From gsosa at stanford.edu Thu Feb 26 15:31:38 2009 From: gsosa at stanford.edu (Gary J Sosa) Date: Thu, 26 Feb 2009 15:31:38 -0800 (PST) Subject: Mask Cleaner is back up! 2/26/09 Message-ID: <1376184464.178511235691098506.JavaMail.root@zm08.stanford.edu> Hi All.... This note is to let you know that the mask cleaner is back up and running. Please let us know if you have any problems with it. Thanks... Gary From ahryciw at stanford.edu Sat Feb 28 12:11:36 2009 From: ahryciw at stanford.edu (Aaron Hryciw) Date: Sat, 28 Feb 2009 12:11:36 -0800 Subject: Mylar masks on karlsuss? Message-ID: <4d36fb940902281211m78ab0fafj1199a4d664f76f9f@mail.gmail.com> Hi ? I need to expose some large (10s to 100s of um) features on an SOI piece fairly quickly. The SNF maskmaking page mentions the possibility of using mylar transparency masks for quick turnaround on designs with non-critical features, but I can't seem to find which exposure tools can use such masks. Is this possible on karlsuss? If so, if anyone could point me to some more info (or offer personal advice) about making transparency masks for karlsuss in particular, I would be very grateful! Cheers! ? Aaron -- Dr. Aaron Hryciw Postdoctoral Scholar Geballe Laboratory for Advanced Materials Stanford University 476 Lomita Mall (04-490) McCullough Building, Rm. 325 Stanford, CA 94305-4045 Tel.: (650) 723-5840 Fax.: (650) 736-1984 -------------- next part -------------- An HTML attachment was scrubbed... URL: