Comment karlsuss2 2002-10-22 11:57:57: low vac contact mode

rfasch at snf.stanford.edu rfasch at snf.stanford.edu
Tue Oct 22 11:57:58 PDT 2002


Hi,
I used the low vac contact mode. My mask was clean an I baked my wafer 10 min longer at 90 degree to avoid sicking. (1.6 um resist)  But  after the exposure the wafers sticked on the mask. I think the vaccum is a little bit to high.  Could you please adjust it.
Thanks
-Rainer 




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