need info for wet etching of glass

Harald Gross hgross at etec.com
Fri Dec 1 07:36:59 PST 2000


Hello,
Who has experience in wet etching of 50-100um deep microchannels (e.g.
50, 100 and 250
micron wide) in glas substrates (e.g. Pyrex)?

-Etchant / Concentration?
-Glas type?
-Etch rates?
-Mask materials?
-Cross section profile of the trench?
-Etch rates dependance on trenchwidth?
-Impact of agitation (etch rate, profile)?
-Reproducible?


Who knows anything about Electrochemical Isotropic Silicon Etching

-Beside for the fabrication of porous silicon, is this technique also
suitable
to etch trenches in silicon (to replace the difficult to control
isotropic silicon etching with HF-HNO3) and
for wafer polishing (e.g. to remove DRIE sidewall scalloping)?

-If so, how well can the process be controlled?
-Surface roughness improvement (Ra)?
-Etchant / concentration?
-Applied voltage/current?
-Silicon wafer dopant type and concentration?
-Etch rates?
-Mask materials?


Thanks very much in advance for any feedback!

Dr. Harald Gross (m/s 144270)
Multi E-Beam Technology
ETEC Systems, APPLIED MATERIALS Inc.
26460 Corporate Avenue 
Hayward, CA 94545 USA
Phone: 510-780-3744
Fax:     510-786-9438
URL: http://www.etec.com
URL: http://www.appliedmaterials.com




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