From rcrane at snf.stanford.edu Mon Apr 2 13:40:50 2001 From: rcrane at snf.stanford.edu (Dick Crane) Date: Mon, 02 Apr 2001 13:40:50 -0700 Subject: Loss of House Process Vacuum Message-ID: <3AC8E3D2.3590BC2E@snf.stanford.edu> The house process vacuum pump for CIS and CISX will be down for 30 minutes on Tuesday, April 4, from 0700 to 0730. A new vacuum pump is being electrically connected. The loss of house process vacuum affects vacuum wands throughout the fab, vacuum chucks in the coaters, developers, and aligners in the photolith area. Other tools may be affected. Sorry for the inconvenience, Dick Crane From rcrane at snf.stanford.edu Mon Apr 2 14:40:31 2001 From: rcrane at snf.stanford.edu (Dick Crane) Date: Mon, 02 Apr 2001 14:40:31 -0700 Subject: House vacuum correct date Message-ID: <3AC8F1CF.F914969@snf.stanford.edu> Previous email had incorrect date. The house process vacuum pump for CIS and CISX will be down for 30 minutes on Tuesday, April 3, from 0700 to 0730. A new vacuum pump is being electrically connected. The loss of house process vacuum affects vacuum wands throughout the fab, vacuum chucks in the coaters, developers, and aligners in the photolith area. Other tools may be affected. Sorry for the inconvenience, Dick Crane From lindaw at sunray.snffab.stanford.edu Wed Apr 4 11:17:58 2001 From: lindaw at sunray.snffab.stanford.edu (Linda Whittelsey) Date: Wed, 4 Apr 2001 11:17:58 -0700 (PDT) Subject: empty bottles in the pass through Message-ID: <200104041817.LAA25635@sunray.snffab.stanford.edu> Empty bottles should only be put back into the pass through from which they originated. I found two 50:1 HF bottles and a Hydrogen peroxide bottle in the left pass through. This is not where they came from. The chemicals are separated due to chemical compatability issues. Even an "empty" bottle poses an incompatability threat, as there is always some residual chemical in the empty bottles. Please put empties only in the pass through where you got them before they were empty. Thanks Linda W. From bmurray at snf.stanford.edu Wed Apr 4 15:32:17 2001 From: bmurray at snf.stanford.edu (Bill Murray) Date: Wed, 4 Apr 2001 15:32:17 -0700 (PDT) Subject: Coral Downtime Tomorrow Message-ID: Lab members, We have scheduled one hour of down time for Coral on Thursday, April 5, from 7:00am to 8:00am. We will be performing routine system maintenance on the database. Please enable any equipment that you will be using during this time before 7:00am. Thanks, Coral Development Team From bmurray at snf.stanford.edu Wed Apr 4 17:32:41 2001 From: bmurray at snf.stanford.edu (Bill Murray) Date: Wed, 4 Apr 2001 17:32:41 -0700 (PDT) Subject: Coral Downtime Rescheduled Message-ID: Lab members, We have rescheduled our Coral database maintenance for Friday instead of Thursday. Coral will be unavailable on Friday, April 6, from 6:30am to 8:00am. Please enable any equipment that you will be using during this time before 6:30am. Thanks, Coral Development Team From rcrane at snf.stanford.edu Thu Apr 5 08:47:49 2001 From: rcrane at snf.stanford.edu (Dick Crane) Date: Thu, 05 Apr 2001 08:47:49 -0700 Subject: Reminder lab meeting today 10;00 Message-ID: <3ACC93A5.53386834@snf.stanford.edu> Just a kind reminder. I wish to invite the members of the SNF community to the Labmember's meeting today, April 5, at 10:00. The agenda will include: 1.) A 30 minute presentation by Prof. Saraswat on "Cleanliness and Contamination". 2.) A review of contamination issue. 3.) Details of the SNF Community Service Plan. Thanks, see you today. Dick Crane From rcrane at snf.stanford.edu Fri Apr 6 16:12:25 2001 From: rcrane at snf.stanford.edu (Dick Crane) Date: Fri, 06 Apr 2001 16:12:25 -0700 Subject: User's meeting minutes Message-ID: <3ACE4D59.6C2C850C@snf.stanford.edu> The following are the minutes from the lab member's meeting of April 5, 2001. Thanks to Mary Tang for putting the minutes together. Dick Labmember meeting minutes -- 4/5/01 Contamination issues in the lab. Recent issues relating to potential metal and alkali ion contamination in the cleanest stations in the lab have spurred an effort to re-educate labmembers on proper cleanroom procedures. 