From rcrane at snf.stanford.edu Wed Aug 1 08:01:02 2001 From: rcrane at snf.stanford.edu (Dick Crane) Date: Wed, 01 Aug 2001 08:01:02 -0700 Subject: Lost wallet Message-ID: <3B6819AE.43DAC721@snf.stanford.edu> Good morning, A member of staff lost a black wallet yesterday afternoon around the fab area. If you find it, please return it to Dick Crane or any staff member. Thanks, Dick From mahnaz at snf.stanford.edu Wed Aug 1 14:16:26 2001 From: mahnaz at snf.stanford.edu (Mahnaz Mansourpour) Date: Wed, 01 Aug 2001 14:16:26 -0700 Subject: Lost and found Message-ID: <3B6871A9.8C266985@snf.stanford.edu> Hello all, I like to let you all know there is a lost and found in the lab, in the measurement room. Whenever we find items that we know in some way is important to you we ( staff) will put it in the Blue plastic bin. If I do get around it I will send an email but as a general rule, Do not expect an email from us. mahnaz -------------- next part -------------- An HTML attachment was scrubbed... URL: From tbilir at stanford.edu Tue Aug 7 11:19:55 2001 From: tbilir at stanford.edu (David Taner Bilir) Date: Tue, 7 Aug 2001 11:19:55 -0700 (PDT) Subject: HMDS Message-ID: Does anyone know where the bottle of HMDS is? I've looked all over lab, and I can't find it. If the lab is out, does anyone have a supply I might be able to use (<2ml) for some priming I need to do? -Taner Bilir From txx1905 at hotmail.com Tue Aug 7 21:28:08 2001 From: txx1905 at hotmail.com (David Xu) Date: Tue, 07 Aug 2001 21:28:08 -0700 Subject: conductive polymer for charge dissipation in e-beam lithography Message-ID: An HTML attachment was scrubbed... URL: From yunli at stanford.edu Wed Aug 8 08:39:41 2001 From: yunli at stanford.edu (Yun Li) Date: Wed, 8 Aug 2001 08:39:41 -0700 (PDT) Subject: conductive polymer for charge dissipation in e-beam lithography In-Reply-To: Message-ID: David, I used one polymer called PASA suitable for your purpose. Email me back then I can dig more information for you. Yun On Tue, 7 Aug 2001, David Xu wrote: > Does anyone have information about commercially available conductive > polymers that can be used with resist for e-beam lithography on quartz > wafer. > ? > Thanks. > ? > Tianzong Xu > Lightwaves2020, Inc. > > ________________________________________________________________________________ > Get your FREE download of MSN Explorer at http://explorer.msn.com > > --------------------------------------------------------- Yun Li Material Science and Engineering Stanford University Office: 218 A Mccullough Lab: Mccullough X basement. Tel: 650-723-2939 Residence: 21E Escondido Village Palo Alto CA 94305 Tel: 650-497-9321 home page: http://www.stanford.edu/~yunli Machine: http://nine.stanford.edu ---------------------------------------------------- From Jeiwei.Chang at headway.com Wed Aug 8 10:33:35 2001 From: Jeiwei.Chang at headway.com (Jeiwei Chang) Date: Wed, 8 Aug 2001 10:33:35 -0700 Subject: conductive polymer for charge dissipation in e-beam lithograp hy Message-ID: Yun, We are also interested in PASA. We like to know compatibility to our E-beam resist. Can you help us. Thank you so much. Jeiwei -----Original Message----- From: Yun Li [mailto:yunli at stanford.edu] Sent: Wednesday, August 08, 2001 8:40 AM To: David Xu Cc: labmembers at snf.stanford.edu Subject: Re: conductive polymer for charge dissipation in e-beam lithography David, I used one polymer called PASA suitable for your purpose. Email me back then I can dig more information for you. Yun On Tue, 7 Aug 2001, David Xu wrote: > Does anyone have information about commercially available conductive > polymers that can be used with resist for e-beam lithography on quartz > wafer. > ? > Thanks. > ? > Tianzong Xu > Lightwaves2020, Inc. > > ____________________________________________________________________________ ____ > Get your FREE download of MSN Explorer at http://explorer.msn.com > > --------------------------------------------------------- Yun Li Material Science and Engineering Stanford University Office: 218 A Mccullough Lab: Mccullough X basement. Tel: 650-723-2939 Residence: 21E Escondido Village Palo Alto CA 94305 Tel: 650-497-9321 home page: http://www.stanford.edu/~yunli Machine: http://nine.stanford.edu ---------------------------------------------------- From yunli at stanford.edu Wed Aug 8 16:25:41 2001 From: yunli at stanford.edu (Yun Li) Date: Wed, 8 Aug 2001 16:25:41 -0700 (PDT) Subject: conductive polymer for charge dissipation in e-beam lithograp hy In-Reply-To: Message-ID: David, PASA stands for Poly Aniline Sulfonic Acid A comapny in Japan is selling this product. Email is kyg00375 at niftyserve.or.jp Tel 81-45-504-1130 fax 81-45-504-6602 Hope this work. I used PASA for a long time and it is perfect for nonconductive substrate. Once you get this product, please let me know also. Good Luck. Yun On Wed, 8 Aug 2001, Jeiwei Chang wrote: > Yun, > We are also interested in PASA. We like to know compatibility to our E-beam > resist. Can you help us. Thank you so much. > Jeiwei > > -----Original Message----- > From: Yun Li [mailto:yunli at stanford.edu] > Sent: Wednesday, August 08, 2001 8:40 AM > To: David Xu > Cc: labmembers at snf.stanford.edu > Subject: Re: conductive polymer for charge dissipation in e-beam > lithography > > > David, > > I used one polymer called PASA suitable for your purpose. Email me > back then I can dig more information for you. > > Yun > > > On Tue, 7 Aug 2001, David Xu wrote: > > > Does anyone have information about commercially available conductive > > polymers that can be used with resist for e-beam lithography on quartz > > wafer. > > ? > > Thanks. > > ? > > Tianzong Xu > > Lightwaves2020, Inc. > > > > > ____________________________________________________________________________ > ____ > > Get your FREE download of MSN Explorer at http://explorer.msn.com > > > > > > --------------------------------------------------------- > Yun Li > Material Science and Engineering > Stanford University > > Office: 218 A Mccullough Lab: Mccullough X basement. > Tel: 650-723-2939 > > > Residence: > 21E Escondido Village > Palo Alto CA 94305 > Tel: 650-497-9321 > > home page: http://www.stanford.edu/~yunli > Machine: http://nine.stanford.edu > ---------------------------------------------------- > --------------------------------------------------------- Yun Li Material Science and Engineering Stanford University Office: 218 A Mccullough Lab: Mccullough X basement. Tel: 650-723-2939 Residence: 21E Escondido Village Palo Alto CA 94305 Tel: 650-497-9321 home page: http://www.stanford.edu/~yunli Machine: http://nine.stanford.edu ---------------------------------------------------- From ethrush at snowmass.stanford.edu Thu Aug 9 10:04:58 2001 From: ethrush at snowmass.stanford.edu (Evan Thrush) Date: Thu, 09 Aug 2001 10:04:58 -0700 Subject: dektak question Message-ID: <5.1.0.14.2.20010809095807.00b0c628@snow.stanford.edu> Hello All, I want to use the dektak or some other surface profilometer to measure a film thickness to great precision. The film thickness or step height will be about 1 micron thick and I hope to measure within 10nm resolution. Is this possible? Is there some type of calibration method I can use to make this possible? Any advice or help would be appreciated. Thanks, Evan ------------------------------------------------------------------------------------------------------ Evan Thrush Stanford University; E.E. PhD Candidate CIS-X Rm. B113-21, Stanford, CA 94305-4075 Phone: (650)725-2774 E-mail: ethrush at snow.stanford.edu Fax: (650)723-4659 Homepage: http://snow.stanford.edu/~ethrush From lschloss at stanford.edu Thu Aug 9 15:48:30 2001 From: lschloss at stanford.edu (Lawrence Schloss) Date: Thu, 09 Aug 2001 15:48:30 -0700 Subject: LOL2000 lift-off Message-ID: <5.1.0.14.2.20010809154725.00a1a010@lschloss.pobox.stanford.edu> Is anyone currently using LOL2000 in their lift-off process? Thanks, Larry From frankliu at Stanford.EDU Fri Aug 10 16:56:21 2001 From: frankliu at Stanford.EDU (frankie liu) Date: Fri, 10 Aug 2001 16:56:21 -0700 (PDT) Subject: Lost notebook Message-ID: <200108102356.f7ANuLC28562@epic8.Stanford.EDU> >From frankliu Fri Aug 10 16:55:47 2001 Subject: Lost notebook To: labusers at snf Date: Fri, 10 Aug 2001 16:55:47 -0700 (PDT) X-Mailer: ELM [version 2.5 PL2] Content-Length: 348 Lost a 8.5x11 labnote book, typical clean room issue, spiral with blue lines. Last seen: next to STS and EPI area. It contains my name and data on my wafers. I have checked the lost and found area, the funny thing is that I keep my two notebooks together, one on top of the other, and the other one is where it should be. Thanks, -frankie From rcrane at snf.stanford.edu Fri Aug 10 17:16:11 2001 From: rcrane at snf.stanford.edu (Dick Crane) Date: Fri, 10 Aug 2001 17:16:11 -0700 Subject: Labmember's meeting CHANGE Message-ID: <3B74794B.F9398EB1@snf.stanford.edu> It is time for our monthly, labmember's meeting on Thursday, August 16. Please note a new time 12:00 to 1:00 and a new location CISX-338 for this meeting. The meeting will be informal in nature and will include lunch type munches. Please RSVP me so I can get a count for sandwiches. Thanks Dick Crane From yyao at intpax.com Sat Aug 11 15:53:37 2001 From: yyao at intpax.com (Yahong Yao) Date: Sat, 11 Aug 2001 17:53:37 -0500 Subject: step height measurement References: <5.1.0.14.2.20010809095807.00b0c628@snow.stanford.edu> Message-ID: <3B75B771.416C404C@intpax.com> Hello All, I want to measure trench depth between 100 um --- 500 um. It seems the dektak can only measure step height less than 60 um. Does anyone know which tool can meet my needs? Thank you in advance. Regards, Yahong Yao -- Phone: (408) 252-6410 x. 407 Mobile:(408) 718-8831 Fax: (408) 252-6430 From mahnaz at snf.stanford.edu Wed Aug 15 16:39:13 2001 From: mahnaz at snf.stanford.edu (Mahnaz Mansourpour) Date: Wed, 15 Aug 2001 16:39:13 -0700 Subject: Bond training Message-ID: <3B7B0821.F2EEB00A@snf.stanford.edu> Hello all, Sorry for the short notice, I like to let you know that Chad brubaker an staff Engineer from the Electronic Vision will be here tomorrow Thursday 8/16 in the lab starting 9 am in the morning. He is willing to do a bond training or answer any question you have in general. If you are interested in a bond training send me an email so I have an idea how many are interested. mahnaz From Farhat_Quli at SensArray.com Thu Aug 16 14:24:01 2001 From: Farhat_Quli at SensArray.com (Farhat Quli) Date: Thu, 16 Aug 2001 14:24:01 -0700 Subject: Wafer flatness Message-ID: <6B29DC48E741BE46B96884DEC25BE666089E66@uhura.sensarray.com> Hi all, Does anyone know where I can have the flatness of some 12" wafers measured? -f Farhat A. Quli Development Engineer Sensarray Corporation 47451 Fremont Bvld. Fremont, CA 94538 tel: 510-360-5662 fax: 510-360-5663 From hopcroft at snf.stanford.edu Thu Aug 16 16:04:07 2001 From: hopcroft at snf.stanford.edu (Matt Hopcroft) Date: Thu, 16 Aug 2001 16:04:07 -0700 (PDT) Subject: missing cell phone Message-ID: Hi, I seem to have misplaced my cell phone this afternoon. I thought I left it in the gowning room while I stepped out, but it is gone. It is a small blue phone in a black leather case. Any help would be appreciated! Thank you, -Matt Matt Hopcroft hopcroft at snf.stanford.edu 650.736.2380 From jmcvittie at stanford.edu Fri Aug 17 12:06:57 2001 From: jmcvittie at stanford.edu (James McVittie) Date: Fri, 17 Aug 2001 12:06:57 -0700 Subject: Hitachi E-Beam Shutdown Message-ID: <3B7D6B51.339377E2@stanford.edu> Lab Users, This message is a copy of a notice that I sent out to the E-beam users on Tuesday informing them of a tentative E-beam shutdown for about 9 days starting on September 1. We are still waiting for a reply from Hitachi before making a final decision about this date. The decision should be made by this Monday. If the September 1 start date has to be delayed, the delay will be for at least 3 weeks. Thanks, Jim McVittie ----------------------------- Subject: Tentative Date for E-beam Shut Down Date: Tue, 14 Aug 2001 10:34:49 -0700 From: James McVittie To: ebeam at snf.stanford.edu, mcvittie at snf E-Beam Users: Following up the discussion we had at the last user meeting, we have a tentative date for the E-bean shut down. As you recall from my talk, to make room for the new Raith e-beam system and the Hitachi 4160 SEM in room L104, we need to shut down the Hitachi HL-700F E-beam system for about 1 week. During this time the room would be rewired and the HL-700F support electronics will be moved to a better position in the room. It looks like a good time for this shut down is between Saturday Sept. 1 to Monday Sept. 10. If this date will cause a major disruption to your work, please let me know ASAP. As for bringing the E-beam system back up, we are planning to have a Hitachi?s E-beam support technician on standby during the week of Sept. 10 to be able to come in and help us if any problems develop. Thanks, Jim McVittie From mahnaz at snf.stanford.edu Fri Aug 17 12:07:18 2001 From: mahnaz at snf.stanford.edu (Mahnaz Mansourpour) Date: Fri, 17 Aug 2001 12:07:18 -0700 Subject: clean up Message-ID: <3B7D6B66.E7FE7D65@snf.stanford.edu> To the person whom left all the mess on the head way bench, please clean up. Whoever you are, you left beakers with chemical in them with no hazardous sheet for the last two days. I just want to know what makes you so especial? we are in a shared environment. I admit, I am tired of cleaning up and definitely tired of sending e-mail like this. I am open to comments and suggestion and the person with the best solution will be treated to a nice lunch. mahnaz -------------- next part -------------- An HTML attachment was scrubbed... URL: From rcrane at snf.stanford.edu Fri Aug 17 16:01:06 2001 From: rcrane at snf.stanford.edu (Dick Crane) Date: Fri, 17 Aug 2001 16:01:06 -0700 Subject: Fab shutdown Aug 25 Message-ID: <3B7DA232.E7DEBF3B@snf.stanford.edu> Major fab shutdown: The exhaust/scrubber system for the fab will be upgraded on Saturday, August 25. During the motor and controller changeout, most of the fab will be unavailable for use. Any equipment using exhaust air service or toxic or pyrophoric gases must be shut down. See attached list for details. The photolithography area is unaffected and can be used all day. All wet benches, furnaces, and etchers will be disabled. Hot pots will be turned off by midnight for cooling and draining. Gases will be turned off at 0700. Work on the exhaust fans should be completed by 1600. Gases will be turned on by 1700. Hot pots may be filled as soon as the exhaust sysytem is up. Check for a status posting at the fab entry door. Sorry for the inconvenience Dick -------------- next part -------------- A non-text attachment was scrubbed... Name: shutdownlist1.0.xls Type: application/msexcel Size: 14848 bytes Desc: not available URL: From jhsim at stanford.edu Tue Aug 21 