From jwc at snf.stanford.edu Mon Feb 4 11:50:46 2008 From: jwc at snf.stanford.edu (James Conway) Date: Mon, 04 Feb 2008 11:50:46 -0800 Subject: ANNOUNCEMENT: "Take A Spin with Me" -- Ebeam Resist Handling Training on the Headway. Tuesday January 29, 2008 from 10:15 - 12:30 Message-ID: <47A76C96.9040401@snf.stanford.edu> * * ** * ANNOUNCEMENT: "Take A Spin with Me" -- Resist Handling Training on the Headway Coater.* Greetings SNF Lab Users, I will be conducting my next *"Take A Spin with Me" *training class Tuesday February 19, 2008 from 10:15 AM - 12:30 PM. There is a sign up sheet posted on the white board in my office if you desire to sign up in advance. This is a great opportunity for you to get acquainted with the specific points to employ when working with our Ebeam or Optical Resist materials in order to obtain high quality thin film coatings over your wafers for Electron Beam, Scanning Probe (SPL), and optical Nano-Lithography. In these applications accurate control of polymer thickness is important in order to obtain consistent high quality lithography results. We will be conducting this training on the Headway Spin Coater. Users attending this session will gain their qualification on this tool and also learn to perform thin film measurements on the Nanospec TFA measurement tool. This is a Hands-On Lab Session, please have your substrates clean and ready to coat on the Headway Coater. Class Schedule: 10:15 - 11:00 I will start with substrate cleans on WET BENCH NONMETAL performing Pirhana substrate cleans and HF etching of the intrinsic native oxide on Silicon wafers. All users must have their substrates cleaned and ready to go for spinning by the session time; either coming out of the 150 degree Singe oven, or if you are working on oxides or nitrides, coming out of the YES HMDS Prime oven directly. 11:00 - 12:00 We can apply what ever Ebeam or Optical Resist system you desire for your work. 12:00 - 12:30 Thin Film Measurements on the Nanospec Thin Film Analyzer All interested parties are welcome to attend this session. Thank you for your interest in Ebeam and Optical Lithography at Stanford Nanofabrication Facility, James W. Conway Ebeam Technology Group Stanford Nanofabrication Facility 650-725-7075 office hour Tuesday - Friday 8:30 - 9:30 AM CIS 31 -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: not available Type: image/gif Size: 3681 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: not available Type: image/jpeg Size: 49030 bytes Desc: not available URL: From jwc at snf.stanford.edu Mon Feb 11 14:31:02 2008 From: jwc at snf.stanford.edu (James Conway) Date: Mon, 11 Feb 2008 14:31:02 -0800 Subject: ANNOUNCEMENT: "Take A Spin with Me" -- Ebeam Resist Handling Training on the Headway. Tuesday January 29, 2008 from 10:15 - 12:30 Message-ID: <47B0CCA6.5080904@snf.stanford.edu> * * ** * ANNOUNCEMENT: "Take A Spin with Me" -- Resist Handling Training on the Headway Coater.* Greetings SNF Lab Users, I will be conducting my next *"Take A Spin with Me" *training class Tuesday February 19, 2008 from 10:15 AM - 12:30 PM. There is a sign up sheet posted on the white board in my office if you desire to sign up in advance. This is a great opportunity for you to get acquainted with the specific points to employ when working with our Ebeam or Optical Resist materials in order to obtain high quality thin film coatings over your wafers for Electron Beam, Scanning Probe (SPL), and optical Nano-Lithography. In these applications accurate control of polymer thickness is important in order to obtain consistent high quality lithography results. We will be conducting this training on the Headway Spin Coater. Users attending this session will gain their qualification on this tool and also learn to perform thin film measurements on the Nanospec TFA measurement tool. This is a Hands-On Lab Session, please have your substrates clean and ready to coat on the Headway Coater. Class Schedule: 10:15 - 11:00 I will start with substrate cleans on WET BENCH NONMETAL performing Pirhana substrate cleans and HF etching of the intrinsic native oxide on Silicon wafers. All users must have their substrates cleaned and ready to go for spinning by the session time; either coming out of the 150 degree Singe oven, or if you are working on oxides or nitrides, coming out of the YES HMDS Prime oven directly. 11:00 - 12:00 We can apply what ever Ebeam or Optical Resist system you desire for your work. 12:00 - 12:30 Thin Film Measurements on the Nanospec Thin Film Analyzer All interested parties are welcome to attend this session. Thank you for your interest in Ebeam and Optical Lithography at Stanford Nanofabrication Facility, James W. Conway Ebeam Technology Group Stanford Nanofabrication Facility 650-725-7075 office hour Tuesday - Friday 8:30 - 9:30 AM CIS 31 -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: not available Type: image/gif Size: 3681 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: not available Type: image/jpeg Size: 49030 bytes Desc: not available URL: From jwc at snf.stanford.edu Wed Feb 20 11:11:17 2008 From: jwc at snf.stanford.edu (James Conway) Date: Wed, 20 Feb 2008 11:11:17 -0800 Subject: Users should be careful to complete the In-Use Hazardous Chemicals Blue Cards completely. Message-ID: <47BC7B55.7090901@snf.stanford.edu> * **Greetings Headway Users:* To be fair and equal to everyone I am reminding you all of a SNF requirement to fill out *completely and legibly* all items on the In-Use Hazardous Chemicals Blue Card used during your fabrication operations. In addition All Users are warned to completely remove all engineering materials after your spinning operations and to clean up after yourselves. This is important to maintain a safe working