From vilanova at snf.stanford.edu Fri May 1 08:12:25 2009 From: vilanova at snf.stanford.edu (vilanova at snf.stanford.edu) Date: Fri, 1 May 2009 08:12:25 -0700 Subject: Shutdown karlsuss2 SNF 2009-05-01 08:12:25: monthly lamp change in progress........ Message-ID: From vilanova at snf.stanford.edu Fri May 1 08:55:18 2009 From: vilanova at snf.stanford.edu (vilanova at snf.stanford.edu) Date: Fri, 1 May 2009 08:55:18 -0700 Subject: Shutdown karlsuss2 SNF 2009-05-01 08:12:25: monthly lamp change in progress........ Message-ID: MOnthly Lamp Completed: Intensity = 15Mw/Cm2 Uniformity = 1% From gsosa at snf.stanford.edu Thu May 7 09:06:32 2009 From: gsosa at snf.stanford.edu (gsosa at snf.stanford.edu) Date: Thu, 7 May 2009 09:06:32 -0700 Subject: Shutdown karlsuss2 SNF 2009-05-07 09:06:31: FSE working on BSA Message-ID: The field service engineer is here to work on BSA and alignment problems. From gsosa at snf.stanford.edu Thu May 7 17:19:32 2009 From: gsosa at snf.stanford.edu (gsosa at snf.stanford.edu) Date: Thu, 7 May 2009 17:19:32 -0700 Subject: Shutdown karlsuss2 SNF 2009-05-07 09:06:31: FSE working on BSA Message-ID: Unable to focus on mask with BSA microscopes. Checked and reseated all connectors associated with BSA microscopes. Checked voltages on distribution board. Voltage OK at + and - 10VDC referenced to ground. Checked voltage on power supply in DVM unit. All OK- +/- 5 VDC and +/- 12 VDC. Rechecked BSA focus. Now able to focus on mask with BSA microscopes. FSE verified setup with BSA setup mask- All OK.. No adjustment needed. FSE checked WEC level- OK, no adjustment needed. FSE checked WEC spring force tension. Tension too high at 1200 newtons. Adjusted WEC pressure for 850 newtons. PLEASE do not adjust WEC pressure. Vendor is still working on alignment issues and will retur tomorrow. BSA OK to use TSA OK to use . Please continue to follow instructions posted on tool for fine alignmnet. From gsosa at snf.stanford.edu Thu May 7 17:19:49 2009 From: gsosa at snf.stanford.edu (gsosa at snf.stanford.edu) Date: Thu, 7 May 2009 17:19:49 -0700 Subject: Problem karlsuss2 SNF 2009-04-27 10:34:55: back side focus out Message-ID: Unable to focus on mask with BSA microscopes. Checked and reseated all connectors associated with BSA microscopes. Checked voltages on distribution board. Voltage OK at + and - 10VDC referenced to ground. Checked voltage on power supply in DVM unit. All OK- +/- 5 VDC and +/- 12 VDC. Rechecked BSA focus. Now able to focus on mask with BSA microscopes. FSE verified setup with BSA setup mask- All OK.. No adjustment needed. FSE checked WEC level- OK, no adjustment needed. FSE checked WEC spring force tension. Tension too high at 1200 newtons. Adjusted WEC pressure for 850 newtons. PLEASE do not adjust WEC pressure. Vendor is still working on alignment issues and will retur tomorrow. BSA OK to use TSA OK to use . Please continue to follow instructions posted on tool for fine alignmnet. From gsosa at snf.stanford.edu Thu May 7 17:20:02 2009 From: gsosa at snf.stanford.edu (gsosa at snf.stanford.edu) Date: Thu, 7 May 2009 17:20:02 -0700 Subject: Problem karlsuss2 SNF 2009-04-27 11:37:27: Backside alignment focus problem Message-ID: Unable to focus on mask with BSA microscopes. Checked and reseated all connectors associated with BSA microscopes. Checked voltages on distribution board. Voltage OK at + and - 10VDC referenced to ground. Checked voltage on power supply in DVM unit. All OK- +/- 5 VDC and +/- 12 VDC. Rechecked BSA focus. Now able to focus on mask with BSA microscopes. FSE verified setup with BSA setup mask- All OK.. No adjustment needed. FSE checked WEC level- OK, no adjustment needed. FSE checked WEC spring force tension. Tension too high at 1200 newtons. Adjusted WEC pressure for 850 newtons. PLEASE do not adjust WEC pressure. Vendor is still working on alignment issues and will retur tomorrow. BSA OK to use TSA OK to use . Please continue to follow instructions posted on tool for fine alignmnet. From gsosa at snf.stanford.edu Fri May 8 09:01:24 2009 From: gsosa at snf.stanford.edu (gsosa at snf.stanford.edu) Date: Fri, 8 May 2009 09:01:24 -0700 Subject: Shutdown karlsuss2 SNF 2009-05-08 09:01:23: FSE working on system Message-ID: FSE is here to continue working on the alignmnet issues. From mahnaz at snf.stanford.edu Fri May 8 17:37:24 2009 From: mahnaz at snf.stanford.edu (mahnaz at snf.stanford.edu) Date: Fri, 8 May 2009 17:37:24 -0700 Subject: Problem karlsuss2 SNF 2009-03-30 16:14:19: overlay is off Message-ID: As you know for the last two days Karlsuss FSE worked on the kS2 . We tested the system, pretty much all day today and we can not get a perfect wafer to my standard. we know that the WEC is level and the springs that deliver the presser have been changed and performing. We changed the wec presser and few other things but could not get 1.5 um resolved across the wafer. So Gary will leave the system in Yellow. Please use the system, run a test wafer and communicate your result with us. By the way the shift when the wafer and mask went in contact in taken care of. From gsosa at snf.stanford.edu Fri May 8 18:15:43 2009 From: gsosa at snf.stanford.edu (gsosa at snf.stanford.edu) Date: Fri, 8 May 2009 18:15:43 -0700 Subject: Shutdown karlsuss2 SNF 2009-05-08 09:01:23: FSE working on system Message-ID: FSE has finished working on tool. There is an issue with resolution across the wafer when exposing the test mask that we do not understand yet. Resolution across the wafer as roughly 1.5 microns in hard contact mode with 1.2 second exposure. We need to do further testing to understand and resolve the problem. If possible, please shoot and inspect a test wafer before commiting all of you wafers. Please report any problems in Coral. From gsosa at snf.stanford.edu Fri May 8 18:16:15 2009 From: gsosa at snf.stanford.edu (gsosa at snf.stanford.edu) Date: Fri, 8 May 2009 18:16:15 -0700 Subject: Comment karlsuss2 SNF 2009-05-08 18:16:15: Tool Update 5/8/09 Message-ID: FSE has finished working on tool. There is an issue with resolution across the wafer when exposing the test mask that we do not understand yet. Resolution across the wafer as roughly 1.5 microns in hard contact mode with 1.2 second exposure. We need to do further testing to understand and resolve the problem. If possible, please shoot and inspect a test wafer before commiting all of you wafers. Please report any problems in Coral. From quickwin at snf.stanford.edu Sat May 9 12:17:45 2009 From: quickwin at snf.stanford.edu (quickwin at snf.stanford.edu) Date: Sat, 9 May 2009 12:17:45 -0700 Subject: Problem karlsuss2 SNF 2009-05-09 12:17:44: overcurrent error Message-ID: When I was almost done with my job, suddenly my mask dropped onto my wafer and I got error message "overcurrent error". Luckily nothing is damaged and I was able to resume to finish my job. I used 1.0um resist and 1.5sec exposure, hard contact, and I got 1um lines resolved fine. From lindaw at snf.stanford.edu Mon May 11 16:56:07 2009 From: lindaw at snf.stanford.edu (lindaw at snf.stanford.edu) Date: Mon, 11 May 2009 16:56:07 -0700 Subject: Problem karlsuss2 SNF 2009-05-11 16:56:06: overcurrent error during wafer load Message-ID: during wafer load, pushed wafer in and pressed enter, great whooshing sound as if there was a vacuum leak, then overcurrent error and the