1.6um resist exposure time

[Arash Hazeghi]

Bei,
Based on the recommendation from other users I used 1.6sec + 90sec post bake
@115C. patterns came out good.

Thanks,
Arash

-----Original Message-----
From: bli003 at student.ucr.edu [mailto:bli003 at student.ucr.edu] 
Sent: Thursday, March 06, 2008 10:37 AM
To: Arash Hazeghi
Subject: Re: 1.6um resist exposure time

Hi Arash,

I have the same question about the exposure time.
What's the response you got from other users?

Thank you,
Bei

---- Original message ----
>Date: Tue, 4 Mar 2008 17:34:55 -0800
>From: "Arash Hazeghi" <ahazeghi at stanford.edu>  
>Subject: 1.6um resist exposure time  
>To: <karlsuss at snf.stanford.edu>
>
>   Hi,
>
>    
>
>   What is the current exposure time recommended for
>   1.6um 3612 resist for Karlsuss?
>
>    
>
>    
>
>    
>
>   Thanks,
>
>    
>
>   Arash
>
>    
>
>    
>
>    
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