02:38:41 2001 From: jhsim at stanford.edu (Jae Hoon Sim) Date: Tue, 21 Aug 2001 02:38:41 -0700 Subject: Do you have ever made Making Mylar mask using AutoCad? Message-ID: <003e01c12a25$10915100$41a00c80@Stanford.EDU> I made mylar masks. I used AutoCad for the drawing program, and then export as EPS file. Linotext, which has a high resolution printer, required EPS format. When my drawing was converted into EPS file, some problem occurred. There was some jumps in Inclined straight lines (line was not continuous). I guess that the resolution of EPS file was too low. However, I could not find any method to increase the resolution of EPS file. And, I don't have any other drawing program to use except for AutoCad. If you have ever made Mylar mask, and know how to solve this problem, please let me know. I need some help. Thanks Jae Hoon -------------- next part -------------- An HTML attachment was scrubbed... URL: From PIndermu at zyomyx.com Tue Aug 21 13:50:01 2001 From: PIndermu at zyomyx.com (Pierre-F. Indermuhle) Date: Tue, 21 Aug 2001 13:50:01 -0700 Subject: How to oxidize 1000 thick wafers Message-ID: <3B82C979.C07A1B2@zyomyx.com> Hi there I would like to oxidize wafers, which are 1000 microns thick. Gladys told me that somebody might have a special quartz boat for this purpose. Could this person contact me, please? Thanks Pierre _____________________________________________________ Pierre-F. Indermuhle Research Scientist Zyomyx Inc. 3911 Trust Way Hayward, CA. 94545 Phone: (510) 266-7509 Fax (510) 786-3832 http://www.zyomyx.com From mtang at snf.stanford.edu Tue Aug 21 15:58:39 2001 From: mtang at snf.stanford.edu (Mary Tang) Date: Tue, 21 Aug 2001 15:58:39 -0700 Subject: Do you have ever made Making Mylar mask using AutoCad? References: <003e01c12a25$10915100$41a00c80@Stanford.EDU> Message-ID: <3B82E79F.F061AE04@snf.stanford.edu> I'm not familiar with this particular problem, although have seen other problems with using AutoCAD for mask design. You might try LinkCAD, which is a nice utility for interconverting DXF, PS, GDS, and CIF file formats -- it also allows you to see your mask design. This can be purchased through Bay Technologies for about $500 (before it went commercial, it was only $25!) Several of the SNF staff have this program, so ask one of us if you would like to give it a try. Mary Jae Hoon Sim wrote: > I made mylar masks. I used AutoCad for the drawing program, and then > export as EPS file. Linotext, which has a high resolution printer, > required EPS format.When my drawing was converted into EPS file, some > problem occurred. There was some jumps in Inclined straight lines > (line was not continuous). I guess that the resolution of EPS file was > too low. However, I could not find any method to increase the > resolution of EPS file. And, I don't have any other drawing program to > use except for AutoCad. If you have ever made Mylar mask, and know how > to solve this problem, please let me know. I need some > help. Thanks Jae Hoon -------------- next part -------------- An HTML attachment was scrubbed... URL: From mtang at snf.stanford.edu Tue Aug 21 16:57:56 2001 From: mtang at snf.stanford.edu (Mary Tang) Date: Tue, 21 Aug 2001 16:57:56 -0700 Subject: [Fwd: Do you have ever made Making Mylar mask using AutoCad?] Message-ID: <3B82F584.944965BC@snf.stanford.edu> -------------- next part -------------- An embedded message was scrubbed... From: Josh Molho Subject: Re: Do you have ever made Making Mylar mask using AutoCad? Date: Tue, 21 Aug 2001 16:34:38 -0700 Size: 1737 URL: From ibrahim at stanford.edu Wed Aug 22 14:28:48 2001 From: ibrahim at stanford.edu (Nabeel Ibrahim) Date: Wed, 22 Aug 2001 14:28:48 -0700 (PDT) Subject: Complimentary Intel Developer