From mahnaz at snf.stanford.edu Tue Feb 14 16:16:08 2012 From: mahnaz at snf.stanford.edu (mahnaz at snf.stanford.edu) Date: Tue, 14 Feb 2012 16:16:08 -0800 Subject: Shutdown karlsuss2 SNF 2011-12-14 09:43:39: shutdown Message-ID: Si, 3612, 1 um, exposed 1.1 s hard contact 2um resolved all except center 2.5 um resolved si, 3612, 1.6 um , exposure 1.6 s hard contact 1.5 um resolved top,L,R Center and flat 2.5 and 2 um resolved. From mahnaz at snf.stanford.edu Tue Feb 14 16:19:32 2012 From: mahnaz at snf.stanford.edu (mahnaz at snf.stanford.edu) Date: Tue, 14 Feb 2012 16:19:32 -0800 Subject: Problem karlsuss2 SNF 2012-02-14 16:19:32: Wafer centering is off Message-ID: Usually we have the Mocrometer set at 10 for both X and Y I noticed the wafer will come out shifted to left with flat toward you. when I adjusted the micrometer to 13 , that took care of it. I still have not had a chance to do second layer test on the system. There was an issue before shut down. From maxms at snf.stanford.edu Thu Feb 16 20:38:01 2012 From: maxms at snf.stanford.edu (maxms at snf.stanford.edu) Date: Thu, 16 Feb 2012 20:38:01 -0800 Subject: Problem karlsuss2 SNF 2012-02-16 20:38:00: unresponsive Message-ID: after editting recipe, cannot re-select "edit parameters" to leave that menu, thus stuck in that mode From maxms at snf.stanford.edu Thu Feb 16 20:42:53 2012 From: maxms at snf.stanford.edu (maxms at snf.stanford.edu) Date: Thu, 16 Feb 2012 20:42:53 -0800 Subject: Problem karlsuss2 SNF 2012-02-16 20:42:53: also vacuum left open/running on the mask... Message-ID: From vilanova at snf.stanford.edu Fri Feb 17 08:11:41 2012 From: vilanova at snf.stanford.edu (vilanova at snf.stanford.edu) Date: Fri, 17 Feb 2012 08:11:41 -0800 Subject: Problem karlsuss2 SNF 2012-02-16 20:38:00: unresponsive Message-ID: Removed Users Mask, Reinitialized system, Loaded my mask a few times, Vacuum mask and wafer working Fine, Loaded wafers, Aligned and exposed Them , Could Not Repeat the user Error, Ok to use . PLEASE REMEMBER TO CLEAN MASK BEFORE EVERY USE., SPECIALLY THE BLANK MASKS. From vilanova at snf.stanford.edu Fri Feb 17 08:11:48 2012 From: vilanova at snf.stanford.edu (vilanova at snf.stanford.edu) Date: Fri, 17 Feb 2012 08:11:48 -0800 Subject: Problem karlsuss2 SNF 2012-02-16 20:42:53: also vacuum left open/running on the mask... Message-ID: Removed Users Mask, Reinitialized system, Loaded my mask a few times, Vacuum mask and wafer working Fine, Loaded wafers, Aligned and exposed Them , Could Not Repeat the user Error, Ok to use . PLEASE REMEMBER TO CLEAN MASK BEFORE EVERY USE., SPECIALLY THE BLANK MASKS.