In-situ doped polysilicon

Jim McVittie mcvittie at cis.Stanford.EDU
Fri Dec 1 15:46:06 PST 2000


The old in-situ doped poly has been down for some time due to temperature
controller problems. I am going to put some time into trouble shooting it
over the next month however I would not expect it to be back up before
Febuary. It is an old furnace and it is not supported anymore by Tylan. In
the mean time, users have been using the Tystar1 for in-situ doped poly.
The one downside of this tube is that it was set up for deposition for
metal containing layer, such as Ti silicide. There have not been any metal
containing layers put into the tube for a while. However, we are talking
about doing some metal containing runs in January. If we do these runs,
contamination tests and tube clean-up (if needed will be done following
these runs.

James P. McVittie	                Senior Research Scientist
Allen Center for Integrated Systems     jmcvittie at
Stanford University             	Tel: (650) 725-3640	
Rm. 336, 330 Serra Mall			Fax: (650) 723-4659
Stanford, CA 94305-4075	

On Fri, 1 Dec 2000, Ching-Hsiang Cheng wrote:

> Dear lab members,
>   Has anyone used the doped polysilicon in our lab?  Do you know what
> is the status of the equipment?
> Ching-Hsiang

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