From jwc at snf.stanford.edu Fri Jan 9 08:43:08 2009 From: jwc at snf.stanford.edu (James Conway) Date: Fri, 09 Jan 2009 08:43:08 -0800 Subject: ANNOUNCEMENT: "Take A Spin with Me" -- Resist Handling Training classes on the Headway for January 2009 Message-ID: <49677E9C.9030909@snf.stanford.edu> * **ANNOUNCEMENT: "Take A Spin with Me" -- Resist Handling Training on the Headway Coater. * Greetings SNF Lab Users, I will be conducting my next *"Take A Spin with Me" *training classes Tuesday January 13 and 27th, 2009 from 10:15 AM - 12:30 PM. This is a great opportunity for you to get acquainted with the specific points to employ when working with our Ebeam or Optical Resist materials in order to obtain high quality thin film coatings over your wafers for Electron Beam, Scanning Probe (SPL), and Optical Lithography. In these applications accurate control of polymer thickness is important in order to obtain consistent high quality lithography results. We will be conducting this training on the Headway Spin Coater. Users attending this session will gain their qualification on this tool and also learn to perform thin film measurements on the Nanospec TFA measurement tool. This is a Hands-On Lab Session, please have your substrates clean and ready to coat on the Headway Coater. Class Schedule: 10:15 - 11:00 I will start with substrate cleans on WET BENCH NONMETAL performing Pirhana clean and HF etching of the intrinsic native oxide on Silicon wafers. All users must have their substrates cleaned and ready to go for spinning by the session time; either coming out of the 150 degree Singe oven, or if you are working on oxides or nitrides, coming out of the YES HMDS Prime oven directly. 11:00 - 12:00 We can apply what ever resist system you desire for your work. 12:00 - 12:30 Thin Film Measurements on the Nanospec Thin Film Analyzer All interested parties are welcome to attend this session. Thank you for your interest in Ebeam and Optical Lithography at Stanford Nanofabrication Facility, James W. Conway Ebeam Technology Group Stanford Nanofabrication Facility 650-725-7075 office hour Tuesday - Friday 8:30 - 9:30 AM CIS 31 -------------- next part -------------- An HTML attachment was scrubbed... URL: From jwc at snf.stanford.edu Mon Jan 12 12:27:54 2009 From: jwc at snf.stanford.edu (James Conway) Date: Mon, 12 Jan 2009 12:27:54 -0800 Subject: REMINDER: "Take A Spin with Me" -- Resist Handling Training classes on the Headway for January 2009 Message-ID: <496BA7CA.7000402@snf.stanford.edu> * **ANNOUNCEMENT: "Take A Spin with Me" -- Resist Handling Training on the Headway Coater. * Greetings SNF Lab Users, I will be conducting my next *"Take A Spin with Me" *training classes Tuesday January 13 and 27th, 2009 from 10:15 AM - 12:30 PM. This is a great opportunity for you to get acquainted with the specific points to employ when working with our Ebeam or Optical Resist materials in order to obtain high quality thin film coatings over your wafers for Electron Beam, Scanning Probe (SPL), and Optical Lithography. In these applications accurate control of polymer thickness is important in order to obtain consistent high quality lithography results. We will be conducting this training on the Headway Spin Coater. Users attending this session will gain their qualification on this tool and also learn to perform thin film measurements on the Nanospec TFA measurement tool. This is a Hands-On Lab Session, please have your substrates clean and ready to coat on the Headway Coater. Class Schedule: 10:15 - 11:00 I will start with substrate cleans on WET BENCH NONMETAL performing Pirhana clean and HF etching of the intrinsic native oxide on Silicon wafers. All users must have their substrates cleaned and ready to go for spinning by the session time; either coming out of the 150 degree Singe oven, or if you are working on oxides or nitrides, coming out of the YES HMDS Prime oven directly. 11:00 - 12:00 We can apply what ever resist system you desire for your work. 12:00 - 12:30 Thin Film Measurements on the Nanospec Thin Film Analyzer All interested parties are welcome to attend this session. Thank you for your interest in Ebeam and Optical Lithography at Stanford Nanofabrication Facility, James W. Conway Ebeam Technology Group Stanford Nanofabrication Facility 650-725-7075 office hour Tuesday - Friday 8:30 - 9:30 AM CIS 31 -------------- next part -------------- An HTML attachment was scrubbed... URL: