From mahnaz at stanford.edu Mon May 3 10:44:52 2010 From: mahnaz at stanford.edu (Mahnaz Mansourpour) Date: Mon, 03 May 2010 10:44:52 -0700 Subject: FSE Visit Message-ID: <4BDF0B94.5010903@stanford.edu> hello all, I have been told that there will be a visit on Wednesday May 5th , not sue of the arrival time but please when the fse gets here, he has priority on the tools. We will work on one tool at the time. mahnaz From mahnaz at stanford.edu Fri May 14 09:40:22 2010 From: mahnaz at stanford.edu (Mahnaz Mansourpour) Date: Fri, 14 May 2010 09:40:22 -0700 Subject: alignment Message-ID: <4BED7CF6.50406@stanford.edu> Hello all, There is an intermittent alignment issues with both pieces and 4" wafers. I have send all the complains to Karlsuss and asked for a field service engineer visit. As I have mentioned last week, they did not get a chance to spend too much time on the tool because it took too much time to trouble shoot KS1. But I like to remind every one that when we tested the system we did not see the issues but the system was flagged by me in February for the alignment issue so I am aware of it. mahnaz From shott at stanford.edu Wed May 19 14:07:33 2010 From: shott at stanford.edu (John Shott) Date: Wed, 19 May 2010 14:07:33 -0700 Subject: Alignment check .... Message-ID: <4BF45315.8030309@stanford.edu> Karl Suss community: Linda Whittelsey made the following detailed comment on Coral about use of the "alignment check" button on the Karl Suss alignment tools. As I thought this was a thoughtful and well written set of instructions by one of our most experienced lab members and because not all of you may be in the habit of reading comments under the Maintenance panel, I thought that I'd take the liberty (with her permission, of course) of sending this out the the "normal" Karl Suss mailing list. My guess is that some of you may not be aware of this use of the "alignment check" feature and may find this posting of use in achieving more consistently good alignments. Here are Linda's comments: > I exposed 8 4" wafers. The alignment is spot on. When I align, I check the alignment using the "alignment check" button directly below the "exposure" button. This brings the wafer into soft/hard contact (depending on the program chosen), and any shift can be seen and corrected for by pressing the "alignment check" button to release and re align to adjust for any shift. Repeat until you are satisfied with the alignment, then hit expose while wafers are aligned in contact with the mask. If you are using the "align cont/exp" button (above the arrow buttons) to check your alignment, and then hit expose, you may see a shift, but only after development. I advise trying to do the pieces and use the "alignment check" button to check alignment before exposure. Hope that helps. > > Happy aligning, John From mahnaz at stanford.edu Fri May 21 10:53:20 2010 From: mahnaz at stanford.edu (Mahnaz Mansourpour) Date: Fri, 21 May 2010 10:53:20 -0700 Subject: Good Information Message-ID: <4BF6C890.5040201@stanford.edu> Hello all, I will be on vacation next week so here are some information on the tool in general which I hope to explain little more details. I will put a copy of it in the lab and when Uli is back we will add it to our training procedure. Let me explain to you the differences between the three buttons, Align Cont/Exp, Alignment *Check and Exposure key and this may refresh things. * 1. The Align Cont/Exp. key is used to bring the wafer into Contact from the Alignment gap and/or back to the Alignment gap from Contact. 2. The Alignment Check key is used after the alignment of the mask and wafer, it brings the wafer into contact and is used in cases with exposure programs like Hard Contact or Vacuum Contact where vacuum that typically holds the wafer to the chuck is released during the process to provide a more intimate contact to the mask. This key performs the complete exposure program except for exposing the wafer. This option is convenient because one can see a shift, realign if necessary, and all of this can be done with out exposing their wafer. 3. The Exposure key is used after the alignment of the mask and wafer, brings the wafer into contact, performs the complete exposure program and exposes. There is no chance to realign is a misalignment occurred during the exposure program. As for Soft Contact misalignment issue that Tom is experiencing, the potential for a shift to occur is much, much less than that of a Hard Contact program as the wafer vacuum is present during the entire process. So Now I have two options: I like to sit next to Tom and see what is happening ( Tom knows the system very well so the chances of him doing things oddly is very little. This is an intermittent issue ( i believe that, and I have seen it) should the system be evaluated? Yes, I think so. mahnaz 5/21/10