From mahnaz at stanford.edu Fri Apr 11 15:23:29 2008 From: mahnaz at stanford.edu (Mahnaz Mansourpour) Date: Fri, 11 Apr 2008 15:23:29 -0700 Subject: resolution Message-ID: <47FFE4E1.3090800@stanford.edu> Hello all, Few of you reported bad result. The lamp has been changed and I ran a 1 um 3612 at 1.1 second of exposure, 1 um line and space was resolved across the wafer. Looked beautiful. Happy processing. mahnaz From cearhart at stanford.edu Tue Apr 15 00:23:09 2008 From: cearhart at stanford.edu (Chris Earhart) Date: Tue, 15 Apr 2008 00:23:09 -0700 Subject: Exposure times Message-ID: <131c1bff0804150023i6e8011b6seb48df544be7f1e2@mail.gmail.com> Hi everyone, Can someone let me know the current recommended exposure times for SPR220-3 3 micron and SPR220-7 resists? Thanks, Chris From sjo at stanford.edu Tue Apr 15 15:55:25 2008 From: sjo at stanford.edu (Sebastian J. Osterfeld) Date: Tue, 15 Apr 2008 15:55:25 -0700 Subject: Exposure times In-Reply-To: <131c1bff0804150023i6e8011b6seb48df544be7f1e2@mail.gmail.com> References: <131c1bff0804150023i6e8011b6seb48df544be7f1e2@mail.gmail.com> Message-ID: <4805325D.9040004@stanford.edu> Hi Chris, I had some trouble with SPR220 in the past, basically it exposes quickly, but development can take up to 20 minutes! Generally, slight overexposure is best, especially if you can live with slightly rounded edges. I would try: SPR220-7 @ 15 microns - 30 seconds exposure SPR220-7 @ 7 microns - 15 seconds exposure SPR220-3 @ 3 microns - 7 seconds exposure Best regards, Sebastian > Hi All, > > After some experimentation, it turns out that it is the development > that is unusual on SPR220-7 (15 microns), not the exposure. > > I used 1 coat of SPR220-7, exposed at 30 seconds. It develops fine, > but due to the lack of agitation, it takes a *very* long time on the > track - up to 20 minutes (4x the entire 7 micron develop program). > This was the step that was difficult to figure out, since from 3612 > (any thickness) my experience was that anything which doesn't develop > within three minutes will not develop at all and is a sign of > underexposure. > > Final thickness after hard bake was something like 12 microns. > > > Sebastian Let me know if this helps, Sebastian Chris Earhart wrote: > Hi everyone, > > Can someone let me know the current recommended exposure times for > SPR220-3 3 micron and SPR220-7 resists? > > Thanks, > > Chris > -- Sebastian J. Osterfeld Ph.D. Candidate, Shan X. Wang Group Dept. of Materials Science & Engineering Stanford University McCullough Building, Room 208A 476 Lomita Mall Stanford, CA 94305-4045 Phone: (650) 906-1946 Fax: (650) 736-1984 Email: sjo at stanford.edu Office: http://maps.google.com/maps?f=q&hl=en&q=w122.1732+n37.4275&ll=37.427502,-122.173204&spn=0.006296,0.013561&t=h -------------- next part -------------- An HTML attachment was scrubbed... URL: