Failed!". Measured lamp temp @ 160?C, performed uniformity check and power supply calibration, still having same error. Monitored integrator value in low IO found this value fluctuating >20% possible cause for errors. Installed new lamp still having same errors. Adjusted photo diode to different positions but still experiencing same errors. For testing purposes took light integrator from another EVG620 monitored in low IO and value did not fluctuate. Installed new light integrator performed lamp intensity check and PS From mahnaz at snf.stanford.edu Tue Mar 9 11:28:07 2010 From: mahnaz at snf.stanford.edu (mahnaz at snf.stanford.edu) Date: Tue, 9 Mar 2010 11:28:07 -0800 Subject: Comment evg-imprint SNF 2010-03-03 16:12:39: update from Richard Message-ID: System lock up during exposure. Errors encountered during exposure "CEVG_ExternalBackupWrapper::PerformedBackupFailed:Class not registered!" and "CCmdProvider_UC04-Exposure_ConstantTime [ 30 ] Failed!". Installed microsoft .Net Frameworks 2.0 SP1 and reinstalled EVG6XX software this elminated the "CEVG_ExternalBackupWrapper::PerformedBackupFailed:Class not registered!", but still getting "CCmdProvider_UC04-Exposure_ConstantTime [ 30 ] Failed!". Measured lamp temp @ 160?C, performed uniformity check and power supply calibration, still having same error. Monitored integrator value in low IO found this value fluctuating >20% possible cause for errors. Installed new lamp still having same errors. Adjusted photo diode to different positions but still experiencing same errors. For testing purposes took light integrator from another EVG620 monitored in low IO and value did not fluctuate. Installed new light integrator performed lamp intensity check and PS From mahnaz at snf.stanford.edu Tue Mar 9 11:29:57 2010 From: mahnaz at snf.stanford.edu (mahnaz at snf.stanford.edu) Date: Tue, 9 Mar 2010 11:29:57 -0800 Subject: Problem evg-imprint SNF 2010-03-02 15:24:10: exposure Message-ID: Light integrator replaced From mahnaz at snf.stanford.edu Tue Mar 9 11:30:06 2010 From: mahnaz at snf.stanford.edu (mahnaz at snf.stanford.edu) Date: Tue, 9 Mar 2010 11:30:06 -0800 Subject: Comment evg-imprint SNF 2010-03-02 11:29:29: exhaust housing Message-ID: From mahnaz at snf.stanford.edu Tue Mar 9 11:30:24 2010 From: mahnaz at snf.stanford.edu (mahnaz at snf.stanford.edu) Date: Tue, 9 Mar 2010 11:30:24 -0800 Subject: Problem evg-imprint SNF 2010-02-19 14:35:23: software hangs up Message-ID: taken care of. From mahnaz at snf.stanford.edu Tue Mar 9 11:30:45 2010 From: mahnaz at snf.stanford.edu (mahnaz at snf.stanford.edu) Date: Tue, 9 Mar 2010 11:30:45 -0800 Subject: Problem evg-imprint SNF 2010-02-08 15:09:32: System Status 2/8/10 Message-ID: taken care of. From rissman at snf.stanford.edu Fri Mar 12 10:56:53 2010 From: rissman at snf.stanford.edu (rissman at snf.stanford.edu) Date: Fri, 12 Mar 2010 10:56:53 -0800 Subject: Comment evg-imprint SNF 2010-02-23 16:44:24: exposure dose Message-ID: From rissman at snf.stanford.edu Thu Mar 25 16:55:42 2010 From: rissman at snf.stanford.edu (rissman at snf.stanford.edu) Date: Thu, 25 Mar 2010 16:55:42 -0700 Subject: Shutdown evg-imprint SNF 2010-03-25 16:55:41: not making contact Message-ID: I suspected that the masks were not making contact with the wafers since exposures had poor resolution and the wafers and masks were not sticking. To confirm this I did a contact print on conventional photoresist at 20 mJ/cm2 and developed the wafer on track 1 with double puddle. The pattern is there, but poorly resolved. From mahnaz at snf.stanford.edu Tue Mar 30 15:09:46 2010 From: mahnaz at snf.stanford.edu (mahnaz at snf.stanford.edu) Date: Tue, 30 Mar 2010 15:09:46 -0700 Subject: Shutdown evg-imprint SNF 2010-03-25 16:55:41: not making contact Message-ID: tested the system, Paul had said that he did not think that the system making contact. The system is set up with all the NIL tooling so I had to change the mask holder and chuck. Ran one wafer with 1 um resist and left the wafer there. Looks okay. From rissman at snf.stanford.edu Tue Mar 2 11:29:30 2010 From: rissman at snf.stanford.edu (rissman at snf.stanford.edu) Date: Tue, 2 Mar 2010 11:29:30 -0800 Subject: Comment evg-imprint SNF 2010-03-02 11:29:29: exhaust housing Message-ID: exhaust housing replaced From rissman at snf.stanford.edu Tue Mar 2 15:24:11 2010 From: rissman at snf.stanford.edu (rissman at snf.stanford.edu) Date: Tue, 2 Mar 2010 15:24:11 -0800 Subject: Problem evg-imprint SNF 2010-03-02 15:24:10: exposure Message-ID: no longer will even expose to 1000 mJ/cm2. Crashes at ~ 50 mJ/cm2. From mahnaz at snf.stanford.edu Wed Mar 3 16:12:40 2010 From: mahnaz at snf.stanford.edu (mahnaz at snf.stanford.edu) Date: Wed, 3 Mar 2010 16:12:40 -0800 Subject: Comment evg-imprint SNF 2010-03-03 16:12:39: update from Richard Message-ID: Installed .NET Frameworks SP1 2.0 reinstalled software. No longer getting backup wrapper error but still getting exposure error. Investigated light integrater and and adjusted still seeing same issue. Sending log files to TS SD for review. Intensity was at 10mW/cm2 calibrated PS now intensity is at 14.9mW/cm2. From mahnaz at snf.stanford.edu Thu Mar 4 16:20:17 2010 From: mahnaz at snf.stanford.edu (mahnaz at snf.stanford.edu) Date: Thu, 4 Mar 2010 16:20:17 -0800 Subject: Problem evg-imprint SNF 2010-03-04 16:20:17: Message-ID: From mahnaz at snf.stanford.edu Thu Mar 4 16:26:36 2010 From: mahnaz at snf.stanford.edu (mahnaz at snf.stanford.edu) Date: Thu, 4 Mar 2010 16:26:36 -0800 Subject: Shutdown evg-imprint SNF 2010-03-04 16:26:36: Exposure failing Message-ID: Light integrator fluctuate 20% and then stops the exposure within 30 seconds Richard thinks that might be the photo diode that sits on the right site of the panel. He did put a new lamp in yesterday. He is trying to get more info from Austria. From mahnaz at snf.stanford.edu Tue Mar 9 11:26:09 2010 From: mahnaz at snf.stanford.edu (mahnaz at snf.stanford.edu) Date: Tue, 9 Mar 2010 11:26:09 -0800 Subject: Shutdown evg-imprint SNF 2010-03-04 16:26:36: Exposure failing Message-ID: System lock up during exposure. Errors encountered during exposure "CEVG_ExternalBackupWrapper::PerformedBackupFailed:Class not registered!" and "CCmdProvider_UC04-Exposure_ConstantTime [ 30 ] Failed!". Installed microsoft .Net Frameworks 2.0 SP1 and reinstalled EVG6XX software this elminated the "CEVG_ExternalBackupWrapper::PerformedBackupFailed:Class not registered!", but still getting "CCmdProvider_UC04-Exposure_ConstantTime [ 30 ] Failed!". Measured lamp temp @ 160?C, performed uniformity check and power supply calibration, still having same error. Monitored integrator value in low IO found this value fluctuating >20% possible cause for errors. Installed new lamp still having same errors. Adjusted photo diode to different positions but still experiencing same errors. For testing purposes took light integrator from another EVG620 monitored in low IO and value did not fluctuate. Installed new light integrator performed lamp intensity check and PS From mahnaz at snf.stanford.edu Tue Mar 9 11:27:48 2010 From: mahnaz at snf.stanford.edu (mahnaz at snf.stanford.edu) Date: Tue, 9 Mar 2010 11:27:48 -0800 Subject: Problem evg-imprint SNF 2010-03-04 16:20:17: Message-ID: System lock up during exposure. Errors encountered during exposure "CEVG_ExternalBackupWrapper::PerformedBackupFailed:Class not registered!" and "CCmdProvider_UC04-Exposure_ConstantTime [ 30 ] Failed!". Installed microsoft .Net Frameworks 2.0 SP1 and reinstalled EVG6XX software this elminated the "CEVG_ExternalBackupWrapper::PerformedBackupFailed:Class not registered!", but still getting "CCmdProvider_UC04-Exposure_ConstantTime [ 30 ] Failed!". Measured lamp temp @ 160?C, performed uniformity check and power supply calibration, still having same error. Monitored integrator value in low IO found this value fluctuating >20% possible cause for errors. Installed new lamp still having same errors. Adjusted photo diode to different positions but still experiencing same errors. For testing purposes took light integrator from another EVG620 monitored in low IO and value did not fluctuate. Installed new light integrator performed lamp intensity check and PS From mahnaz at snf.stanford.edu Tue Mar 9 11:28:07 2010 From: mahnaz at snf.stanford.edu (mahnaz at snf.stanford.edu) Date: Tue, 9 Mar 2010 11:28:07 -0800 Subject: Comment evg-imprint SNF 2010-03-03 16:12:39: update from Richard Message-ID: System lock up during exposure. Errors encountered during exposure "CEVG_ExternalBackupWrapper::PerformedBackupFailed:Class not registered!" and "CCmdProvider_UC04-Exposure_ConstantTime [ 30 ] Failed!". Installed microsoft .Net Frameworks 2.0 