mask holder dropped my mask onto my wafer. Machine then prompts to press load to restart. then prompts to remove mask holder to avoid damage to the TSA. Then it is back in what appears to be normal "ready for load" display. From gsosa at snf.stanford.edu Thu May 14 08:46:15 2009 From: gsosa at snf.stanford.edu (gsosa at snf.stanford.edu) Date: Thu, 14 May 2009 08:46:15 -0700 Subject: Problem karlsuss2 SNF 2009-05-09 12:17:44: overcurrent error Message-ID: Checked and adjusted "grab Z" position for WEC. System tested OK From gsosa at snf.stanford.edu Thu May 14 08:46:21 2009 From: gsosa at snf.stanford.edu (gsosa at snf.stanford.edu) Date: Thu, 14 May 2009 08:46:21 -0700 Subject: Problem karlsuss2 SNF 2009-05-11 16:56:06: overcurrent error during wafer load Message-ID: Checked and adjusted "grab Z" position for WEC. System tested OK From laurahughes at snf.stanford.edu Fri May 15 10:11:47 2009 From: laurahughes at snf.stanford.edu (laurahughes at snf.stanford.edu) Date: Fri, 15 May 2009 10:11:47 -0700 Subject: Problem karlsuss2 SNF 2009-05-15 10:11:46: loss of vacuum with mask holder Message-ID: When I tried to load my mask this morning, the vacuum wouldn't enable (loss of vacuum at mask holder error). The mask was moderately clean... From vilanova at snf.stanford.edu Fri May 15 10:19:38 2009 From: vilanova at snf.stanford.edu (vilanova at snf.stanford.edu) Date: Fri, 15 May 2009 10:19:38 -0700 Subject: Problem karlsuss2 SNF 2009-05-15 10:11:46: loss of vacuum with mask holder Message-ID: cleaned mask holder ( Acetone/ Isropropyl) Vacuum System Good now, ok to use From gsosa at snf.stanford.edu Thu May 28 08:45:37 2009 From: gsosa at snf.stanford.edu (gsosa at snf.stanford.edu) Date: Thu, 28 May 2009 08:45:37 -0700 Subject: Problem karlsuss2 SNF 2009-03-27 23:44:50: poor alignment again Message-ID: FSE worked on system and verified WEC setup. All looked OK. Made air adjustments for hard contact pressure. tested by cycling chuck through contact separation using the alignment check button. FSE also verified BSA microscope setup using test mask. From gsosa at snf.stanford.edu Thu May 28 08:45:47 2009 From: gsosa at snf.stanford.edu (gsosa at snf.stanford.edu) Date: Thu, 28 May 2009 08:45:47 -0700 Subject: Problem karlsuss2 SNF 2009-03-26 15:54:15: Poor alignment Message-ID: FSE worked on system and verified WEC setup. All looked OK. Made air adjustments for hard contact pressure. tested by cycling chuck through contact separation using the alignment check button. FSE also verified BSA microscope setup using test mask. From gsosa at snf.stanford.edu Thu May 28 08:45:57 2009 From: gsosa at snf.stanford.edu (gsosa at snf.stanford.edu) Date: Thu, 28 May 2009 08:45:57 -0700 Subject: Problem karlsuss2 SNF 2009-04-24 15:01:04: focus loss Right side Message-ID: FSE worked on system and verified WEC setup. All looked OK. Made air adjustments for hard contact pressure. tested by cycling chuck through contact separation using the alignment check button. FSE also verified BSA microscope setup using test mask. From lilihsu at snf.stanford.edu Thu May 28 18:07:45 2009 From: lilihsu at snf.stanford.edu (lilihsu at snf.stanford.edu) Date: Thu, 28 May 2009 18:07:45 -0700 Subject: Comment karlsuss2 SNF 2009-05-28 18:07:44: Message-ID: in doing the litho quals I have noticed that recently the center of the wafers have been giving significantly better results than the edges. From panjun at snf.stanford.edu Sun May 31 21:32:25 2009 From: panjun at snf.stanford.edu (panjun at snf.stanford.edu) Date: Sun, 31 May 2009 21:32:25 -0700 Subject: Problem karlsuss2 SNF 2009-05-31 21:32:25: not able to move microscope by the arrow buttons Message-ID: