From jwc at snf.stanford.edu Mon Dec 8 16:42:05 2008 From: jwc at snf.stanford.edu (James Conway) Date: Mon, 08 Dec 2008 16:42:05 -0800 Subject: ANNOUNCEMENT: "Take A Spin with Me" -- Resist Handling Training classes on the Headway December 9th 2008 10:15 - 12:30 Message-ID: <493DBEDD.1010802@snf.stanford.edu> *Hello: Sorry if you have already received this posting before or attended this class last month! I am trying to catch everyone whom may have fallen through the cracks before the Holiday shutdown. If you have already qualified on the tool just reply in the subject line QUALIFIED.... and I will take you out of my to be trained queue... Happy Holidays! JWC **ANNOUNCEMENT: "Take A Spin with Me" -- Resist Handling Training on the Headway Coater. * Greetings SNF Lab Users, I will be conducting my next *"Take A Spin with Me" *training classes on tomorrow December 9th, 2008 from 10:15 AM - 12:30 PM. This is a great opportunity for you to get acquainted with the specific points to employ when working with our Ebeam or Optical Resist materials in order to obtain high quality thin film coatings over your wafers for Electron Beam, Scanning Probe (SPL), and Optical Lithography. In these applications accurate control of polymer thickness is important in order to obtain consistent high quality lithography results. We will be conducting this training on the Headway Spin Coater. Users attending this session will gain their qualification on this tool and also learn to perform thin film measurements on the Nanospec TFA measurement tool. This is a Hands-On Lab Session, please have your substrates clean and ready to coat on the Headway Coater. Class Schedule: 10:15 - 11:00 I will start with substrate cleans on WET BENCH NONMETAL performing Pirhana clean and HF etching of the intrinsic native oxide on Silicon wafers. All users must have their substrates cleaned and ready to go for spinning by the session time; either coming out of the 150 degree Singe oven, or if you are working on oxides or nitrides, coming out of the YES HMDS Prime oven directly. 11:00 - 12:00 We can apply what ever resist system you desire for your work. 12:00 - 12:30 Thin Film Measurements on the Nanospec Thin Film Analyzer All interested parties are welcome to attend this session. Thank you for your interest in Ebeam and Optical Lithography at Stanford Nanofabrication Facility, James W. Conway Ebeam Technology Group Stanford Nanofabrication Facility 650-725-7075 office hour Tuesday - Friday 8:30 - 9:30 AM CIS 31 -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: wretht.gif Type: image/gif Size: 3888 bytes Desc: not available URL: From jwc at snf.stanford.edu Mon Dec 15 11:45:39 2008 From: jwc at snf.stanford.edu (James Conway) Date: Mon, 15 Dec 2008 11:45:39 -0800 Subject: LAST CALL ON THE OLD PMMA BLENDS. Please use it up and get it onto your substrates, it all gets removed from the lab Wednesday morning. Message-ID: <4946B3E3.3020408@snf.stanford.edu> *Greetings Lab Members: * This is your last reminder to use up all the old PMMA blends in the SNF lab. The Plan is to start the new year with new bottles of material in the normal dilutions. As that most of the custom viscosity blends I have made for you are now 1 to 2 years old they will be removed and discarded as well. If you desire coat up your substrates for your next round of R&D and help us use the materials up today! * LAST CALL ON THE OLD PMMA BLENDS.* *Please use it up and get it onto your substrates, it all gets removed from the lab _Wednesday morning._ * Happy Holidays, James Conway -------------- next part -------------- An HTML attachment was scrubbed... URL: