Deep UV LAMP
rcrane at snf.stanford.edu
Fri Feb 13 15:51:44 PST 2004
Karlsuss is the only tool for DUV and I can not change it back until
Tuesday morning (requires bulb, filters, and mirror change out and
realignment of the light path). The field engineer for Karl Suss was to
look at both tools on Thursday but he was delayed until 7:00 this
morning so the DUV users were delayed. With Mike being out ill today, I
have no way to change it back this afternoon. I sorry for the
inconvenience I may have caused you.
"Kim, Han-jun" wrote:
> Hi, I'm wondering if it's OK for you to have "karlsuss2" under DUV,
> instead of karlsuss,for my patterns with 0.8 um features & 2 um
> pitch somehow survive only with karlsuss but not with karlsuss2..
> (with using 0.88-thick 3612 resist) I've already been waiting a couple
> of days for the tool to be released, and I'm asking you if
> it's possible to switch the tool over the weekend.best
> regards,Hanjun ps. I've been placing my oxide wafers inside 110C oven
> since last night to see how long HMDS is effective for my process.
> I'd appreciate if you bear with me storing them until tomorrow
> afternoon. Thanks a lot! =============================
> Han-Jun Kim
> Hewlett-Packard Lab.
> 1501 Page Mill Rd, MS 1198
> Palo Alto, CA 94304
> (650) 857-8525 / 8948 FAX
> hjkim at hpl.hp.com
> -----Original Message-----
> From: eddy [mailto:vilanova at snf.stanford.edu]
> Sent: Friday, February 13, 2004 11:10 AM
> To: karlsuss at snf.stanford.edu
> Subject: Deep UV LAMP
> Just to let everyone know that equipment will be under DEEP
> UV MODE Until tuesday morning ( 10:00 AM) 2/17/03 , people
> with reservations on karlsuss one can use karlsuss 2 .
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