From lindaw at snf.stanford.edu Mon Mar 2 15:34:08 2009 From: lindaw at snf.stanford.edu (lindaw at snf.stanford.edu) Date: Mon, 2 Mar 2009 15:34:08 -0800 Subject: Problem karlsuss2 SNF 2009-03-02 15:34:07: lamp intensity 13.6 max CI1 Message-ID: THe lamp intensity is only reading at a maximum of 13.6, and the power supply is beeping during exposure. optimum value is supposed to be 15 on CI1. From gsosa at snf.stanford.edu Tue Mar 3 08:14:29 2009 From: gsosa at snf.stanford.edu (gsosa at snf.stanford.edu) Date: Tue, 3 Mar 2009 08:14:29 -0800 Subject: Problem karlsuss2 SNF 2009-03-02 15:34:07: lamp intensity 13.6 max CI1 Message-ID: Checked and calibrated the lamp power supply. Intensity is at 15 mw/cm2 and uniformity is 1.9% From vilanova at snf.stanford.edu Thu Mar 5 07:35:32 2009 From: vilanova at snf.stanford.edu (vilanova at snf.stanford.edu) Date: Thu, 5 Mar 2009 07:35:32 -0800 Subject: Comment karlsuss2 SNF 2009-03-05 07:35:32: MICROMETER (Y) OUT OF POSITION Message-ID: SOMEONE IS MOVING THE MICROMETER ALL THE WAY I CAME IN TODAY AND DURING MY ROUTINE WALKS I FOUND THAT OUT ,PLEASE DO NOT FORCE THE MICROMETER THIS WILL MAKE ALMOST IMPOSSIBLE FOR THE NEXT USER TO ALIGNT THEIR WAFERS!!!!!! From jwpchen at snf.stanford.edu Fri Mar 13 18:31:06 2009 From: jwpchen at snf.stanford.edu (jwpchen at snf.stanford.edu) Date: Fri, 13 Mar 2009 18:31:06 -0700 Subject: Problem karlsuss2 SNF 2009-03-13 18:31:06: loss of mask vacuum Message-ID: to avoid same problem as ks #1, I used hard contact mode instead of lo-vac. however still heard the click/pop (louder than the usual wec sound) after exposure, and machine reports 'loss of mask vacuum'. mask is still attached to holder this time. unloaded wafer and mask, but machine still hisses from the wec area. vaccum seal gauge reading becomes lower than normal. wafer has 7um resist, which may be more sticky due to >10um at nonuniform areas. From ehe at snf.stanford.edu Sat Mar 14 11:32:09 2009 From: ehe at snf.stanford.edu (ehe at snf.stanford.edu) Date: Sat, 14 Mar 2009 11:32:09 -0700 Subject: Comment karlsuss2 SNF 2009-03-14 11:32:09: no problem with exposure Message-ID: per previous problem report, hissing stops when you load your wafer; time was set on 190s (maybe you baked your resist into your mask, which might explain sticking) loud pop was probably the vacuum chuck trying to pull your chip back down after it stuck to your mask From jwpchen at stanford.edu Sat Mar 14 15:05:36 2009 From: jwpchen at stanford.edu (Peter Chen) Date: Sat, 14 Mar 2009 15:05:36 -0700 Subject: Comment karlsuss2 SNF 2009-03-14 11:32:09: no problem with exposure In-Reply-To: <20090314183209.C59AE51C668@smtp2.stanford.edu> References: <20090314183209.C59AE51C668@smtp2.stanford.edu> Message-ID: <49BC2A30.7050507@stanford.edu> I see at least two users in the usage history after I used it, so at least the 190sec wasn't me... -Peter ehe at snf.stanford.edu wrote: > per previous problem report, hissing stops when you load your wafer; time was set on 190s (maybe you baked your resist into your mask, which might explain sticking) loud pop was probably the vacuum chuck trying to pull your chip back down after it stuck to your mask > From tasyurek at snf.stanford.edu Sun Mar 15 17:18:39 2009 From: tasyurek at snf.stanford.edu (tasyurek at snf.stanford.edu) Date: Sun, 15 Mar 2009 17:18:39 -0700 Subject: Problem karlsuss2 SNF 2009-03-15 17:18:38: vacuum seal not in marked area Message-ID: From vilanova at snf.stanford.edu Mon Mar 16 08:14:54 2009 From: vilanova at snf.stanford.edu (vilanova at snf.stanford.edu) Date: Mon, 16 Mar 2009 08:14:54 -0700 Subject: Problem karlsuss2 SNF 2009-03-13 18:31:06: loss of mask vacuum Message-ID: Came In and I found the system with a hissing noise that happens when someone remove the wafer from the chuck before the exposure complete the routine , Also I found some of the screws that Hold The entire mask Plate Lose I dont know why, I guess because someone was trying to see if they could see where the vacuum leak was coming from, please DO NOT DO THAT!!!! I Initialized the system Put my mask and Exposed a wafer, Vacuum is Good and there is no Hissing NOise Or vacuum Leaks, Remember TO clean the chuck and the mask Prior to use the system, sometimes people use Tape on the chuck wich makes the wafer stick to the mask , Clean it with Isopropyl and if you have problems come in when stuff is here so we can help with the issues. From vilanova at snf.stanford.edu Mon Mar 16 08:15:00 2009 From: vilanova at snf.stanford.edu (vilanova at snf.stanford.edu) Date: Mon, 16 Mar 2009 08:15:00 -0700 Subject: Comment karlsuss2 SNF 2009-03-14 11:32:09: no problem with exposure Message-ID: Came In and I found the system with a hissing noise that happens when someone remove the wafer from the chuck before the exposure complete the routine , Also I found some of the screws that Hold The entire mask Plate Lose I dont know why, I guess because someone was trying to see if they could see where the vacuum leak was coming from, please DO NOT DO THAT!!!! I Initialized the system Put my mask and Exposed a wafer, Vacuum is Good and there is no Hissing NOise Or vacuum Leaks, Remember TO clean the chuck and the mask Prior to use the system, sometimes people use Tape on the chuck wich makes the wafer stick to the mask , Clean it with Isopropyl and if you have problems come in when stuff is here so we can help with the issues. From vilanova at snf.stanford.edu Mon Mar 16 08:15:07 2009 From: vilanova at snf.stanford.edu (vilanova at snf.stanford.edu) Date: Mon, 16 Mar 2009 08:15:07 -0700 Subject: Problem karlsuss2 SNF 2009-03-15 17:18:38: vacuum seal not in marked area Message-ID: Came In and I found the system with a hissing noise that happens when someone remove the wafer from the chuck before the exposure complete the routine , Also I found some of the screws that Hold The entire mask Plate Lose I dont know why, I guess because someone was trying to see if they could see where the vacuum leak was coming from, please DO NOT DO THAT!!!! I Initialized the system Put my mask and Exposed a wafer, Vacuum is Good and there is no Hissing NOise Or vacuum Leaks, Remember TO clean the chuck and the mask Prior to use the system, sometimes people use Tape on the chuck wich makes the wafer stick to the mask , Clean it with Isopropyl and if you have problems come in when stuff is here so we can help with the issues. From vilanova at snf.stanford.edu Wed Mar 18 07:30:00 2009 From: vilanova at snf.stanford.edu (vilanova at snf.stanford.edu) Date: Wed, 18 Mar 2009 07:30:00 -0700 Subject: Shutdown karlsuss2 SNF 2009-03-18 07:29:59: Monthly Lamp Change In progress.... Message-ID: From vilanova at snf.stanford.edu Wed Mar 18 08:34:10 2009 From: vilanova at snf.stanford.edu (vilanova at snf.stanford.edu) Date: Wed, 18 Mar 2009 08:34:10 -0700 Subject: Shutdown karlsuss2 SNF 2009-03-18 07:29:59: Monthly Lamp Change In progress.... Message-ID: Monthly Lamp and calibration Completed: Intensity 15.0Mw/Cm2 Uniformity= 1.% From vilanova at snf.stanford.edu Fri Mar 20 09:40:55 2009 From: vilanova at snf.stanford.edu (vilanova at snf.stanford.edu) Date: Fri, 20 Mar 2009 09:40:55 -0700 Subject: Comment karlsuss2 SNF 2009-02-27 09:35:59: MASK PLATE HOLDER Message-ID: Plate holder is back and Installed.- MV/GS From elvislin at snf.stanford.edu Mon Mar 23 23:59:14 2009 From: elvislin at snf.stanford.edu (elvislin at snf.stanford.edu) Date: Mon, 23 Mar 2009 23:59:14 -0700 Subject: Problem karlsuss2 SNF 2009-03-23 23:59:13: systematic misalignment Message-ID: I had perfect alignment on the screen, but got misalignment of 3 microns after development. there's something wrong for this machine. either the knob is lose or something else. please have a check, thanks. From sclaussen at snf.stanford.edu Tue Mar 24 22:52:38 2009 From: sclaussen at snf.stanford.edu (sclaussen at snf.stanford.edu) Date: Tue, 24 Mar 2009 22:52:38 -0700 Subject: Problem karlsuss2 SNF 2009-03-24 22:52:38: misalignment during exposure Message-ID: I had a problem similar to elvislin's. My piece was well aligned, even in contact, but after exposure it was misaligned. I believe it shifted down and to the left. I was using vacuum mode. From vilanova at snf.stanford.edu Wed Mar 25 08:58:40 2009 From: vilanova