Postbake of SPR220-7

Yu-Ju Lin yjlin at stanford.edu
Thu Feb 7 11:23:35 PST 2002


Hi all,

I have a question about the postbake time of SPR220-7; the sample will go
to either plasma etcher(O2/CF4) for ~15 minutes, or go to wet etching for
< 10 minutes.

Could anybody tell me the postbake temperature/time which would be good
for both dry/wet etch mentioned above?

Thanks a lot for the help,

Yu-ju




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