From jwc at snf.stanford.edu Tue Nov 4 18:22:13 2008 From: jwc at snf.stanford.edu (James Conway) Date: Tue, 04 Nov 2008 18:22:13 -0800 Subject: ANNOUNCEMENT: "Take A Spin with Me" -- Resist Handling Training classes on the Headway for November and December 2008 Message-ID: <49110355.1020009@snf.stanford.edu> * **ANNOUNCEMENT: "Take A Spin with Me" -- Resist Handling Training on the Headway Coater. * Greetings SNF Lab Users, I will be conducting my next *"Take A Spin with Me" *training classes Tuesday November 11 and 25th, 2008 followed by one class December 9th, 2008 from 10:15 AM - 12:30 PM. This is a great opportunity for you to get acquainted with the specific points to employ when working with our Ebeam or Optical Resist materials in order to obtain high quality thin film coatings over your wafers for Electron Beam, Scanning Probe (SPL), and Optical Lithography. In these applications accurate control of polymer thickness is important in order to obtain consistent high quality lithography results. We will be conducting this training on the Headway Spin Coater. Users attending this session will gain their qualification on this tool and also learn to perform thin film measurements on the Nanospec TFA measurement tool. This is a Hands-On Lab Session, please have your substrates clean and ready to coat on the Headway Coater. Class Schedule: 10:15 - 11:00 I will start with substrate cleans on WET BENCH NONMETAL performing Pirhana clean and HF etching of the intrinsic native oxide on Silicon wafers. All users must have their substrates cleaned and ready to go for spinning by the session time; either coming out of the 150 degree Singe oven, or if you are working on oxides or nitrides, coming out of the YES HMDS Prime oven directly. 11:00 - 12:00 We can apply what ever resist system you desire for your work. 12:00 - 12:30 Thin Film Measurements on the Nanospec Thin Film Analyzer All interested parties are welcome to attend this session. Thank you for your interest in Ebeam and Optical Lithography at Stanford Nanofabrication Facility, James W. Conway Ebeam Technology Group Stanford Nanofabrication Facility 650-725-7075 office hour Tuesday - Friday 8:30 - 9:30 AM CIS 31 -------------- next part -------------- An HTML attachment was scrubbed... URL: From jwc at snf.stanford.edu Wed Nov 12 09:09:32 2008 From: jwc at snf.stanford.edu (James Conway) Date: Wed, 12 Nov 2008 09:09:32 -0800 Subject: My 5 mm elevated Headway chick for small samples is missing == please return. Message-ID: <491B0DCC.6080600@snf.stanford.edu> Good Morning, Yesterday it came to my attention that a custom 5 mm Headway chuck which is designed for working on small pieces was taken from my dry box and not returned to there after usage. It was likely taken last Thursday night or Friday. This chuck has a 5 mm circular elevated mesa on it so as to not get resist building up in the corners of a piece and provides a valuable solution for our EBL users. This is very poor behavior and several users now cannot spin uniform thin films on their pieces. If you used this chuck and forgot to return it please do so immediately. If in the course of your work in the cleanroom you come across it please return it to me. HENCEFORTH NO ENGINEERING MATERIALS WILL BE LOANED OR MAY BE BORROWED FROM MY DRY BOX STORAGE OR THE EBEAM LAB AREA PERIOD WITH NO EXCEPTIONS. Users will need to order their own headway fixtures, and obtain their own substrates, syringes, and filters from the SNF Stockroom. Thank you, James Conway -------------- next part -------------- An HTML attachment was scrubbed... URL: From jwc at snf.stanford.edu Wed Nov 12 09:22:46 2008 From: jwc at snf.stanford.edu (James Conway) Date: Wed, 12 Nov 2008 09:22:46 -0800 Subject: My 5 mm elevated Headway chick for small samples is missing == please return. In-Reply-To: <491B0DCC.6080600@snf.stanford.edu> References: <491B0DCC.6080600@snf.stanford.edu> Message-ID: <491B10E6.5030104@snf.stanford.edu> The missing chuck has been returned to me. Thank you for the quick response James James Conway wrote: > > Good Morning, > > Yesterday it came to my attention that a custom 5 mm Headway chuck > which is designed for working on small pieces was taken from my dry > box and not returned to there after usage. It