From pradeep.nataraj at gmail.com  Wed Dec  5 12:07:47 2012
From: pradeep.nataraj at gmail.com (Pradeep Nataraj)
Date: Wed, 5 Dec 2012 12:07:47 -0800
Subject: samples not made it through implant place..sorry
Message-ID: <CAEhDSuYPmMXxn5zn2LcT-_8=q5TNaLPU1kcT1P2AN6knzv5FWA@mail.gmail.com>


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From svolkman at eecs.berkeley.edu  Tue Dec 11 07:38:12 2012
From: svolkman at eecs.berkeley.edu (Steven K. Volkman)
Date: Tue, 11 Dec 2012 07:38:12 -0800
Subject: Release now till noon
Message-ID: <CAKEEhB_PgEmmN2PheQK46LT2BUYvuuwPV9yJM+zu4vGrLLrDmg@mail.gmail.com>

Steve
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From anupama2 at stanford.edu  Fri Dec 14 11:49:51 2012
From: anupama2 at stanford.edu (Anupama Arun)
Date: Fri, 14 Dec 2012 11:49:51 -0800 (PST)
Subject: Reservation cancelled
Message-ID: <688755868.800780.1355514591518.JavaMail.root@stanford.edu>

Fiji1 released today from 14:00.

Sorry for the late notice. Substrates not ready.

Best
Anu


From mmrincon at stanford.edu  Mon Dec 17 15:58:20 2012
From: mmrincon at stanford.edu (Michelle Rincon)
Date: Mon, 17 Dec 2012 15:58:20 -0800
Subject: Fiji1 Procedural Change
Message-ID: <31FE41EA-6C70-4D95-8225-89444611CB59@stanford.edu>

Hello Fiji1 users,

In order to optimize the number of layers we can support simultaneously on Fiji1, we are going to be removing the DI water precursor from the tool.  This means that all films will need to be plasma depositions.  This change will be implemented when we come up from the shutdown on 1/7/12.

Any films that need to be thermally deposited can be done on the Savannah.  The Savannah can process clean category wafers by first depositing 10nm of the film of interest to coat the chamber prior to running your wafer.

Please let me know if you have any questions!

Best,
Michelle

---------------------------------------------
Michelle Rincon, PhD
Process Staff Engineer
Stanford Nanofabrication Facility

(650)-725-0307
mmrincon at stanford.edu









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From pradeep.nataraj at gmail.com  Mon Dec 17 17:57:29 2012
From: pradeep.nataraj at gmail.com (Pradeep Nataraj)
Date: Mon, 17 Dec 2012 17:57:29 -0800
Subject: Fiji1 Procedural Change
In-Reply-To: <31FE41EA-6C70-4D95-8225-89444611CB59@stanford.edu>
References: <31FE41EA-6C70-4D95-8225-89444611CB59@stanford.edu>
Message-ID: <EAD0F52B-9883-4A64-A29A-2B457913A63A@gmail.com>

Michelle, 
I agree with you. 
Thanks 
Pradeep 

On Dec 17, 2012, at 3:58 PM, Michelle Rincon <mmrincon at stanford.edu> wrote:

> Hello Fiji1 users,
> 
> In order to optimize the number of layers we can support simultaneously on Fiji1, we are going to be removing the DI water precursor from the tool.  This means that all films will need to be plasma depositions.  This change will be implemented when we come up from the shutdown on 1/7/12.
> 
> Any films that need to be thermally deposited can be done on the Savannah.  The Savannah can process clean category wafers by first depositing 10nm of the film of interest to coat the chamber prior to running your wafer.
> 
> Please let me know if you have any questions!
> 
> Best,
> Michelle
> 
> ---------------------------------------------
> Michelle Rincon, PhD
> Process Staff Engineer
> Stanford Nanofabrication Facility
> 
> (650)-725-0307
> mmrincon at stanford.edu
> 
> 
> 
> 
> 
> 
> 
> 
> 
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