Postbake of SPR220-7

[Yu-Ju Lin]

Hi all,

I have a question about the postbake time of SPR220-7; the sample will go
to either plasma etcher(O2/CF4) for ~15 minutes, or go to wet etching for
< 10 minutes.

Could anybody tell me the postbake temperature/time which would be good
for both dry/wet etch mentioned above?

Thanks a lot for the help,

Yu-ju