SP1 and reinstalled EVG6XX software this elminated the "CEVG_ExternalBackupWrapper::PerformedBackupFailed:Class not registered!", but still getting "CCmdProvider_UC04-Exposure_ConstantTime [ 30 ] Failed!". Measured lamp temp @ 160?C, performed uniformity check and power supply calibration, still having same error. Monitored integrator value in low IO found this value fluctuating >20% possible cause for errors. Installed new lamp still having same errors. Adjusted photo diode to different positions but still experiencing same errors. For testing purposes took light integrator from another EVG620 monitored in low IO and value did not fluctuate. Installed new light integrator performed lamp intensity check and PS From mahnaz at snf.stanford.edu Tue Mar 9 11:29:57 2010 From: mahnaz at snf.stanford.edu (mahnaz at snf.stanford.edu) Date: Tue, 9 Mar 2010 11:29:57 -0800 Subject: Problem evg-imprint SNF 2010-03-02 15:24:10: exposure Message-ID: Light integrator replaced From mahnaz at snf.stanford.edu Tue Mar 9 11:30:06 2010 From: mahnaz at snf.stanford.edu (mahnaz at snf.stanford.edu) Date: Tue, 9 Mar 2010 11:30:06 -0800 Subject: Comment evg-imprint SNF 2010-03-02 11:29:29: exhaust housing Message-ID: From mahnaz at snf.stanford.edu Tue Mar 9 11:30:24 2010 From: mahnaz at snf.stanford.edu (mahnaz at snf.stanford.edu) Date: Tue, 9 Mar 2010 11:30:24 -0800 Subject: Problem evg-imprint SNF 2010-02-19 14:35:23: software hangs up Message-ID: taken care of. From mahnaz at snf.stanford.edu Tue Mar 9 11:30:45 2010 From: mahnaz at snf.stanford.edu (mahnaz at snf.stanford.edu) Date: Tue, 9 Mar 2010 11:30:45 -0800 Subject: Problem evg-imprint SNF 2010-02-08 15:09:32: System Status 2/8/10 Message-ID: taken care of. From rissman at snf.stanford.edu Fri Mar 12 10:56:53 2010 From: rissman at snf.stanford.edu (rissman at snf.stanford.edu) Date: Fri, 12 Mar 2010 10:56:53 -0800 Subject: Comment evg-imprint SNF 2010-02-23 16:44:24: exposure dose Message-ID: From rissman at snf.stanford.edu Thu Mar 25 16:55:42 2010 From: rissman at snf.stanford.edu (rissman at snf.stanford.edu) Date: Thu, 25 Mar 2010 16:55:42 -0700 Subject: Shutdown evg-imprint SNF 2010-03-25 16:55:41: not making contact Message-ID: I suspected that the masks were not making contact with the wafers since exposures had poor resolution and the wafers and masks were not sticking. To confirm this I did a contact print on conventional photoresist at 20 mJ/cm2 and developed the wafer on track 1 with double puddle. The pattern is there, but poorly resolved. From mahnaz at snf.stanford.edu Tue Mar 30 15:09:46 2010 From: mahnaz at snf.stanford.edu (mahnaz at snf.stanford.edu) Date: Tue, 30 Mar 2010 15:09:46 -0700 Subject: Shutdown evg-imprint SNF 2010-03-25 16:55:41: not making contact Message-ID: tested the system, Paul had said that he did not think that the system making contact. The system is set up with all the NIL tooling so I had to change the mask holder and chuck. Ran one wafer with 1 um resist and left the wafer there. Looks okay. From rissman at snf.stanford.edu Tue Mar 2 11:29:30 2010 From: rissman at snf.stanford.edu (rissman at snf.stanford.edu) Date: Tue, 2 Mar 2010 11:29:30 -0800 Subject: Comment evg-imprint SNF 2010-03-02 11:29:29: exhaust housing Message-ID: exhaust housing replaced From rissman at snf.stanford.edu Tue Mar 2 15:24:11 2010 From: rissman at snf.stanford.edu (rissman at snf.stanford.edu) Date: Tue, 2 Mar 2010 15:24:11 -0800 Subject: Problem evg-imprint SNF 2010-03-02 15:24:10: exposure Message-ID: no longer will even expose to 1000 mJ/cm2. Crashes at ~ 50 mJ/cm2. From mahnaz at snf.stanford.edu Wed Mar 3 16:12:40 2010 From: mahnaz at snf.stanford.edu (mahnaz at snf.stanford.edu) Date: Wed, 3 Mar 2010 16:12:40 -0800 Subject: Comment evg-imprint SNF 2010-03-03 16:12:39: update from Richard Message-ID: Installed .NET Frameworks SP1 2.0 reinstalled software. No longer getting backup wrapper error but still getting exposure error. Investigated light integrater and and adjusted still seeing same issue. Sending log files to TS SD for review. Intensity was at 10mW/cm2 calibrated PS now intensity is at 14.9mW/cm2. From mahnaz at snf.stanford.edu Thu Mar 4 16:20:17 2010 From: mahnaz at snf.stanford.edu (mahnaz at snf.stanford.edu) Date: Thu, 4 Mar 2010 16:20:17 -0800 Subject: Problem evg-imprint SNF 2010-03-04 16:20:17: Message-ID: From mahnaz at snf.stanford.edu Thu Mar 4 16:26:36 2010 From: mahnaz at snf.stanford.edu (mahnaz at snf.stanford.edu) Date: Thu, 4 Mar 2010 16:26:36 -0800 Subject: Shutdown evg-imprint SNF 2010-03-04 16:26:36: Exposure failing Message-ID: Light integrator fluctuate 20% and then stops the exposure within 30 seconds Richard thinks that might be the photo diode that sits on the right site of the panel. He did put a new lamp in yesterday. He is trying to get more info from Austria. From mahnaz at snf.stanford.edu Tue Mar 9 11:26:09 2010 From: mahnaz at snf.stanford.edu (mahnaz at snf.stanford.edu) Date: Tue, 9 Mar 2010 11:26:09 -0800 Subject: Shutdown evg-imprint SNF 2010-03-04 16:26:36: Exposure failing Message-ID: System lock up during exposure. Errors encountered during exposure "CEVG_ExternalBackupWrapper::PerformedBackupFailed:Class not registered!" and "CCmdProvider_UC04-Exposure_ConstantTime [ 30 ] Failed!". Installed microsoft .Net Frameworks 2.0 SP1 and reinstalled EVG6XX software this elminated the "CEVG_ExternalBackupWrapper::PerformedBackupFailed:Class not registered!", but still getting "CCmdProvider_UC04-Exposure_ConstantTime [ 30 ] Failed!". Measured lamp temp @ 160?C, performed uniformity check and power supply calibration, still having same error. Monitored integrator value in low IO found this value fluctuating >20% possible cause for errors. Installed new lamp still having same errors. Adjusted photo diode to different positions but still experiencing same errors. For testing purposes took light integrator from another EVG620 monitored in low IO and value did not fluctuate. Installed new light integrator performed lamp intensity check and PS From mahnaz at snf.stanford.edu Tue Mar 9 11:27:48 2010 From: mahnaz at snf.stanford.edu (mahnaz at snf.stanford.edu) Date: Tue, 9 Mar 2010 11:27:48 -0800 Subject: Problem evg-imprint SNF 2010-03-04 16:20:17: Message-ID: System lock up during exposure. Errors encountered during exposure "CEVG_ExternalBackupWrapper::PerformedBackupFailed:Class not registered!" and "CCmdProvider_UC04-Exposure_ConstantTime [ 30 ] Failed!". Installed microsoft .Net Frameworks 2.0 SP1 and reinstalled EVG6XX software this elminated the "CEVG_ExternalBackupWrapper::PerformedBackupFailed:Class not registered!", but still getting "CCmdProvider_UC04-Exposure_ConstantTime [ 30 ] Failed!". Measured lamp temp @ 160?C, performed uniformity check and power supply calibration, still having same error. Monitored integrator value in low IO found this value fluctuating >20% possible cause for errors. Installed new lamp still having same errors. Adjusted photo diode to different positions but still experiencing same errors. For testing purposes took light integrator from another EVG620 monitored in low IO and value did not fluctuate. Installed new light integrator performed lamp intensity check and PS From mahnaz at snf.stanford.edu Tue Mar 9 11:28:07 2010 From: mahnaz at snf.stanford.edu (mahnaz at snf.stanford.edu) Date: Tue, 9 Mar 2010 11:28:07 -0800 Subject: Comment evg-imprint SNF 2010-03-03 16:12:39: update from Richard Message-ID: System lock up during exposure. Errors encountered during exposure "CEVG_ExternalBackupWrapper::PerformedBackupFailed:Class not registered!" and "CCmdProvider_UC04-Exposure_ConstantTime [ 30 ] Failed!". Installed microsoft .Net Frameworks 2.0 SP1 and reinstalled EVG6XX software this elminated the "CEVG_ExternalBackupWrapper::PerformedBackupFailed:Class not registered!", but still getting "CCmdProvider_UC04-Exposure_ConstantTime [ 30 ] Failed!". Measured lamp temp @ 160?C, performed uniformity check and power supply calibration, still having same error. Monitored integrator value in low IO found this value fluctuating >20% possible cause for errors. Installed new lamp still having same errors. Adjusted photo diode to different positions but still experiencing same errors. For testing purposes took light integrator from another EVG620 monitored in low IO and value did not fluctuate. Installed new light integrator performed lamp intensity check and PS From mahnaz at snf.stanford.edu Tue Mar 9 11:29:57 2010 From: mahnaz at snf.stanford.edu (mahnaz at snf.stanford.edu) Date: Tue, 9 Mar 2010 11:29:57 -0800 Subject: Problem evg-imprint SNF 2010-03-02 15:24:10: exposure Message-ID: Light integrator replaced From mahnaz at snf.stanford.edu Tue Mar 9 11:30:06 2010 From: mahnaz at snf.stanford.edu (mahnaz at snf.stanford.edu) Date: Tue, 9 Mar 2010 11:30:06 -0800 Subject: Comment evg-imprint SNF 2010-03-02 11:29:29: exhaust housing Message-ID: From mahnaz at snf.stanford.edu Tue Mar 9 11:30:24 2010 From: mahnaz at snf.stanford.edu (mahnaz at snf.stanford.edu) Date: Tue, 9 Mar 2010 11:30:24 -0800 Subject: Problem evg-imprint SNF 2010-02-19 14:35:23: software hangs up Message-ID: taken care of. From mahnaz at snf.stanford.edu Tue Mar 9 11:30:45 2010 From: mahnaz at snf.stanford.edu (mahnaz at snf.stanford.edu) Date: Tue, 9 Mar 2010 11:30:45 -0800 Subject: Problem evg-imprint SNF 2010-02-08 15:09:32: System Status 2/8/10 Message-ID: taken care of. From rissman at snf.stanford.edu Fri Mar 12 10:56:53 2010 From: rissman at snf.stanford.edu (rissman at snf.stanford.edu) Date: Fri, 12 Mar 2010 10:56:53 -0800 Subject: Comment evg-imprint SNF 2010-02-23 16:44:24: exposure dose Message-ID: From rissman at snf.stanford.edu Thu Mar 25 16:55:42 2010 From: rissman at snf.stanford.edu (rissman at snf.stanford.edu) Date: Thu, 25 Mar 2010 16:55:42 -0700 Subject: Shutdown evg-imprint SNF 2010-03-25 16:55:41: not making contact Message-ID: I suspected that the masks were not making contact with the wafers since exposures had poor resolution and the wafers and masks were not sticking. To confirm this I did a contact print on conventional photoresist at 20 mJ/cm2 and developed the wafer on track 1 with double puddle. The pattern is there, but poorly resolved. From mahnaz at snf.stanford.edu Tue Mar 30 15:09:46 2010 From: mahnaz at snf.stanford.edu (mahnaz at snf.stanford.edu) Date: Tue, 30 Mar 2010 15:09:46 -0700 Subject: Shutdown evg-imprint SNF 2010-03-25 16:55:41: not making contact Message-ID: tested the system, Paul had said that he did not think that the system making contact. The system is set up with all the NIL tooling so I had to change the mask holder and chuck. Ran one wafer with 1 um resist and left the wafer there. Looks okay. From rissman at snf.stanford.edu Tue Mar 2 11:29:30 2010 From: rissman at snf.stanford.edu (rissman at snf.stanford.edu) Date: Tue, 2 Mar 2010 11:29:30 -0800 Subject: Comment evg-imprint SNF 2010-03-02 11:29:29: exhaust housing Message-ID: exhaust housing replaced From rissman at snf.stanford.edu Tue Mar 2 15:24:11 2010 From: rissman at snf.stanford.edu (rissman at snf.stanford.edu) Date: Tue, 2 Mar 2010 15:24:11 -0800 Subject: Problem evg-imprint SNF 2010-03-02 15:24:10: exposure Message-ID: no longer will even expose to 1000 mJ/cm2. Crashes at ~ 50 mJ/cm2. From mahnaz at snf.stanford.edu Wed Mar 3 16:12:40 2010 From: mahnaz at snf.stanford.edu (mahnaz at snf.stanford.edu) Date: Wed, 3 Mar 2010 16:12:40 -0800 Subject: Comment evg-imprint SNF 2010-03-03 16:12:39: update from Richard Message-ID: Installed .NET Frameworks SP1 2.0 reinstalled software. No longer getting backup wrapper error but still getting exposure error. Investigated light integrater and and adjusted still seeing same issue. Sending log files to TS SD for review. Intensity was at 10mW/cm2 calibrated PS now intensity is at 14.9mW/cm2. From mahnaz at snf.stanford.edu Thu Mar 4 16:20:17 2010 From: mahnaz at snf.stanford.edu (mahnaz at snf.stanford.edu) Date: Thu, 4 Mar 2010 16:20:17 -0800 Subject: Problem evg-imprint SNF 2010-03-04 16:20:17: Message-ID: From mahnaz at snf.stanford.edu Thu Mar 4 16:26:36 2010 From: mahnaz at snf.stanford.edu (mahnaz at snf.stanford.edu) Date: Thu, 4 Mar 2010 16:26:36 -0800 Subject: Shutdown evg-imprint SNF 2010-03-04 16:26:36: Exposure failing Message-ID: Light integrator fluctuate 20% and then stops the exposure within 30 seconds Richard thinks that might be the photo diode that sits on the right site of the panel. He did put a new lamp in yesterday. He is trying to get more info from Austria. From mahnaz at snf.stanford.edu Tue Mar 9 11:26:09 2010 From: mahnaz at snf.stanford.edu (mahnaz at snf.stanford.edu) Date: Tue, 9 Mar 2010 11:26:09 -0800 Subject: Shutdown evg-imprint SNF 2010-03-04 16:26:36: Exposure failing Message-ID: System lock up during exposure. Errors encountered during exposure "CEVG_ExternalBackupWrapper::PerformedBackupFailed:Class not registered!" and "CCmdProvider_UC04-Exposure_ConstantTime [ 30 ] Failed!". Installed microsoft .Net Frameworks 2.0 SP1 and reinstalled EVG6XX software this