From vilanova at snf.stanford.edu Thu Jan 3 10:22:06 2008 From: vilanova at snf.stanford.edu (vilanova at snf.stanford.edu) Date: Thu, 3 Jan 2008 10:22:06 -0800 Subject: Shutdown karlsuss SNF 2007-12-19 07:20:27: holiday shutdown Message-ID: MOnthly lamp changed calibrated . From mahnaz at snf.stanford.edu Fri Jan 4 12:10:39 2008 From: mahnaz at snf.stanford.edu (mahnaz at snf.stanford.edu) Date: Fri, 4 Jan 2008 12:10:39 -0800 Subject: Problem karlsuss SNF 2008-01-04 12:10:38: need to be tested Message-ID: From mahnaz at snf.stanford.edu Fri Jan 4 16:09:55 2008 From: mahnaz at snf.stanford.edu (mahnaz at snf.stanford.edu) Date: Fri, 4 Jan 2008 16:09:55 -0800 Subject: Problem karlsuss SNF 2008-01-04 16:09:55: result of the tests Message-ID: Ran 1 um resist with 1.1 second of exposure in hard contact hardly resolved 2.5 um . I repeat the same test in Vac. mode and got 1.5 um resolved. Ran 1.6 um resist in Vac. mode for 1.6 seconds of exposure and some areas were ok but the left side of the wafer had not cleared. I do not think that I should use higher exposure as the L/s are ok on the other side of the wafer. Either is caused by the aligner or developer, not sure need more testing. I have logged all the information in the binder next to the tool. From gsosa at snf.stanford.edu Mon Jan 7 08:55:49 2008 From: gsosa at snf.stanford.edu (gsosa at snf.stanford.edu) Date: Mon, 7 Jan 2008 08:55:49 -0800 Subject: Problem karlsuss SNF 2008-01-04 16:09:55: result of the tests Message-ID: Checked and recalibrated lamp power supply. Intensity was low at 13.2mw/cm2. Calibrated to 15 mw/cm2. Need to retest. From mahnaz at snf.stanford.edu Thu Jan 10 10:43:35 2008 From: mahnaz at snf.stanford.edu (mahnaz at snf.stanford.edu) Date: Thu, 10 Jan 2008 10:43:35 -0800 Subject: Problem karlsuss SNF 2008-01-10 10:43:34: needs Z adjustment Message-ID: Mario and I ran a test in hard contact and looks pretty bad . From mahnaz at snf.stanford.edu Fri Jan 11 15:10:23 2008 From: mahnaz at snf.stanford.edu (mahnaz at snf.stanford.edu) Date: Fri, 11 Jan 2008 15:10:23 -0800 Subject: Problem karlsuss SNF 2008-01-11 15:10:22: Mario did grab Z Message-ID: Mario shot two wafers and for 1 um resist with 1.4 seconds of exposure still no good. needs intensity check , i think that is low. From vilanova at snf.stanford.edu Mon Jan 14 08:27:06 2008 From: vilanova at snf.stanford.edu (vilanova at snf.stanford.edu) Date: Mon, 14 Jan 2008 08:27:06 -0800 Subject: Comment karlsuss SNF 2008-01-14 08:27:05: Recalibrated lamp. Message-ID: Waiting for Mahanz To check and see if the exposure Improved after the lamp was calibrated today. From mtang at snf.stanford.edu Mon Jan 14 09:35:12 2008 From: mtang at snf.stanford.edu (mtang at snf.stanford.edu) Date: Mon, 14 Jan 2008 09:35:12 -0800 Subject: Problem karlsuss SNF 2008-01-14 09:35:11: Resolution problems Message-ID: Please be aware... Resolution below about 4 microns is not guaranteed. We are leaving this up because karlsuss2 is hard down with a power supply problem. From kimsangb at snf.stanford.edu Tue Jan 15 01:06:22 2008 From: kimsangb at snf.stanford.edu (kimsangb at snf.stanford.edu) Date: Tue, 15 Jan 2008 01:06:22 -0800 Subject: Problem karlsuss SNF 2008-01-15 01:06:22: grab image function Message-ID: When I grabbed image from the mask, the image on the screen was oscillating. The problem disappeared after the first wafer. Is there a quick-fix for this problem? From tura at snf.stanford.edu Thu Jan 17 19:20:15 2008 From: tura at snf.stanford.edu (tura at snf.stanford.edu) Date: Thu, 17 Jan 2008 19:20:15 -0800 Subject: Problem karlsuss SNF 2008-01-17 19:20:14: Alignment problems Message-ID: I align my alignment marks to <1um misalignment but the patterns come out with ~3-5um misalignment. Machine is useless if your margin of alignment error is less than 5-6um. From nevran at snf.stanford.edu Tue Jan 22 17:09:01 2008 From: nevran at snf.stanford.edu (nevran at snf.stanford.edu) Date: Tue, 22 Jan 2008 17:09:01 -0800 Subject: Problem karlsuss SNF 2008-01-22 17:09:01: Wafer vacuum loss error Message-ID: Got above error on 2 wafers out of 10. From jparker at snf.stanford.edu Thu Jan 24 10:02:43 2008 From: jparker at snf.stanford.edu (jparker at snf.stanford.edu) Date: Thu, 24 Jan 2008 10:02:43 -0800 Subject: Comment karlsuss SNF 2008-01-24 10:02:42: Exposure ok Message-ID: -Exposure seems to be back to normal: -Ran 1um 3612 (vac/1.2s), got 1.5um Lines&Spaces to clear over whole wafer. 1um lines definitely overexposed, so recommend standard 1.1s or 1.0s exposure for this thickness again. -Ran 1.6um 3612 (vac/1.6s), got 1.5um Lines&Spaces to clear over whole wafer. -Did not run alignment to see tura's issue and did not run enough wafers to see nevran's issue come up. From jparker at snf.stanford.edu Thu Jan 24 10:28:46 2008 From: jparker at snf.stanford.edu (jparker at snf.stanford.edu) Date: Thu, 24 Jan 2008 10:28:46 -0800 Subject: Comment karlsuss SNF 2008-01-24 10:28:45: Addition: above jparker message Message-ID: Had Mahnaz look at wafers, she noticed dark field Lines&Spaces had much more issues with clearing (all above comments about L&S in light field (with no resist nearby)). M.M. doesn't see consistent resolution at 2um or less. From closega at snf.stanford.edu Thu Jan 24 15:24:50 2008 From: closega at snf.stanford.edu (closega at snf.stanford.edu) Date: Thu, 24 Jan 2008 15:24:50 -0800 Subject: Comment karlsuss SNF 2008-01-24 15:24:50: Alignment OK Message-ID: Unlike what was reported earlier by another user, my alignment accuracy was within specs. Alignment error < 1um, after hard contact exposure of 1um 3612. From julesvan at snf.stanford.edu Sat Jan 26 19:49:25 2008 From: julesvan at snf.stanford.edu (julesvan at snf.stanford.edu) Date: Sat, 26 Jan 2008 19:49:25 -0800 Subject: Comment karlsuss SNF 2008-01-26 19:49:22: loadslide Message-ID: loadslide will not stay in unless locked in place. From vilanova at snf.stanford.edu Mon Jan 28 10:37:54 2008 From: vilanova at snf.stanford.edu (vilanova at snf.stanford.edu) Date: Mon, 28 Jan 2008 10:37:54 -0800 Subject: Comment karlsuss SNF 2008-01-26 19:49:22: loadslide Message-ID: adjusted maskloader slide.