1. Prof. Krishna Saraswat gave a presentation, originally designed for his EE410 class, on contamination issues in the cleanroom. This was videotaped and will become required viewing for new labmembers from now on. 2. Gowning and wafer handling policies in the cleanroom have been consolidated into an "operating procedure", which was distributed at the meeting. Once a few changes have been made, these policies will be posted on the website. 3. Since problems have primarily occurred at wet stations, we will have a program to require requalification at these stations. Requalification will consist of a written exam. The wet benches which will be affected are: wbdiff, wbsilicide, and wbnonmetal. We hope to extend requalification to the remaining wet benches and other stations in coming months. There will be a four-week grace period for all users who are currently qualified, after which users who have not completed the test will be removed from the qualification list. Currently qualified users will be notified by email shortly. Community Service Program. Why: There are many small tasks which collectively would make this a better place to work. Who better to define and perform these tasks than people who really use the lab? When: effective April 16. Who: anyone who logs in lab time in April will be required to perform one community service task for the month of April. How: there will be a logsheet posted near the entrance to the lab. Labmembers should choose a task from the logsheet, and perform the task, and sign off the logsheet. New tasks may be suggested. For equipment-specific tasks, contact the trainer. For general lab tasks, contact Dick. For web-related items, such as process information links, contact Mary. For the next week, we will take suggestions for tasks, which will then be posted on the logsheet. Other announcements: Welcome new staff members. Uli Thumser (in Litho area) Henry Phan (starting 4/16) Lourdes Ventura (Administrative Services Manager) Gladys Sarmiento (part-time, in Diffusion area) From sylviajs at stanford.edu Fri Apr 6 16:23:21 2001 From: sylviajs at stanford.edu (S. J. Smullin) Date: Fri, 6 Apr 2001 16:23:21 -0700 (PDT) Subject: TMAH "sieve" Message-ID: We are trying to dissolve silicon around tiny gold cubes. We want to save the squares -> we need a way to contain the squares when the silicon is gone. Any suggestions for something with a very fine mesh that won't be dissolved by TMAH? (or KOH?) I have never really observed what happens to clean room paper -- will this hold up? any advice would be great. cheers, Sylvia From cvraman at aero.ufl.edu Fri Apr 6 16:55:53 2001 From: cvraman at aero.ufl.edu (venkat) Date: Fri, 6 Apr 2001 16:55:53 -0700 Subject: Low stress PECVD nitride film. Message-ID: <003201c0bef5$1d8cde10$176540ab@EBEAM> I need to deposit a LOW STRESS (~50 - 70 MPa) PECVD nitride film of around 3300 A. The STS deposition tool in our lab is broken. If anyone knows of any outside source it would be greatly appreciated. thanks Venkat. -------------- next part -------------- An HTML attachment was scrubbed... URL: From cvraman at aero.ufl.edu Fri Apr 6 17:03:55 2001 From: cvraman at aero.ufl.edu (venkat) Date: Fri, 6 Apr 2001 17:03:55 -0700 Subject: Lithography over a 2 micron topography Message-ID: <004b01c0bef6$3cf2c7f0$176540ab@EBEAM> I need to pattern 2 micron Aluminum lines (with 2 micron spacing) down a 2 micron recess. One approach is to use SPR 220 after thinning it down a little using a solvent. If anyone has done this procedure before or has any ideas of pattering fine lines over a 2 micron topography, kindly let me know. thanks, Venkat. -------------- next part -------------- An HTML attachment was