Comment karlsuss2 SNF 2008-01-24 10:05:21: Exposure ok

jparker at snf.stanford.edu jparker at snf.stanford.edu
Thu Jan 24 10:05:21 PST 2008


-Exposure ok post-lamp-change:
-1um 3612 (vac 1.0s) has 1.5um lines&spaces clear everywhere. Noticable line edge roughness on most 1um lines.
-1.6um 3612 (vac 1.6s) has 1.5um lines&spaces clear on most of the wafer. 2um L&S clear everywhere.




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