Problem karlsuss2 SNF 2006-10-06 18:54:26: Lamp intensity low

kkumar at snf.stanford.edu kkumar at snf.stanford.edu
Fri Oct 6 18:54:26 PDT 2006


I exposed 7um resist for 10 sec (hard contact) on KarlSuss 2, and after developing still found resist in the trenches that were supposed to be removed. minimum feature size on the mask is over 200um. After performing the exact same process using KarlSuss 1, there was no such problem.




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