scrubbed... URL: From mtang at snf.stanford.edu Fri Apr 6 16:58:08 2001 From: mtang at snf.stanford.edu (Mary Tang) Date: Fri, 06 Apr 2001 16:58:08 -0700 Subject: TMAH "sieve" References: Message-ID: <3ACE5810.A27A3957@snf.stanford.edu> Oh, cool! Have you thought of getting one of those membrane filters from Millipore (the Durapore to Fluoropore models) and sticking it in the bottom of a glass fritted Buchner funnel? Then you could use vacuum to suck out and rinse your cubes. The pore sizes of these membrane filters is on the order of tenths of microns to microns, I think (they are used for filtering out bacteria and things of that size range.) The Dura- and Fluor- pore materials are Teflon, so are pretty impervious to anything. These membranes might be available in Chem or Bio stores (I know they stock a variety of Millipore membranes there, but not sure which varieties) and Buchner funnels and side arm flasks are available in Chem stores. The only tricky part is that we don't have an appropriate house vacuum system in the lab to run this -- but you could easily find a chemicals fume hood with a house vacuum hookup any where on campus. Mary "S. J. Smullin" wrote: > We are trying to dissolve silicon around tiny gold cubes. We want to > save the squares -> we need a way to contain the squares when the silicon > is gone. Any suggestions for something with a very fine mesh that won't be > dissolved by TMAH? (or KOH?) I have never really observed what happens to > clean room paper -- will this hold up? > > any advice would be great. > > cheers, > Sylvia -- Mary X. Tang, Ph.D. National Nanofabrication Users' Network Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at snf.stanford.edu From shott at snf.stanford.edu Sat Apr 7 09:53:42 2001 From: shott at snf.stanford.edu (John Shott) Date: Sat, 07 Apr 2001 09:53:42 -0700 Subject: Coral Enable Problems ... Message-ID: <3ACF4616.7CC66D82@snf.stanford.edu> SNF Lab Members: As a number of you are aware, Coral is not allowing people to enable and disable equipment. Although I don't yet know the specific cause, we appear to have a networking problem resulting in the inability to reach the machine that controls the interlock system. We are doing everything we can to resolve or work around this problem ... but it appears to involve networking infrastructure issues that may be beyond my skill set. Accordingly, I'm trying to find a work around and will keep you posted as soon as I know anything .... Thanks, John Sat, 9:45 a.m From shott at snf.stanford.edu Sat Apr 7 10:39:36 2001 From: shott at snf.stanford.edu (John Shott) Date: Sat, 07 Apr 2001 10:39:36 -0700 Subject: Coral Equipment Enable Status ... Message-ID: <3ACF50D8.7860DA6@snf.stanford.edu> SNF Lab Members: As you know, we are experiencing network problems that prevent the main Coral servers from communicating with the machine that actually controls the machine hardware interlocks. Accordingly, I have issued a hardware "all on" ... so that all of the green lights are ON and that all equipment should behave properly. HOWEVER, EVERYONE NEEDS TO ENABLE AND DISABLE EQUIPMENT NORMALLY IN CORAL ... this will check for proper qualification and keep appropriate activity and accounting records. When you disable equipment, you will see that your name will disappear behind the equipment name on the coral display ... but the hardware ON light will stay on. This has been done to keep the lab fully functional while we track down and resolve this problem. Please enable and disable equipment on Coral normally and do not abuse this special operational mode. Taking a page out of CHP rules which double traffic fines in a construction zone ... anyone found operating equipment which has not been properly enabled in Coral will have their April lab charges doubled. (That will include staff, supplies, equipment, overhead, etc.) Thank you for your cooperation ... have a productive weekend. John and the Coral Development Team. From mcvittie at cis.Stanford.EDU Sat Apr 7 16:20:51 2001 From: mcvittie at cis.Stanford.EDU (Jim McVittie) Date: Sat, 7 Apr 2001 16:20:51 -0700 (PDT) Subject: Lithography over a 2 micron topography In-Reply-To: <004b01c0bef6$3cf2c7f0$176540ab@EBEAM> Message-ID: Venkat, Why can't you use 1.6um of the 3612 resist and plasma etch the 2um of Al? Jim From shott at snf.stanford.edu Sun Apr 8 09:54:05 2001 From: shott at snf.stanford.edu (John Shott) Date: Sun, 08 Apr 2001 09:54:05 -0700 Subject: Coral hardware enable/disable back to normal! Message-ID: <3AD097AD.6784EF3C@snf.stanford.edu> SNF Lab Members: Mike Bell found and replaced a defective optical fiber transceiver in one of our network switches that caused the recent enable/disable problems on Coral. As this is the second such failure in the past 2 months, we will be working with 3Com to try to avoid these hardware problems in the future. Accordingly, we've re-enabled hardware interlocks and made sure that hardware enable/disable status is consistent with that shown in the Coral database. Please resume normal enable/disable operations. Thank you for your continued support, Your Coral Development Team From mahnaz at snf.stanford.edu Mon Apr 9 09:35:18 2001 From: mahnaz at snf.stanford.edu (Mahnaz Mansourpour) Date: Mon, 09 Apr 2001 09:35:18 -0700 Subject: Wet benches Message-ID: <3AD1E4C6.B49BCDE3@snf.stanford.edu> Hello all, I like to let every one know starting 4/9/01 when you are processing your wafers at any wet benches in the lab you are required to wear safety glasses with side shield. This means if you are wearing correctional lenses that has no side shield, you are required to wear the safety glasses, full face shield or goggles over it while processing at the wet benches. Students with correctional lenses can apply for one time glasses with side shield through their department. Full gear including full face shield and apron/ arm guard ( I am looking in to arm guards and I will order some as soon as possible) is required when pouring or adding chemicals. Please follow the rules and policies as meant to protect you and send your comments and suggestion to me or any other staff members. mahnaz From yenilmez at stanford.edu Mon Apr 9 14:04:08 2001 From: yenilmez at stanford.edu (Erhan Yenilmez) Date: Mon, 9 Apr 2001 14:04:08 -0700 (PDT) Subject: thick oxide In-Reply-To: <3AD1E4C6.B49BCDE3@snf.stanford.edu> Message-ID: I want to have a very thick oxide (>2micrometers) layer on silicon. I'm worried about stress effects. Is there anyone who has experimented with such oxide thickness? Thank you, Erhan ----------------------------------------------------------------- Erhan Yenilmez Ph.D. student, Dept. of Applied Physics, Stanford University voice: (650) 725-9156 (office) (650) 497-3412 (home) fax: (650) 725-9793 mail: Dept. of Applied Physics Stanford University, Stanford, CA 94305-4090 e-mail: yenilmez at stanford.edu ------------------------------------------------------------------ From sanli at piezo.Stanford.EDU Mon Apr 9 14:27:01 2001 From: sanli at piezo.Stanford.EDU (Sanli Ergun) Date: Mon, 9 Apr 2001 14:27:01 -0700 (PDT) Subject: thick oxide In-Reply-To: Message-ID: I assume you mean thermal oxide. As thermal oxide grows on both sides of the si wafer, it cancels out as grown. However, depending on the following steps you will take it may have dramatic effects on you wafer. That is, it depends on what you will do next. On Mon, 9 Apr 2001, Erhan Yenilmez wrote: > > I want to have a very thick oxide (>2micrometers) layer on silicon. > I'm worried about stress effects. > Is there anyone who has experimented with such oxide thickness? > Thank you, > Erhan > > > > ----------------------------------------------------------------- > Erhan Yenilmez > Ph.D. student, Dept. of Applied Physics, > Stanford University > > voice: (650) 725-9156 (office) > (650) 497-3412 (home) > fax: (650) 725-9793 > > mail: Dept. of Applied Physics > Stanford University, > Stanford, CA 94305-4090 > > e-mail: yenilmez at stanford.edu > ------------------------------------------------------------------ > > ________________________________________________________ Arif Sanli Ergun Engineering Research Associate E. L. Ginzton Laboratory, Room : 130, Stanford University, Stanford, CA, 94305-4085 Phone: (650) 723-8447 Fax : (650) 725-7509 www : http://piezo.stanford.edu/group/IRP/sanliIRP.html From mahnaz at snf.stanford.edu Mon Apr 9 16:17:06 2001 From: mahnaz at snf.stanford.edu (Mahnaz Mansourpour) Date: Mon, 09 Apr 2001 16:17:06 -0700 Subject: slovent bench Message-ID: <3AD242F2.1650A04F@snf.stanford.edu> To All the people who left stuff on the solvent bench in the litho area. Clean your mess by tomorrow morning, your behavior is totally unacceptable. If the stuff are not cleaned by morning I will double charge you for my time and other consequence might come your way. This is a shared facility. mahnaz -------------- next part -------------- An HTML attachment was scrubbed... URL: From AChan at sirostech.com Tue Apr 10 09:17:48 2001 From: AChan at sirostech.com (Annie Chan) Date: Tue, 10 Apr 2001 09:17:48 -0700 Subject: canceled laurel Message-ID: To all: I am not able to use Laurel on my reserve today 10:00am to 12:00pm, sorry let you know late. Thank you Annie -------------- next part -------------- An HTML attachment was scrubbed... URL: From rcrane at snf.stanford.edu Tue Apr 10 11:09:42 2001 From: rcrane at snf.stanford.edu (Dick Crane) Date: Tue, 10 Apr 2001 11:09:42 -0700 Subject: Loss of building vacuum Message-ID: <3AD34C66.CF7650F8@snf.stanford.edu> The house process vacuum system for CIS and CISX will be down for 30 minutes on Thursday, April 12, from 0730 to 0800. A new vacuum pump has been installed and is currently in use. The old pump needs to be disconnected from the chilled water line. This operation should take about a half hour. The loss of house process vacuum affects vacuum wands throughout the fab, vacuum chucks in the coaters, developers, and aligners in the photolith area. Other tools may be affected. Sorry for the inconvenience, Dick Crane From mrolandi at stanford.edu Fri Apr 13 10:37:34 2001 From: mrolandi at stanford.edu (Marco Rolandi) Date: Fri, 13 Apr 2001 10:37:34 -0700 (PDT) Subject: CR 14 etch Message-ID: Hi all, does anybody know or has anybody used before a CR 14 etch. Apparently it should etch Cr and not CrO sub 3, but I only found it cited once in literature. Thanks, Marco. ------------------------------------------------------------------------------- Marco Rolandi Graduate Student Department of Applied Physics Dai Group Department of Chemistry Stanford University Stanford, 94305 phone: (650) 725-9156 fax : (650) 725-9793 From shott at snf.stanford.edu Fri Apr 13 15:48:50 2001 From: shott at snf.stanford.edu (John Shott) Date: Fri, 13 Apr 2001 15:48:50 -0700 Subject: Progress Report Submissions ... Message-ID: <3AD78252.A817AD47@snf.stanford.edu> SNF Lab Members: It has been quite some time since we last asked all of you for an update on your projects that are being carried out in SNF. We use project reports of this sort during our semi-annual and anual reviews with the National Science Foundation (that sponsors the NNUN and is, therefore, the organization that supports the broad use of the SNF) and with the Center for Integrated Systems member companies (that provide funding that provides seed grants for a broad range of Stanford and non-Stanford academic projects). In early May, we have meetings with both NSF and with the CIS Advisory Committee and would like to be able to highlight a set of exciting research projects unserway in the SNF. Accordingly, we would like to ask each of you to provide us with a single transparency that highlights some of the exciting elements and results of your research activity. To facilitate this and to encourage a consistent