Forum Industry Day Pass Message-ID: I have a bunch of complimentary Industry Day Passes for the Intel Developer Forum (IDF) available if you're interested. IDF takes place in downtown San Jose. I've left some passes on the desk at the main entrance at CIS and also on the table near the information kiosk on the main floor of Gates. You can also register through the web before 8/24 using the instructions listed at the end of this message. The Industry Day Pass ($99 value) gets you into next Monday's (8/27) lineup which starts at 1:30pm and includes: - Presentation on Intel Research Direction by David Tennenhouse, VP Research - Innovative PC Awards - General Interest sessions - Green Design: Technology & Environment - Ease of Use/PC Quality Roundtable - Security and Trusted Computing - Technology Showcase with 180+ exhibitors showing off their latest innovations - Evening reception in the demo showcase You'll also have access to executive keynotes that start at 8am, 8/28-8/30. A free, light breakfast will be available before each keynote. - Tues / Computing Strategy focus w/Paul Otellini, Jim Allchin - Wed / Internet Clients: Louis Burns, Frank Spindler, Ron Smith - Thurs / Infrastructure: Gadi Singer, Sean Maloney More details are on the website at: http://developer.intel.com/idf Keynote abstracts can be found at: http://www.intel94.com/idf/fall2001/p_key.asp Exhibition info at: http://www.intel94.com/idf/fall2001/p_demo.asp If you can't pick up a pass, you may pre-register using the following method: Visit http://developer.intel.com/idf Click on "register now" Click on "register online" Use the Industry Day option For the priority code, enter: IDP0 (that last digit is a zero - this is the complimentary pass rather than paying $99) Feel free to forward this info to others. Apologies if you received multiple copies of this message. Nabeel Ibrahim From mtang at snf.stanford.edu Wed Aug 22 16:08:11 2001 From: mtang at snf.stanford.edu (Mary Tang) Date: Wed, 22 Aug 2001 16:08:11 -0700 Subject: Wet Bench Shutdown Scheduling Message-ID: <3B843B5B.6778013E@snf.stanford.edu> Hello Labmembers -- In anticipation of the scrubber exhaust shutdown this (yes, this!) Saturday, we are planning to drain the acid pots and tanks in all the wet benches. We would like to start doing this Friday morning, so we can stagger the load throughout the day on the acid waste neutralization system (I heard that the builders of PacBell park staged a simultaneous "big flush" to test their waste system -- don't think it's been done to the AWN here...) So... if you need a particular wet bench, please make a reservation on it for Friday. If we don't see a reservation, we'll assume no one needs the wet bench, and we'll drain it. We'd like to have everything drained by late Friday afternoon/early evening (I admit, I'd rather be elsewhere at 6 am on Sat.), so if anyone wishes to use a wet bench tank or pot Friday evening, please contact me (as you've just volunteered to help out!) Thanks, Mary -- Mary X. Tang, Ph.D. National Nanofabrication Users' Network Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at snf.stanford.edu From mcvittie at cis.Stanford.EDU Wed Aug 22 18:29:14 2001 From: mcvittie at cis.Stanford.EDU (Jim McVittie) Date: Wed, 22 Aug 2001 18:29:14 -0700 (PDT) Subject: E-Beam Shutdown on Sept. 1 Message-ID: Sorry to have to send this message out to everyone. Some of the E-beam users did not this message went sent to ebeam at snf. E-beam Users, Sorry for the delay in finalizing our shut down plans. I was waiting for Hitachi to get back to me about being available if we have problems on restarting the system. Everything seems to be OK for shutting down between the Setpember 1st and the 9th. We