From mahnaz at stanford.edu Fri Aug 3 07:16:59 2007 From: mahnaz at stanford.edu (Mahnaz Mansourpour) Date: Fri, 03 Aug 2007 07:16:59 -0700 Subject: Litho cassette Message-ID: <46B338DB.3000605@stanford.edu> Hello all, I have received numerous complains from lab members and staff regarding not having cassettes available in the Litho area. I should have 13 blue boxes with teflon cassette in them in the litho area AT LEAST. Here is the deal, If you have stored your wafers in litho box, better hurry up and release the box . I will look for them at 8 Am today ( 8/3) and I intend to have the 13 box on the shelf by 8:30 am today so better hurry up. Now that Uija is gone staff could use a little help, for me to come in at 6 am to take care of matters like this, is not very productive use of my time , is it? mahnaz -------------- next part -------------- An HTML attachment was scrubbed... URL: From jwc at snf.stanford.edu Wed Aug 29 16:37:18 2007 From: jwc at snf.stanford.edu (James Conway) Date: Wed, 29 Aug 2007 16:37:18 -0700 Subject: ANNOUNCEMENT: "Take A Spin with Me" -- Ebeam Resist Handling Training on the Headway. Tuesday September 11 and 25th 2007 from 10:00 - 13:00 Message-ID: <46D6032E.2020403@snf.stanford.edu> *ANNOUNCEMENT: "Take A Spin with Me" -- Resist Handling Training on the Headway Coater.* Greetings Ebeam Lab Users, I will be conducting my bi-monthly *"Take A Spin with Me" *training class Tuesday September 11 and 25th, 2007 from 10 AM - 1 PM. There is a sign up sheet posted on the white board in my office if you desire to sign up in advance. This is a great opportunity for you to get acquainted with the specific points to employ when working with our Ebeam or Optical Resist materials in order to obtain high quality thin film coatings over your wafers for Electron Beam, Scanning Probe (SPL), and optical Nano-Lithography. These applications accurate control of polymer thickness is important in order to obtain consistent high quality lithography results. We will be conducting this training on the Headway Spin Coater and users attending this session will gain their qualification on this tool and also learn to perform thin film measurements on the Nanospec TFA measurement tool. Schedule of Events: 10 - 11:00 I will start with substrate cleans on WET BENCH NONMETAL performing Pirhana substrate cleans and HF etching of the intrinsic native oxide on Silicon wafers. All users are encouraged to have their substrates cleaned and ready to go for spinning by the session time; either coming out of the 150 degree Singe oven, or if you are working on oxides or nitrides, coming out of the YES HMDS Prime oven directly. 11:00 - 12:30 We can apply what ever Ebeam or Optical Resist system you desire for your work. 12:30 - 1:00 Thin Film Measurements on the Nanospec Thin Film Analyzer All interested parties are welcome to attend this session. This is a Hands-On Lab Session so please have you substrates clean and ready to coat on the Headway Spin Coater. Thank you for your interest in Ebeam Technologies here at Stanford Nanofabrication Facility, James W. Conway Ebeam Technology Group Stanford Nanofabrication Facility 650-725-7075 office hour M-F 8:30 - 9:30 AM CIS 31 -------------- next part -------------- An HTML attachment was scrubbed... URL: