Fiji1 Procedural Change

Pradeep Nataraj pradeep.nataraj at gmail.com
Mon Dec 17 17:57:29 PST 2012


Michelle, 
I agree with you. 
Thanks 
Pradeep 

On Dec 17, 2012, at 3:58 PM, Michelle Rincon <mmrincon at stanford.edu> wrote:

> Hello Fiji1 users,
> 
> In order to optimize the number of layers we can support simultaneously on Fiji1, we are going to be removing the DI water precursor from the tool.  This means that all films will need to be plasma depositions.  This change will be implemented when we come up from the shutdown on 1/7/12.
> 
> Any films that need to be thermally deposited can be done on the Savannah.  The Savannah can process clean category wafers by first depositing 10nm of the film of interest to coat the chamber prior to running your wafer.
> 
> Please let me know if you have any questions!
> 
> Best,
> Michelle
> 
> ---------------------------------------------
> Michelle Rincon, PhD
> Process Staff Engineer
> Stanford Nanofabrication Facility
> 
> (650)-725-0307
> mmrincon at stanford.edu
> 
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