[intlvac_sputter-pcs] Comment intlvac_sputter SNF 2013-02-08 15:18:38: 900W recipe

maurice at stanford.edu maurice at stanford.edu
Fri Feb 8 15:18:39 PST 2013

Hi, Maurice, 
I deposited Al/Si yesterday using your recipe 900W. Here are some details of the Al film
Deposit time = 50min
stress is 150-190MPa tensile stress
thickness is 1.6um near the flat edge, 1.1um far away from the flat edge.
The film is shinning

More information about the intlvac_sputter-pcs mailing list