Problem gasonics SNF 2011-01-13 16:43:21: Unload delay and flows

mtang at snf.stanford.edu mtang at snf.stanford.edu
Thu Jan 13 16:43:22 PST 2011


Please note two changes on the system:
1.  The unload now has a 10 second delay before placing the processed wafer into the receiver cassette.  This is to allow the hot wafer to cool down and minimize heat damage to the receiver cassette.
2.  The gas flows are now set at O2 = 4.5 lpm and N2 = 0.5 lpm.  There appears to be a problem with the O2 MFC in that it doesn't control at 3 lpm.  Until this can be addressed, the process should not be affected by high gas flows.  




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