Problem karlsuss2 SNF 2006-01-04 18:17:15: 20X objective blurry

crichter at crichter at
Wed Jan 4 18:17:16 PST 2006

I'm doing a topside alignment in vacuum contact mode. As I align the cross hairs from layer 1 to the mask alignment features, I can't get the 20X objective to look sharp enough to line it up with the features on the wafer. It lookblurry and cannot get the wafer features in focus with the mask features.

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