elminated the "CEVG_ExternalBackupWrapper::PerformedBackupFailed:Class not registered!", but still getting "CCmdProvider_UC04-Exposure_ConstantTime [ 30 ] Failed!". Measured lamp temp @ 160?C, performed uniformity check and power supply calibration, still having same error. Monitored integrator value in low IO found this value fluctuating >20% possible cause for errors. Installed new lamp still having same errors. Adjusted photo diode to different positions but still experiencing same errors. For testing purposes took light integrator from another EVG620 monitored in low IO and value did not fluctuate. Installed new light integrator performed lamp intensity check and PS From mahnaz at snf.stanford.edu Tue Mar 9 11:27:48 2010 From: mahnaz at snf.stanford.edu (mahnaz at snf.stanford.edu) Date: Tue, 9 Mar 2010 11:27:48 -0800 Subject: Problem evg-imprint SNF 2010-03-04 16:20:17: Message-ID: System lock up during exposure. Errors encountered during exposure "CEVG_ExternalBackupWrapper::PerformedBackupFailed:Class not registered!" and "CCmdProvider_UC04-Exposure_ConstantTime [ 30 ] Failed!". Installed microsoft .Net Frameworks 2.0 SP1 and reinstalled EVG6XX software this elminated the "CEVG_ExternalBackupWrapper::PerformedBackupFailed:Class not registered!", but still getting "CCmdProvider_UC04-Exposure_ConstantTime [ 30 ] Failed!". Measured lamp temp @ 160?C, performed uniformity check and power supply calibration, still having same error. Monitored integrator value in low IO found this value fluctuating >20% possible cause for errors. Installed new lamp still having same errors. Adjusted photo diode to different positions but still experiencing same errors. For testing purposes took light integrator from another EVG620 monitored in low IO and value did not fluctuate. Installed new light integrator performed lamp intensity check and PS From mahnaz at snf.stanford.edu Tue Mar 9 11:28:07 2010 From: mahnaz at snf.stanford.edu (mahnaz at snf.stanford.edu) Date: Tue, 9 Mar 2010 11:28:07 -0800 Subject: Comment evg-imprint SNF 2010-03-03 16:12:39: update from Richard Message-ID: System lock up during exposure. Errors encountered during exposure "CEVG_ExternalBackupWrapper::PerformedBackupFailed:Class not registered!" and "CCmdProvider_UC04-Exposure_ConstantTime [ 30 ] Failed!". Installed microsoft .Net Frameworks 2.0 SP1 and reinstalled EVG6XX software this elminated the "CEVG_ExternalBackupWrapper::PerformedBackupFailed:Class not registered!", but still getting "CCmdProvider_UC04-Exposure_ConstantTime [ 30 ] Failed!". Measured lamp temp @ 160?C, performed uniformity check and power supply calibration, still having same error. Monitored integrator value in low IO found this value fluctuating >20% possible cause for errors. Installed new lamp still having same errors. Adjusted photo diode to different positions but still experiencing same errors. For testing purposes took light integrator from another EVG620 monitored in low IO and value did not fluctuate. Installed new light integrator performed lamp intensity check and PS From mahnaz at snf.stanford.edu Tue Mar 9 11:29:57 2010 From: mahnaz at snf.stanford.edu (mahnaz at snf.stanford.edu) Date: Tue, 9 Mar 2010 11:29:57 -0800 Subject: Problem evg-imprint SNF 2010-03-02 15:24:10: exposure Message-ID: Light integrator replaced From mahnaz at snf.stanford.edu Tue Mar 9 11:30:06 2010 From: mahnaz at snf.stanford.edu (mahnaz at snf.stanford.edu) Date: Tue, 9 Mar 2010 11:30:06 -0800 Subject: Comment evg-imprint SNF 2010-03-02 11:29:29: exhaust housing Message-ID: From mahnaz at snf.stanford.edu Tue Mar 9 11:30:24 2010 From: mahnaz at snf.stanford.edu (mahnaz at snf.stanford.edu) Date: Tue, 9 Mar 2010 11:30:24 -0800 Subject: Problem evg-imprint SNF 2010-02-19 14:35:23: software hangs up Message-ID: taken care of. From mahnaz at snf.stanford.edu Tue Mar 9 11:30:45 2010 From: mahnaz at snf.stanford.edu (mahnaz at snf.stanford.edu) Date: Tue, 9 Mar 2010 11:30:45 -0800 Subject: Problem evg-imprint SNF 2010-02-08 15:09:32: System Status 2/8/10 Message-ID: taken care of. From rissman at snf.stanford.edu Fri Mar 12 10:56:53 2010 From: rissman at snf.stanford.edu (rissman at snf.stanford.edu) Date: Fri, 12 Mar 2010 10:56:53 -0800 Subject: Comment evg-imprint SNF 2010-02-23 16:44:24: exposure dose Message-ID: From rissman at snf.stanford.edu Thu Mar 25 16:55:42 