From jwc at snf.stanford.edu Thu Apr 10 09:51:18 2008 From: jwc at snf.stanford.edu (James Conway) Date: Thu, 10 Apr 2008 09:51:18 -0700 Subject: Please help us keep the headway2 spin coater free of resist residues. Message-ID: <47FE4586.8060800@snf.stanford.edu> Greetings Headway Users: Yesterday Mario replaced the plastic bowl that is inside the headway coater with a brand new bowl. The old bowl had become severely contaminated with cross-linked LOL and Optical resist residues. All Users are requested to be careful to coat the bowl interior with several layers of Aluminum foil before starting their spin coating operations. If you should spill or find resist in the interior of the bowl, please wipe it down with acetone to remove all traces of resist. This will help to improve the quality of work being performed on this bench for all Users. This email is also a reminder to be sure to clean up after your resist coating operations on the Headway2 spin coater. You may have noticed that over the last two months the SNF Process Staff and Lab members have been striving to bring wbmiscres up to a higher standard of usage to improve processing results for all Users on this tool. This major effort on everyone's part now includes individual responsibility to ensure they start and complete their tasking by wiping down the bench of all resist residues from their operations, and if they encounter a bench that has been contaminated to report it on the CORAL system as a comment or problem. This effort is made with particular emphasis with respect to LOL and the thicker optical resist which tend to be more difficult to remove from the bench decks once they have dried and cross linked. Thank you for your support! James Conway and the SNF Process Staff. -------------- next part -------------- An HTML attachment was scrubbed... URL: