Comment karlsuss2 SNF 2006-10-09 11:58:10: hard contact with 1.1 sec was under exposed.

uyoon at snf.stanford.edu uyoon at snf.stanford.edu
Mon Oct 9 11:58:11 PDT 2006


increased exposure time to 1.3 sec, wafer looked good.
1.5 um line/space resolved on all 5 location. some location, even 1um l/s looked good.




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