was likely taken last > Thursday night or Friday. This chuck has a 5 mm circular elevated mesa > on it so as to not get resist building up in the corners of a piece > and provides a valuable solution for our EBL users. > > This is very poor behavior and several users now cannot spin uniform > thin films on their pieces. If you used this chuck and forgot to > return it please do so immediately. If in the course of your work in > the cleanroom you come across it please return it to me. > > HENCEFORTH NO ENGINEERING MATERIALS WILL BE LOANED OR MAY BE BORROWED > FROM MY DRY BOX STORAGE OR THE EBEAM LAB AREA PERIOD WITH NO EXCEPTIONS. > > Users will need to order their own headway fixtures, and obtain their > own substrates, syringes, and filters from the SNF Stockroom. > > Thank you, > > James Conway > > > > -------------- next part -------------- An HTML attachment was scrubbed... URL: From jwc at snf.stanford.edu Tue Nov 25 09:58:50 2008 From: jwc at snf.stanford.edu (James Conway) Date: Tue, 25 Nov 2008 09:58:50 -0800 Subject: ANNOUNCEMENT: "Take A Spin with Me" -- Resist Handling Training classes on the Headway for November and December 2008 Message-ID: <492C3CDA.6020306@snf.stanford.edu> * **ANNOUNCEMENT: "Take A Spin with Me" -- Resist Handling Training on the Headway Coater. * Greetings SNF Lab Users, I will be conducting my next *"Take A Spin with Me" *training classes Tuesday November 11 and 25th, 2008 followed by one class December 9th, 2008 from 10:15 AM - 12:30 PM. This is a great opportunity for you to get acquainted with the specific points to employ when working with our Ebeam or Optical Resist materials in order to obtain high quality thin film coatings over your wafers for Electron Beam, Scanning Probe (SPL), and Optical Lithography. In these applications accurate control of polymer thickness is important in order to obtain consistent high quality lithography results. We will be conducting this training on the Headway Spin Coater. Users attending this session will gain their qualification on this tool and also learn to perform thin film measurements on the Nanospec TFA measurement tool. This is a Hands-On Lab Session, please have your substrates clean and ready to coat on the Headway Coater. Class Schedule: 10:15 - 11:00 I will start with substrate cleans on WET BENCH NONMETAL performing Pirhana clean and HF etching of the intrinsic native oxide on Silicon wafers. All users must have their substrates cleaned and ready to go for spinning by the session time; either coming out of the 150 degree Singe oven, or if you are working on oxides or nitrides, coming out of the YES HMDS Prime oven directly. 11:00 - 12:00 We can apply what ever resist system you desire for your work. 12:00 - 12:30 Thin Film Measurements on the Nanospec Thin Film Analyzer All interested parties are welcome to attend this session. Thank you for your interest in Ebeam and Optical Lithography at Stanford Nanofabrication Facility, James W. Conway Ebeam Technology Group Stanford Nanofabrication Facility 650-725-7075 office hour Tuesday - Friday 8:30 - 9:30 AM CIS 31 -------------- next part -------------- An HTML attachment was scrubbed... URL: From jwc at snf.stanford.edu Tue Nov 25 10:07:13 2008 From: jwc at snf.stanford.edu (James Conway) Date: Tue, 25 Nov 2008 10:07:13 -0800 Subject: All odd lots of PMMA should be deposited on wafers by the end of the year. We will dispose of all odd lots in the SNF Cleanroom on December 16, days end. Message-ID: <492C3ED1.20505@snf.stanford.edu> Greetings PMMA Users: All bottles of User labeled odd lots and non-standard viscosities of PMMA in the SNF Cleanroom should be finished up preferably by depositing these materials on wafers by the end of the year at shutdown. At days end on Tuesday December 16, 2008 I will dispose of all PMMA batches not consumed, when they will be packed up and safely discarded This is to aid in cleaning up the SNF cleanroom, and to reduce the volume and amounts of odd lots stored in the Lab for the annual inventory of chemicals. It is recommended to coat up wafers with these materials so we don't have to throw them away and pay extra disposal cost. Thank you, James Conway -------------- next part -------------- An HTML attachment was scrubbed... URL: