From mahnaz at stanford.edu Mon May 3 10:44:52 2010 From: mahnaz at stanford.edu (Mahnaz Mansourpour) Date: Mon, 03 May 2010 10:44:52 -0700 Subject: FSE Visit Message-ID: <4BDF0B94.5010903@stanford.edu> hello all, I have been told that there will be a visit on Wednesday May 5th , not sue of the arrival time but please when the fse gets here, he has priority on the tools. We will work on one tool at the time. mahnaz From mahnaz at stanford.edu Wed May 5 17:17:25 2010 From: mahnaz at stanford.edu (Mahnaz Mansourpour) Date: Wed, 05 May 2010 17:17:25 -0700 Subject: update Message-ID: <4BE20A95.9070502@stanford.edu> Same as before, even FSE is confused. I shot few wafers the ring still there. He did find breakage to the hose that supplies vacuum to chuck but I guess that was not the issue as much. Decided back to work on the system tomorrow. Okay for non critical work. mahnaz From mahnaz at stanford.edu Fri May 7 11:16:30 2010 From: mahnaz at stanford.edu (Mahnaz Mansourpour) Date: Fri, 07 May 2010 11:16:30 -0700 Subject: update on fse work Message-ID: <4BE458FE.2000301@stanford.edu> Hello all, Here is the update on the work we did on karlsuss 1 the last few days. The WEC head was out of order, so was removed and rebuild. Many adjustment was made to areas that usually should not be adjusted. Found a tear on the vacuum line to the mask holder and corrected that. Adjusted throttle on nitrogen flow from 1 turn to 2 turns flow. after all these adjustment i still was not happy with resolution when we tried different mask holder it al looked better. I took the original light weighted mask holder out and replaced it with another one that we had gotten a a donation while back. Please do not bang or drop the mask holder on the table. Please let us know of any problem and issues with the system and let Gary and Mario know about first. mahnaz From mahnaz at stanford.edu Fri May 7 11:58:53 2010 From: mahnaz at stanford.edu (Mahnaz Mansourpour) Date: Fri, 07 May 2010 11:58:53 -0700 Subject: New mask HOLDER Message-ID: <4BE462ED.8000702@stanford.edu> Hello all, Please note that there is a NEW MASK HOLDER. It does look slightly different if any question let us know. mahnaz From tdo at stanford.edu Thu May 13 11:28:50 2010 From: tdo at stanford.edu (Thomas O'Sullivan) Date: Thu, 13 May 2010 11:28:50 -0700 Subject: karlsuss2 users: please read Message-ID: <4BEC44E2.4020800@stanford.edu> Hi all, For the past 3 weeks, those of us who work with small pieces have been unable to get a good (better than 5um) alginment on karlsuss2. While the mask appears aligned even when in contact (soft vacuum), after exposure there is a ~5um random rotation causing an unacceptable misalignment. We are trying to determine if this is a problem with the pieces chuck itself. Has anyone experienced this problem when exposing full wafers? Note the shift is on the order of 3-5um, so you may not even notice if you don't have that high of an alignment tolerance. Thanks, Tom -- Thomas D. O'Sullivan Ph.D. Candidate, Electrical Engineering Center for Integrated Systems Stanford University 420 Via Palou, CIS-X Room B113 Stanford, CA 94305-4075 o: (650)725-6970 c: (708)261-5383 f: (650)723-4659 http://snow.stanford.edu/~tdo/ From tdo at stanford.edu Thu May 13 13:34:41 2010 From: tdo at stanford.edu (Thomas O'Sullivan) Date: Thu, 13 May 2010 13:34:41 -0700 Subject: karlsuss2 users: please read In-Reply-To: <4BEC44E2.4020800@stanford.edu> References: <4BEC44E2.4020800@stanford.edu> Message-ID: <4BEC6261.2050104@stanford.edu> A follow-up on my note which will hopefully helps users decide how to proceed: 1) Karlsuss2 and using the yellow-tape trick to cover a full wafer chuck produces similar (problematic) results 2) Karlsuss1 does not show this problem for the piece chuck or the yellow tape - so that appears to be the way to go for now. Thanks, Tom On 05/13/10 11:28, Thomas O'Sullivan wrote: > Hi all, > For the past 3 weeks, those of us who work with small pieces have been > unable to get a good (better than 5um) alginment on karlsuss2. While > the mask appears aligned even when in contact (soft vacuum), after > exposure there is a ~5um random rotation causing an unacceptable > misalignment. > > We are trying to determine if this is a problem with the pieces chuck > itself. > > Has anyone experienced this problem when exposing full wafers? Note > the shift is on the order of 3-5um, so you may not even notice if you > don't have that high of an alignment tolerance. > > Thanks, > Tom > >