Comment karlsuss2 SNF 2006-11-14 15:11:38:

uyoon at snf.stanford.edu uyoon at snf.stanford.edu
Tue Nov 14 15:11:39 PST 2006


Did a exposure test after mirror and lamp changes.
1.3 sec with vac contact still has a very small amount of resist 
on the flat and left side.
1.5 sec looked good, but resist lines look bigger than spaces(a little over exposed) .
With 1.5 sec exposure, wafer looked completely developed off.
Until we find out why exposure time drifted off, please do a test run first before exposing your run wafers.
Please use exposure time between 1.3 sec-1.5 sec. for 1 um resist.
Good luck.




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