From vilanova at snf.stanford.edu Wed Feb 18 08:43:59 2009 From: vilanova at snf.stanford.edu (vilanova at snf.stanford.edu) Date: Wed, 18 Feb 2009 08:43:59 -0800 Subject: Comment karlsuss2 SNF 2009-02-18 08:43:58: MOnthly Lamp Completed: Message-ID: monthly lamp completed: intensity = 15Mw/cm2 Uniformity= 1.4% From sclaussen at snf.stanford.edu Mon Feb 23 12:41:22 2009 From: sclaussen at snf.stanford.edu (sclaussen at snf.stanford.edu) Date: Mon, 23 Feb 2009 12:41:22 -0800 Subject: Problem karlsuss2 SNF 2009-02-23 12:41:22: Mask broke in karlsuss2 Message-ID: My mask broke while I was using the karlsuss2 in vacuum mode this morning to expose a piece. I had last used the 20x objective lense to align my piece, and it seems that this may have bumped into the mask at some point after the exposure. However, this is just a possibility. I cleaned up the large mask chunks and as much of the small bits of glass, but there may still be lots of particles around. Be careful, both for your safety and your process. From gsosa at snf.stanford.edu Mon Feb 23 12:49:58 2009 From: gsosa at snf.stanford.edu (gsosa at snf.stanford.edu) Date: Mon, 23 Feb 2009 12:49:58 -0800 Subject: Shutdown karlsuss2 SNF 2009-02-23 12:49:57: Mask Broken Message-ID: Mask broken in tool . Need to clean up and test From gsosa at snf.stanford.edu Mon Feb 23 14:23:53 2009 From: gsosa at snf.stanford.edu (gsosa at snf.stanford.edu) Date: Mon, 23 Feb 2009 14:23:53 -0800 Subject: Shutdown karlsuss2 SNF 2009-02-23 12:49:57: Mask Broken Message-ID: Inspected and cleaned all critical surfaces. Loaded dummy mask amn wafer and tested system. All OK. Checked objective clearance- ,OK. . System ready to use. From gsosa at snf.stanford.edu Mon Feb 23 14:24:00 2009 From: gsosa at snf.stanford.edu (gsosa at snf.stanford.edu) Date: Mon, 23 Feb 2009 14:24:00 -0800 Subject: Problem karlsuss2 SNF 2009-02-23 12:41:22: Mask broke in karlsuss2 Message-ID: Inspected and cleaned all critical surfaces. Loaded dummy mask amn wafer and tested system. All OK. Checked objective clearance- ,OK. . System ready to use. From jwc at snf.stanford.edu Tue Feb 24 18:32:29 2009 From: jwc at snf.stanford.edu (jwc at snf.stanford.edu) Date: Tue, 24 Feb 2009 18:32:29 -0800 Subject: Problem karlsuss2 SNF 2009-02-24 18:32:28: user reports of problems in WEC Message-ID: Faridz and another user reported to me that the WEC does not function properly and positional shift is evident as wafer is brought up into proximity for the exposure. several exposures were observed to be shifted and these wafers will have to be reworked. evidently a previous new user unidentified was working on the other KS -- he/she had problems and then moved onto this tool and then the current problem surfaced. likely training issues -- new users need to have mentors for their first days on the tool. JWC From vilanova at snf.stanford.edu Wed Feb 25 07:11:51 2009 From: vilanova at snf.stanford.edu (vilanova at snf.stanford.edu) Date: Wed, 25 Feb 2009 07:11:51 -0800 Subject: Problem karlsuss2 SNF 2009-02-24 18:32:28: user reports of problems in WEC Message-ID: There was no problem with The WEC , I put OUr mask and Exposed A wafer , the system is FIne, User was probably having Dificulties Running the system Alone , I recommend to (him/her ) TO come in when Staff is here so we can help If theyre not sure of what they're doing. System Ok to use. From vilanova at snf.stanford.edu Fri Feb 27 09:35:59 2009 From: vilanova at snf.stanford.edu (vilanova at snf.stanford.edu) Date: Fri, 27 Feb 2009 09:35:59 -0800 Subject: Comment karlsuss2 SNF 2009-02-27 09:35:59: MASK PLATE HOLDER Message-ID: WE HAVE TAKEN THE MASK PLATE HOLDER OUT FOR REPAIR WE WILL BRING IT BACK ON MONDAY ( THE ONE WE HAD WAS FUUL OF SCRATCHES AND WAS CREATING A LOT OF PARTICLES WE WELL GET IT BACK ON MONDAY FOR NOW USE THE CART NEXT TO KARLSUSS TO PUT YOUR MASK ON.