From emyers at snf.stanford.edu Wed May 23 08:50:48 2012 From: emyers at snf.stanford.edu (emyers at snf.stanford.edu) Date: Wed, 23 May 2012 08:50:48 -0700 Subject: Comment intlvac_sputter SNF 2012-05-23 08:50:48: TiO2 and Al-Si Targets Message-ID: TiO2 in AC/DC 1 and 2 cathodes. Al-Si in RF cathode From emyers at snf.stanford.edu Wed May 30 09:21:56 2012 From: emyers at snf.stanford.edu (emyers at snf.stanford.edu) Date: Wed, 30 May 2012 09:21:56 -0700 Subject: Comment intlvac_sputter SNF 2012-04-27 17:10:45: Al-Si and Ti Message-ID: Archived From emyers at snf.stanford.edu Wed May 30 09:22:04 2012 From: emyers at snf.stanford.edu (emyers at snf.stanford.edu) Date: Wed, 30 May 2012 09:22:04 -0700 Subject: Comment intlvac_sputter SNF 2012-05-23 08:50:48: TiO2 and Al-Si Targets Message-ID: Archived From emyers at snf.stanford.edu Wed May 30 09:22:53 2012 From: emyers at snf.stanford.edu (emyers at snf.stanford.edu) Date: Wed, 30 May 2012 09:22:53 -0700 Subject: Comment intlvac_sputter SNF 2012-05-30 09:22:53: 2xAl, Ti in RF Message-ID: Installed pure Al in DC/AC cathodes adn Ti in RF cathode From fpurkl at snf.stanford.edu Thu May 31 17:35:07 2012 From: fpurkl at snf.stanford.edu (fpurkl at snf.stanford.edu) Date: Thu, 31 May 2012 17:35:07 -0700 Subject: Problem intlvac_sputter SNF 2012-05-31 17:35:06: pure Al film looks hazy/clouded Message-ID: I ran the 'standard' 400V dual AC receipe with pure Al targets to get a 1um film. The film I got looks fairly hazy/clouded, not shiny as expected from Al. The dep rate was ~ 1/2 compared to what previous user reported. These are the paramters and measurement results: Time: 18.25 min; Pressure=2.72E-2Torr; P=1975-1900W; (start-end value) I=5.48-5.3A; (start-end value) Ar=44.9sccm; Expected thickness 1um; Measured thickness on edge with profilometer: 490-553nm; Sheet resistance w/ Prometrix: 21Ohm+3.25%, >10/49 measurement points didn't work with multiple measurements on 2 wafers.