environment for everyone working in the SNF cleanroom. During the last 24 hours I have given two warnings to Lab Members working on the Headway bench to properly label, handle and dispose of engineering materials on this bench after your fabrication operations. SNF Staff and lab members will continue to be vigilant of Users working on this bench in an effort to identify the last few Users whom are not following standard procedures on this bench. Thank you for your support! James Conway -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: stanford_bannerbuilding.jpg Type: image/jpeg Size: 19603 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: SNF_header and Logo.gif Type: image/gif Size: 3681 bytes Desc: not available URL: From jwc at snf.stanford.edu Wed Feb 20 13:41:02 2008 From: jwc at snf.stanford.edu (James Conway) Date: Wed, 20 Feb 2008 13:41:02 -0800 Subject: ANNOUNCEMENT: "Take A Spin with Me" -- Ebeam Resist Handling Training on the Headway for MARCH. Tuesday MARCH 11 AND 25TH , 2008 10:15 AM to 12:30 PM Message-ID: <47BC9E6E.70301@snf.stanford.edu> * * ** * ANNOUNCEMENT: "Take A Spin with Me" -- Resist Handling Training on the Headway Coater. MARCH CLASSES. * Greetings SNF Lab Users, I will be conducting my next *"Take A Spin with Me" *training class Tuesday March 11 and 25th , 2008 from 10:15 AM - 12:30 PM. There is a sign up sheet posted on the white board in my office if you desire to sign up in advance. This is a great opportunity for you to get acquainted with the specific points to employ when working with our Ebeam or Optical Resist materials in order to obtain high quality thin film coatings over your wafers for Electron Beam, Scanning Probe (SPL), and optical Nano-Lithography. In these applications accurate control of polymer thickness is important in order to obtain consistent high quality lithography results. We will be conducting this training on the Headway Spin Coater. Users attending this session will gain their qualification on this tool and also learn to perform thin film measurements on the Nanospec TFA measurement tool. This is a Hands-On Lab Session, please have your substrates clean and ready to coat on the Headway Coater. Class Schedule: 10:15 - 11:00 I will start with substrate cleans on WET BENCH NONMETAL performing Pirhana substrate cleans and HF etching of the intrinsic native oxide on Silicon wafers. All users must have their substrates cleaned and ready to go for spinning by the session time; either coming out of the 150 degree Singe oven, or if you are working on oxides or nitrides, coming out of the YES HMDS Prime oven directly. 11:00 - 12:00 We can apply what ever Ebeam or Optical Resist system you desire for your work. 12:00 - 12:30 Thin Film Measurements on the Nanospec Thin Film Analyzer All interested parties are welcome to attend this session. Thank you for your interest in Ebeam and Optical Lithography at Stanford Nanofabrication Facility, James W. Conway Ebeam Technology Group Stanford Nanofabrication Facility 650-725-7075 office hour Tuesday - Friday 8:30 - 9:30 AM CIS 31 -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: not available Type: image/gif Size: 3681 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: not available Type: image/jpeg Size: 49030 bytes Desc: not available URL: From jwc at snf.stanford.edu Tue Feb 26 17:08:52 2008 From: jwc at snf.stanford.edu (James Conway) Date: Tue, 26 Feb 2008 17:08:52 -0800 Subject: ANNOUNCEMENT: "Take A Spin with Me" -- Ebeam Resist Handling Training on the Headway for MARCH. Tuesday MARCH 11 AND 25TH , 2008 10:15 AM to 12:30 PM Message-ID: <47C4B824.4030101@snf.stanford.edu> * * ** * ANNOUNCEMENT: "Take A Spin with Me" -- Resist Handling Training on the Headway Coater. MARCH CLASSES. * Greetings SNF Lab Users, I will be conducting my next *"Take A Spin with Me" *training class Tuesday March 11 and 25th , 2008 from 10:15 AM - 12:30 PM. There is a sign up sheet posted on the white board in my office if you desire to sign up in advance. This is a great opportunity for you to get acquainted with the specific points to employ when working with our Ebeam or Optical Resist materials in order to obtain high quality thin film coatings over your wafers for Electron Beam, Scanning Probe (SPL), and optical Nano-Lithography. In these applications accurate control of polymer thickness is important in order to obtain consistent high quality lithography results. We will be conducting this training on the Headway Spin Coater. Users attending this session will gain their qualification on this tool and also learn to perform thin film measurements on the Nanospec TFA measurement tool. This is a Hands-On Lab Session, please have your substrates clean and ready to coat on the Headway Coater. Class Schedule: 10:15 - 11:00 I will start with substrate cleans on WET BENCH NONMETAL performing Pirhana substrate cleans and HF etching of the intrinsic native oxide on Silicon wafers. All users must have their substrates cleaned and ready to go for spinning by the session time; either coming out of the 150 degree Singe oven, or if you are working on oxides or nitrides, coming out of the YES HMDS Prime oven directly. 11:00 - 12:00 We can apply what ever Ebeam or Optical Resist system you desire for your work. 12:00 - 12:30 Thin Film Measurements on the Nanospec Thin Film Analyzer All interested parties are welcome to attend this session. Thank you for your interest in Ebeam and Optical Lithography at Stanford Nanofabrication Facility, James W. Conway Ebeam Technology Group Stanford Nanofabrication Facility 650-725-7075 office hour Tuesday - Friday 8:30 - 9:30 AM CIS 31 -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... 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