Deep UV LAMP
hjkim at exch.hpl.hp.com
Fri Feb 13 15:24:07 PST 2004
I'm wondering if it's OK for you to have "karlsuss2" under DUV, instead of karlsuss,
for my patterns with 0.8 um features & 2 um pitch somehow survive only with
karlsuss but not with karlsuss2.. (with using 0.88-thick 3612 resist) I've already
been waiting a couple of days for the tool to be released, and I'm asking you if it's
possible to switch the tool over the weekend.
ps. I've been placing my oxide wafers inside 110C oven since last night
to see how long HMDS is effective for my process. I'd appreciate
if you bear with me storing them until tomorrow afternoon. Thanks a lot!
1501 Page Mill Rd, MS 1198
Palo Alto, CA 94304
(650) 857-8525 / 8948 FAX
hjkim at hpl.hp.com
From: eddy [mailto:vilanova at snf.stanford.edu]
Sent: Friday, February 13, 2004 11:10 AM
To: karlsuss at snf.stanford.edu
Subject: Deep UV LAMP
Just to let everyone know that equipment will be under DEEP UV MODE Until tuesday morning ( 10:00 AM) 2/17/03 , people with reservations on karlsuss one can use karlsuss 2 .
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