2010 From: rissman at snf.stanford.edu (rissman at snf.stanford.edu) Date: Thu, 25 Mar 2010 16:55:42 -0700 Subject: Shutdown evg-imprint SNF 2010-03-25 16:55:41: not making contact Message-ID: I suspected that the masks were not making contact with the wafers since exposures had poor resolution and the wafers and masks were not sticking. To confirm this I did a contact print on conventional photoresist at 20 mJ/cm2 and developed the wafer on track 1 with double puddle. The pattern is there, but poorly resolved. From mahnaz at snf.stanford.edu Tue Mar 30 15:09:46 2010 From: mahnaz at snf.stanford.edu (mahnaz at snf.stanford.edu) Date: Tue, 30 Mar 2010 15:09:46 -0700 Subject: Shutdown evg-imprint SNF 2010-03-25 16:55:41: not making contact Message-ID: tested the system, Paul had said that he did not think that the system making contact. The system is set up with all the NIL tooling so I had to change the mask holder and chuck. Ran one wafer with 1 um resist and left the wafer there. Looks okay. From rissman at snf.stanford.edu Tue Mar 2 11:29:30 2010 From: rissman at snf.stanford.edu (rissman at snf.stanford.edu) Date: Tue, 2 Mar 2010 11:29:30 -0800 Subject: Comment evg-imprint SNF 2010-03-02 11:29:29: exhaust housing Message-ID: exhaust housing replaced From rissman at snf.stanford.edu Tue Mar 2 15:24:11 2010 From: rissman at snf.stanford.edu (rissman at snf.stanford.edu) Date: Tue, 2 Mar 2010 15:24:11 -0800 Subject: Problem evg-imprint SNF 2010-03-02 15:24:10: exposure Message-ID: no longer will even expose to 1000 mJ/cm2. Crashes at ~ 50 mJ/cm2. From mahnaz at snf.stanford.edu Wed Mar 3 16:12:40 2010 From: mahnaz at snf.stanford.edu (mahnaz at snf.stanford.edu) Date: Wed, 3 Mar 2010 16:12:40 -0800 Subject: Comment evg-imprint SNF 2010-03-03 16:12:39: update from Richard Message-ID: Installed .NET Frameworks SP1 2.0 reinstalled software. No longer getting backup wrapper error but still getting exposure error. Investigated light integrater and and adjusted still seeing same issue. Sending log files to TS SD for review. Intensity was at 10mW/cm2 calibrated PS now intensity is at 14.9mW/cm2. From mahnaz at snf.stanford.edu Thu Mar 4 16:20:17 2010 From: mahnaz at snf.stanford.edu (mahnaz at snf.stanford.edu) Date: Thu, 4 Mar 2010 16:20:17 -0800 Subject: Problem evg-imprint SNF 2010-03-04 16:20:17: Message-ID: From mahnaz at snf.stanford.edu Thu Mar 4 16:26:36 2010 From: mahnaz at snf.stanford.edu (mahnaz at snf.stanford.edu) Date: Thu, 4 Mar 2010 16:26:36 -0800 Subject: Shutdown evg-imprint SNF 2010-03-04 16:26:36: Exposure failing Message-ID: Light integrator fluctuate 20% and then stops the exposure within 30 seconds Richard thinks that might be the photo diode that sits on the right site of the panel. He did put a new lamp in yesterday. He is trying to get more info from Austria. From mahnaz at snf.stanford.edu Tue Mar 9 11:26:09 2010 From: mahnaz at snf.stanford.edu (mahnaz at snf.stanford.edu) Date: Tue, 9 Mar 2010 11:26:09 -0800 Subject: Shutdown evg-imprint SNF 2010-03-04 16:26:36: Exposure failing Message-ID: System lock up during exposure. Errors encountered during exposure "CEVG_ExternalBackupWrapper::PerformedBackupFailed:Class not registered!" and "CCmdProvider_UC04-Exposure_ConstantTime [ 30 ] Failed!". Installed microsoft .Net Frameworks 2.0 SP1 and reinstalled EVG6XX software this elminated the "CEVG_ExternalBackupWrapper::PerformedBackupFailed:Class not registered!", but still getting "CCmdProvider_UC04-Exposure_ConstantTime [ 30 ] Failed!". Measured lamp temp @ 160?C, performed uniformity check and power supply calibration, still having same error. Monitored integrator value in low IO found this value fluctuating >20% possible cause for errors. Installed new lamp still having same errors. Adjusted photo diode to different positions but still experiencing same errors. For testing purposes took light integrator from another EVG620 monitored in low IO and value did not fluctuate. Installed new light integrator performed lamp intensity check and PS From mahnaz at snf.stanford.edu Tue Mar 9 11:27:48 2010 From: mahnaz at snf.stanford.edu (mahnaz at snf.stanford.edu) Date: Tue, 9 Mar 2010 11:27:48 -0800 Subject: Problem evg-imprint SNF 2010-03-04 16:20:17: Message-ID: System lock up during exposure. Errors encountered during exposure "CEVG_ExternalBackupWrapper::PerformedBackupFailed:Class