style, we have attached a PowerPoint document that should make it easy to comply with this request. What you need to provide (by replacing the corresponding existing element on the attached draft PowerPoint file with your project-specific material) is: 1. A project title 2. A set of bullets and-or sub-bullets that provide a succinct summary of what you hope to achieve and interesting results thus far. These points should be geared to folks who are generally technically/scientifically aware ... but who are not necessarily aware of your specific area of research or specialty. Generally, we place the bulletized text on the left side of the foil. 3. One or two photos, SEM microphotographs, block diagrams or measured data that capture the essence of your project. Hopefully, they will cause the audience to say "Gee whiz! This is an interesting project." Generally we place these on the right side of the foil. 4. Name and affiliation for you any co-workers and appropriate advisors/bosses, etc. This generally appears at the bottom of the foil. Note: we are very careful to make sure that this is work done by others ... we never represent this as work that we did. In fact, it helps us to advertise the broad range of academic disciplines, departments, and non-Stanford organizations that are making use of this facility. When you have something to submit, it is easiest if you send it as an e-mail attachment to me (shott at snf.stanford.edu) and to Lourdes Ventura (lventura at snf.stanford.edu). We'd greatly appreciate if you could get theses foils to us no later than Tuesday, May 1. Thanks for your cooperation and assistance ... and for contributing to the long-term success of SNF. John -------------- next part -------------- A non-text attachment was scrubbed... Name: SNF_Template.ppt Type: application/vnd.ms-powerpoint Size: 117760 bytes Desc: not available URL: From jeanne.haubrich at sipix.com Mon Apr 16 20:23:38 2001 From: jeanne.haubrich at sipix.com (Jeanne Haubrich) Date: Mon, 16 Apr 2001 20:23:38 -0700 Subject: SOI wafers Message-ID: <69DAA0A45894D411A6480002A50A667911D95F@USMAIL> Does anyone know where I can get SOI wafers with a device layer of either 35, 40 or 50 microns? Is it possible to get this type of wafer without a very long lead time? Thanks, Jeanne From mmahon at NewFocus.com Tue Apr 17 11:34:41 2001 From: mmahon at NewFocus.com (Michael Mahon) Date: Tue, 17 Apr 2001 11:34:41 -0700 Subject: not using reservation on karlsuss and drytek Message-ID: the reserved time on karlsuss tomorrow Apr18 for both mmahon and lzhang WILL NOT be used. the reservation for drytek1 under lzhang will not be used either. Thanks - Mike From rcrane at snf.stanford.edu Fri Apr 20 15:11:50 2001 From: rcrane at snf.stanford.edu (Dick Crane) Date: Fri, 20 Apr 2001 15:11:50 -0700 Subject: Loss of steam heating Message-ID: <3AE0B426.69F9E34A@snf.stanford.edu> The campus steam plant has unexpectedly shut down. No steam heating is available in CIS or CISX. This loss will affect building heating including humidity control in the photolith area of the fab. No restoration time has been issued. Dick Crane From farjad at smile.stanford.edu Fri Apr 20 19:31:06 2001 From: farjad at smile.stanford.edu (Ramin Farjad) Date: Fri, 20 Apr 2001 19:31:06 -0700 Subject: Please remove my email from the list References: <3AE0B426.69F9E34A@snf.stanford.edu> Message-ID: <3AE0F0EA.87C04F3A@smile.stanford.edu> Thanks, Ramin From hongliu at snow.stanford.edu Sat Apr 21 10:21:21 2001 From: hongliu at snow.stanford.edu (Hong Liu) Date: Sat, 21 Apr 2001 10:21:21 -0700 (PDT) Subject: Please remove me from SNF labmember email list In-Reply-To: <3AE0F0EA.87C04F3A@smile.stanford.edu> Message-ID: Thanks, Hong Liu From shima at cis.Stanford.EDU Mon Apr 23 13:01:28 2001 From: shima at cis.Stanford.EDU (Akio Shima) Date: Mon, 23 Apr 2001 13:01:28 -0700 Subject: Announcement of technical seminar from Hitachi Message-ID: <01C0CBF5.834D9660@cis110-pc.Stanford.EDU> I would like to invite you to this special seminar. Date&time:May.3rd (Thursday) 16:15- Place: CIS 101 Title: " Impact of Low-K Dielectrics and barrier Metals on TDDB Lifetime of Cu Interconnects" By: Mr. Junji Noguchi, Device Development Center, Hitachi, Ltd. Japan Mr. Junji Noguchi from Hitachi, Ltd. Japan will present his latest research about Cu/Low-K interconnects reliability. He will present this topics at IRPS 2001 at Orland, Florida. His research about the same topic was also accepted in the last IRPS 2000 (held at San Jose, last May), so he can also introduce it to you there. Hope to see you there. Akio Shima Stanford University CIS Room#110 (Visiting Scientist from Device Development Center, Hitachi, Ltd. Japan) shima at cis.stanford.edu (English) a-shima at ddc.hitachi.co.jp (English& Japanese) Tel: 650-725-6811 Fax:650-725-0991 420 Via Palou Mall Stanford,CA 94305-4070 Biography: Mr.Junji Noguchi received the B.S. (1994) and the M.S. (1996) in electrical engineering from Shibaura Institute of Technology, Japan. In 1996 he joined Device Development Center, Hitachi Ltd., Tokyo, Japan, where he has been developing the multilevel metallization process technology for high speed devices, especially for metallization and reliability of copper interconnects. Title: " Impact of Low-K Dielectrics and barrier Metals on TDDB Lifetime of Cu Interconnects" (To be presented at IRPS 2001, Orland, Florida) Abstracts: Time-dependent dielectric breakdown (TDDB) in Cu metallization and the dependence on the presence of barrier metal, barrier metal thickness, the kind of barrier metals and the Low-K dielectrics, is investigated. There is a distinct difference in TDDB degradation mechanism with and without barrier metals. TDDB degradation of Cu interconnects without and with barrier metal is caused by bulk mode and CMP-surface mode, respectively. TDDB characteristics with barrier metal is almost the same for different barrier metal thickness and depends much more strongly on the electric field strength than the MIS structure. Additionally, both degradations, related to Cu-ion diffusion, are mainly caused not by thermal stress but by electrical stress. The barrier properties of Ta and TaN are better than those of TiN against Cu-ion diffusion into dielectrics, for TDDB. In the case of Low-K structure, TDDB property with barrier metal also depends on the CMP-surface. With Low-K dielectrics the electric field strength is concentrated near the CMP-surface and the TDDB lifetime reduces as K-value becomes lower. However, all low-K structure in this study are able to satisfy the 10-year TDDB reliability specifications for the capacitor. -------------- next part -------------- A non-text attachment was scrubbed... Name: Noguchi.doc Type: application/msword Size: 40960 bytes Desc: not available URL: From mahnaz at snf.stanford.edu Mon Apr 23 14:23:47 2001 From: mahnaz at snf.stanford.edu (Mahnaz Mansourpour) Date: Mon, 23 Apr 2001 14:23:47 -0700 Subject: Litho Is up Message-ID: <3AE49D63.6F0563D@snf.stanford.edu> Hi all, I want to let every one know that the business is as usual. the humidity and temperature is back to normal. sorry for not sending this earlier. mahnaz From shott at snf.stanford.edu Mon Apr 23 18:50:05 2001 From: shott at snf.stanford.edu (John Shott) Date: Mon, 23 Apr 2001 18:50:05 -0700 Subject: Reminder ... Project Reports Due by Friday. Message-ID: <3AE4DBCD.5402E434@snf.stanford.edu> SNF Lab Members: I'm getting a little worried ... at this point, I have received only 2 PowerPoint foils updating project status. Interestingly, they both come from Greg Kovacs' students ... go Greg and his students get the gold star! For the rest of you: Let me remind you that these types of report are important to our success. Folks who should certainly include project updates are: 1. Non-Stanford academic users ... NSF needs to know where there support is making a difference at institutions other than Stanford. 