From pradeep.nataraj at gmail.com Wed Feb 6 14:17:48 2013 From: pradeep.nataraj at gmail.com (Pradeep Nataraj) Date: Wed, 6 Feb 2013 14:17:48 -0800 Subject: [fiji1] Fixed.. Message-ID: Hello Fiji users, Jim and I fixed it. Both Fiji1 and Fiji2 up and running. Pradeep -------------- next part -------------- An HTML attachment was scrubbed... URL: From jprovine at stanford.edu Tue Feb 19 13:42:12 2013 From: jprovine at stanford.edu (J Provine) Date: Tue, 19 Feb 2013 13:42:12 -0800 Subject: [fiji1] reservations Message-ID: dear ald community, with the fijis very busy in terms of reservation, please announce to the list and delete reservations you will not be using. thanks j -------------- next part -------------- An HTML attachment was scrubbed... URL: From pradeep.nataraj at gmail.com Tue Feb 19 18:21:13 2013 From: pradeep.nataraj at gmail.com (Pradeep Nataraj) Date: Tue, 19 Feb 2013 18:21:13 -0800 Subject: [fiji1] Long reservations Message-ID: Hello eager Fiji1 users, I have excess reservation on Fiji1. If any one needs any time on the tool, please let me know I will let you use it. Thank you. Pradeep/pnataraj -------------- next part -------------- An HTML attachment was scrubbed... URL: From dasgupta at stanford.edu Fri Feb 22 15:02:34 2013 From: dasgupta at stanford.edu (Neil Dasgupta) Date: Fri, 22 Feb 2013 15:02:34 -0800 (PST) Subject: [fiji1] Fiji1 released unti 5 pm today Message-ID: <1768736089.4557586.1361574154276.JavaMail.root@stanford.edu> From jprovine at stanford.edu Wed Feb 27 17:13:01 2013 From: jprovine at stanford.edu (J Provine) Date: Wed, 27 Feb 2013 17:13:01 -0800 Subject: [fiji1] interesting talk for ald enthusiasts Message-ID: *Thursday, Feb 28,* *4 - 5pm* *MERL 203* *Light refreshments will be provided* **** *Thermal-ALD versus Plasma-ALD* **** Atomic Layer Deposition (ALD)is an important tool for Nanotechnology, which has created a need for atomic level deposition of high-quality thin film materials. ALD uses typically two chemicals to create alternate, saturated, chemical reactions on a surface, resulting in unique self-limiting growth with excellent features like conformality, uniformity, repeatability, and accurate thickness control. Typical growth rate is less than one molecule layer per deposition cycle. ALD produces amorphous, crystalline, or even epitaxial ultra thin pin-hole free films depending of materials, deposition temperature, and surface.**** **** In this lecture the mechanism of thermally-activated Chemical Vapor Deposition (CVD) will be used to introduce Thermal-ALD. The mechanisms of ALD will then be presented in detail along with experimental achievements. Several examples of depositions of selected materials using Thermal-ALD and Plasma-ALD will be used to illustrate advantages of the use of a high reactive precursor, such as an oxygen plasma. -------------- next part -------------- An HTML attachment was scrubbed... URL: