Problem karlsuss2 SNF 2009-03-26 15:54:15: Poor alignment

kenney at snf.stanford.edu kenney at snf.stanford.edu
Thu Mar 26 15:54:15 PDT 2009


Using 1.6 um resist without EBR
Wafer and mask appear aligned within 0.5 um when in
Z contact on KS2 monitor
After development the pattern is misaligned by about 10 um




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