2. Industrial users ... same thing: NSF wants to know that their support of our operation is having a positive impact on industrial research activity. 3. User Seed Grant recipients ... the folks who provide this pool of money want to know what was done with it and to feel that the return on their investment warrants ongoing support. So, I hope that I'll be receiving a PowerPoint summary foil from each of you by Friday ... Thank you for your support, John From ebertcb at yahoo.com Mon Apr 23 19:28:48 2001 From: ebertcb at yahoo.com (Chris Ebert) Date: Mon, 23 Apr 2001 19:28:48 -0700 (PDT) Subject: Please remove me from SNF labmember email list In-Reply-To: Message-ID: <20010424022848.55309.qmail@web218.mail.yahoo.com> Thanks, Chris Ebert __________________________________________________ Do You Yahoo!? Yahoo! Auctions - buy the things you want at great prices http://auctions.yahoo.com/ From kbjung at hotmail.com Tue Apr 24 09:51:14 2001 From: kbjung at hotmail.com (KeeBum Jung) Date: Tue, 24 Apr 2001 12:51:14 -0400 Subject: Please remove me from SNF labmember email list Message-ID: Thanks. KeeBum _________________________________________________________________ Get your FREE download of MSN Explorer at http://explorer.msn.com From rcrane at snf.stanford.edu Tue Apr 24 12:19:12 2001 From: rcrane at snf.stanford.edu (Dick Crane) Date: Tue, 24 Apr 2001 12:19:12 -0700 Subject: Wetbench Safety Message-ID: <3AE5D1B0.71E30D92@snf.stanford.edu> Please, for everyone's safety, cleanup after yourself. Wetbenches need to be left clean, dry, and free of acid residue. Yesterday, 4/23/01, a labmember was sent to the Stanford Hospital Emergency Room for treatment of HF acid exposure. The exposure occurred at the non-metal wetbench. The member noticed HF crystals on the bench deck and 6:1 BOE lid. The previous user had not cleaned up after him/herself. While rising and wiping down the bench deck, the member's thumb was exposed to HF through a hole in his gloves. Calcium Gluconate Gel was applied and no long term effects are expected. Always clean up after yourself. Wetbenches are by their very nature, wet. They are particularly in need of constant attention to drips and spills. Upon completion of use, each area should be rinsed with DI and wiped dry as required. See a staff member if there are questions. Use appropriate personnel protection equipment if needed. Lets work together to keep our fab a safety and clean place to work. Thanks, Dick Crane Technical Director From AChan at sirostech.com Wed Apr 25 09:29:21 2001 From: AChan at sirostech.com (Annie Chan) Date: Wed, 25 Apr 2001 09:29:21 -0700 Subject: cancelled laurel Message-ID: > -----Original Message----- > From: Annie Chan > Sent: Tuesday, April 10, 2001 9:18 AM > To: Mahnaz (E-mail) > Cc: Lab (E-mail) > Subject: cancelled laurel > > To all: > > I am not able to use Laurel on my reserve today 4/25/01 at 10:00am to > 12:00pm, sorry let you know late. > > Thank you > Annie -------------- next part -------------- An HTML attachment was scrubbed... URL: From AChan at sirostech.com Wed Apr 25 09:32:37 2001 From: AChan at sirostech.com (Annie Chan) Date: Wed, 25 Apr 2001 09:32:37 -0700 Subject: Cancelled Laurel Message-ID: > To all: > I am not able to use Laurel on my reserve today 4/25/01 at 10:00am to > 12:00pm, sorry let you know late. > Thank you > Annie > -------------- next part -------------- An HTML attachment was scrubbed... URL: From mahnaz at snf.stanford.edu Thu Apr 26 08:14:04 2001 From: mahnaz at snf.stanford.edu (Mahnaz Mansourpour) Date: Thu, 26 Apr 2001 08:14:04 -0700 Subject: Missing a mask Message-ID: <3AE83B3B.AEE94FC1@snf.stanford.edu> Hello all, I am missing a mask that was given to me by Mary Tang after my resolution mask was broken. Some one has borrowed it from my cart, I really like to get it back as soon as possible including the paper work that goes with it. mahnaz