not registered!" and "CCmdProvider_UC04-Exposure_ConstantTime [ 30 ] Failed!". Installed microsoft .Net Frameworks 2.0 SP1 and reinstalled EVG6XX software this elminated the "CEVG_ExternalBackupWrapper::PerformedBackupFailed:Class not registered!", but still getting "CCmdProvider_UC04-Exposure_ConstantTime [ 30 ] Failed!". Measured lamp temp @ 160?C, performed uniformity check and power supply calibration, still having same error. Monitored integrator value in low IO found this value fluctuating >20% possible cause for errors. Installed new lamp still having same errors. Adjusted photo diode to different positions but still experiencing same errors. For testing purposes took light integrator from another EVG620 monitored in low IO and value did not fluctuate. Installed new light integrator performed lamp intensity check and PS From mahnaz at snf.stanford.edu Tue Mar 9 11:28:07 2010 From: mahnaz at snf.stanford.edu (mahnaz at snf.stanford.edu) Date: Tue, 9 Mar 2010 11:28:07 -0800 Subject: Comment evg-imprint SNF 2010-03-03 16:12:39: update from Richard Message-ID: System lock up during exposure. Errors encountered during exposure "CEVG_ExternalBackupWrapper::PerformedBackupFailed:Class not registered!" and "CCmdProvider_UC04-Exposure_ConstantTime [ 30 ] Failed!". Installed microsoft .Net Frameworks 2.0 SP1 and reinstalled EVG6XX software this elminated the "CEVG_ExternalBackupWrapper::PerformedBackupFailed:Class not registered!", but still getting "CCmdProvider_UC04-Exposure_ConstantTime [ 30 ] Failed!". Measured lamp temp @ 160?C, performed uniformity check and power supply calibration, still having same error. Monitored integrator value in low IO found this value fluctuating >20% possible cause for errors. Installed new lamp still having same errors. Adjusted photo diode to different positions but still experiencing same errors. For testing purposes took light integrator from another EVG620 monitored in low IO and value did not fluctuate. Installed new light integrator performed lamp intensity check and PS From mahnaz at snf.stanford.edu Tue Mar 9 11:29:57 2010 From: mahnaz at snf.stanford.edu (mahnaz at snf.stanford.edu) Date: Tue, 9 Mar 2010 11:29:57 -0800 Subject: Problem evg-imprint SNF 2010-03-02 15:24:10: exposure Message-ID: Light integrator replaced From mahnaz at snf.stanford.edu Tue Mar 9 11:30:06 2010 From: mahnaz at snf.stanford.edu (mahnaz at snf.stanford.edu) Date: Tue, 9 Mar 2010 11:30:06 -0800 Subject: Comment evg-imprint SNF 2010-03-02 11:29:29: exhaust housing Message-ID: From mahnaz at snf.stanford.edu Tue Mar 9 11:30:24 2010 From: mahnaz at snf.stanford.edu (mahnaz at snf.stanford.edu) Date: Tue, 9 Mar 2010 11:30:24 -0800 Subject: Problem evg-imprint SNF 2010-02-19 14:35:23: software hangs up Message-ID: taken care of. From mahnaz at snf.stanford.edu Tue Mar 9 11:30:45 2010 From: mahnaz at snf.stanford.edu (mahnaz at snf.stanford.edu) Date: Tue, 9 Mar 2010 11:30:45 -0800 Subject: Problem evg-imprint SNF 2010-02-08 15:09:32: System Status 2/8/10 Message-ID: taken care of. From rissman at snf.stanford.edu Fri Mar 12 10:56:53 2010 From: rissman at snf.stanford.edu (rissman at snf.stanford.edu) Date: Fri, 12 Mar 2010 10:56:53 -0800 Subject: Comment evg-imprint SNF 2010-02-23 16:44:24: exposure dose Message-ID: From rissman at snf.stanford.edu Thu Mar 25 16:55:42 2010 From: rissman at snf.stanford.edu (rissman at snf.stanford.edu) Date: Thu, 25 Mar 2010 16:55:42 -0700 Subject: Shutdown evg-imprint SNF 2010-03-25 16:55:41: not making contact Message-ID: I suspected that the masks were not making contact with the wafers since exposures had poor resolution and the wafers and masks were not sticking. To confirm this I did a contact print on conventional photoresist at 20 mJ/cm2 and developed the wafer on track 1 with double puddle. The pattern is there, but poorly resolved. From mahnaz at snf.stanford.edu Tue Mar 30 15:09:46 2010 From: mahnaz at snf.stanford.edu (mahnaz at snf.stanford.edu) Date: Tue, 30 Mar 2010 15:09:46 -0700 Subject: Shutdown evg-imprint SNF 2010-03-25 16:55:41: not making contact Message-ID: tested the system, Paul had said that he did not think that the system making contact. The system is set up with all the NIL tooling so I had to change the mask holder and chuck. Ran one wafer with 1 um resist and left the wafer there. Looks okay.