at snf.stanford.edu (vilanova at snf.stanford.edu) Date: Wed, 25 Mar 2009 08:58:40 -0700 Subject: Problem karlsuss2 SNF 2009-03-23 23:59:13: systematic misalignment Message-ID: I 've Adjusted the Wafer Loader and the Left MIcrometer: the left micrometer was almost out of the socket and the Wafer loader was hitting the top of the wec this was causing the misalignments this can cause an "overcurrent " error, Please let us know if this problem show up again. From vilanova at snf.stanford.edu Wed Mar 25 08:58:48 2009 From: vilanova at snf.stanford.edu (vilanova at snf.stanford.edu) Date: Wed, 25 Mar 2009 08:58:48 -0700 Subject: Problem karlsuss2 SNF 2009-03-24 22:52:38: misalignment during exposure Message-ID: 've Adjusted the Wafer Loader and the Left MIcrometer: the left micrometer was almost out of the socket and the Wafer loader was hitting the top of the wec this was causing the misalignments this can cause an "overcurrent " error, Please let us know if this problem show up again. From vilanova at snf.stanford.edu Wed Mar 25 08:59:02 2009 From: vilanova at snf.stanford.edu (vilanova at snf.stanford.edu) Date: Wed, 25 Mar 2009 08:59:02 -0700 Subject: Comment karlsuss2 SNF 2009-03-05 07:35:32: MICROMETER (Y) OUT OF POSITION Message-ID: 've Adjusted the Wafer Loader and the Left MIcrometer: the left micrometer was almost out of the socket and the Wafer loader was hitting the top of the wec this was causing the misalignments this can cause an "overcurrent " error, Please let us know if this problem show up again. From kenney at snf.stanford.edu Thu Mar 26 15:54:15 2009 From: kenney at snf.stanford.edu (kenney at snf.stanford.edu) Date: Thu, 26 Mar 2009 15:54:15 -0700 Subject: Problem karlsuss2 SNF 2009-03-26 15:54:15: Poor alignment Message-ID: Using 1.6 um resist without EBR Wafer and mask appear aligned within 0.5 um when in Z contact on KS2 monitor After development the pattern is misaligned by about 10 um From kimsangb at snf.stanford.edu Fri Mar 27 23:44:51 2009 From: kimsangb at snf.stanford.edu (kimsangb at snf.stanford.edu) Date: Fri, 27 Mar 2009 23:44:51 -0700 Subject: Problem karlsuss2 SNF 2009-03-27 23:44:50: poor alignment again Message-ID: I had the same problem as what the other user reported. The alignment looked great on Monitor in contact but after development it was misaligned by 3um. From lindaw at snf.stanford.edu Mon Mar 30 14:26:15 2009 From: lindaw at snf.stanford.edu (lindaw at snf.stanford.edu) Date: Mon, 30 Mar 2009 14:26:15 -0700 Subject: Comment karlsuss2 SNF 2009-03-30 14:26:15: alignment check button vs align/cont/exp button Message-ID: I have found that if I use the alignment check button (just under the exposure button) to check my alignment, the wafer is brought fully into contact, and I can see if there has been a shift. If there has, then press alignment contact button again to separate the wafer and mask and adjust alignment accordingly. Some people have been seeing alignment problems because they are checking alignment by using the align/cont/exp button above the directional arrows, rather than the alignment check button. I highly recommend using the alignment check button to actually check alignment. Hope that helps. From mahnaz at snf.stanford.edu Mon Mar 30 16:14:19 2009 From: mahnaz at snf.stanford.edu (mahnaz at snf.stanford.edu) Date: Mon, 30 Mar 2009 16:14:19 -0700 Subject: Problem karlsuss2 SNF 2009-03-30 16:14:19: overlay is off Message-ID: I ran a second layer on the tool and: If you use the align check button, the system will show you how much drifts after it goes to contact. Although i separated the wafers and mask and readjusted it and it was perfect alignment after development Left side of the wafer was off more than 10 to 20 um in Y and 10 um in X and right side did slightly better, this is with flat of the wafers toward you. I did not see this drift in Contact/align/expo button. I strongly suggest do not use the system for second or consequent layers, meaning that the system is not able to do overlay at the moment. Move you work to Karlsuss. I am not shutting down the system because still can be used for ONE LAYER ONLY.