going to start disconnecting the Hitachi ebeam electronics on the morning (9am) of September 1. The room modifications will be done during the week of the September 3. The plan is to have everything back together by Sunday 9th so that the pumps can be turned back on. Unfortionately, it will take a few days to get the vaccum down to where we can operate. Paul says that it will probably be Wednesday the 12th before everything is back to normal. I will keep you posted on any new developments. Thanks, Jim -------------------------------------------------------------- James P. McVittie Senior Research Scientist Allen Center for Integrated Systems jmcvittie at stanford.edu Stanford University Tel: (650) 725-3640 Rm. 336, 330 Serra Mall Fax: (650) 723-4659 Stanford, CA 94305-4075 From rcrane at snf.stanford.edu Fri Aug 24 08:12:56 2001 From: rcrane at snf.stanford.edu (Dick Crane) Date: Fri, 24 Aug 2001 08:12:56 -0700 Subject: Reminder Fab shutdown Aug 25 Message-ID: <3B866EF8.BFDE7AAD@snf.stanford.edu> Reminder Major fab shutdown: The exhaust/scrubber system for the fab will be upgraded on Saturday, August 25. During the motor and controller hangout, most of the fab will be unavailable for use. Any equipment using exhaust air service or toxic or pyrophoric gases must be shut down. See attached list for details. The photolithography area is unaffected and can be used all day. All wet benches, furnaces, and etchers will be disabled. Hot pots will be turned off on Friday as their day's use is completed. See Mary tang for details of timing. Gases will be turned off at 0700. Work on the exhaust fans should be completed by 1600. Gases will be turned on by 1700. Hot pots may be filled as soon as the exhaust system is up. Check for a status posting at the fab entry door. Sorry for the inconvenience Dick From rcrane at snf.stanford.edu Sat Aug 25 16:43:24 2001 From: rcrane at snf.stanford.edu (Dick Crane) Date: Sat, 25 Aug 2001 16:43:24 -0700 Subject: Fab is up Message-ID: <3B88381C.4AA08F43@snf.stanford.edu> The exhaust system working requiring the shut down has been completed. The fab is up and ready for use as of 1620, 8/25/01. Dick From jonkurz at stanford.edu Mon Aug 27 13:49:29 2001 From: jonkurz at stanford.edu (Jonathan Kurz) Date: Mon, 27 Aug 2001 13:49:29 -0700 (PDT) Subject: Verizon/AT&T in CIS In-Reply-To: <3B03730B.D7B767A@snf.stanford.edu> Message-ID: Hello, I'm looking for a cell phone provider with good service inside CIS (and other places, too). Has anyone had any problems recently with Verizon or AT&T? thanks, Jonathan From mahnaz at snf.stanford.edu Tue Aug 28 09:07:10 2001 From: mahnaz at snf.stanford.edu (Mahnaz Mansourpour) Date: Tue, 28 Aug 2001 09:07:10 -0700 Subject: 6:1 Message-ID: <3B8BC1AE.E40AFCFB@snf.stanford.edu> Hello all, The 6:1 is freshly poured, do not dump as we are out of 6:1 in house ( vendor's fault, they are not able to make the shipment because they are short). Tony requested an urgent delivery and chemical should be here by Thursday morning if any change I will send out an update. mahnaz From beckwith at snf.stanford.edu Tue Aug 28 09:58:58 2001 From: beckwith at snf.stanford.edu (Sharleen Beckwith) Date: Tue, 28 Aug 2001 09:58:58 -0700 Subject: old RBS system/Ken Williams equipment drawings Message-ID: Hear Ye, Hear Ye: I have in my possession the Ken Williams drawings for the old RBS system. If anyone thinks that some day they might want to resurrect this system, you should get the drawings from me and keep them in a safe place. Otherwise, these drawings will be discarded on Sept. 11. Sharleen P. S. If you had Ken Williams make equipment drawings for you, I probably have them, too. You should claim them before Sept. 11. >Delivered-To: beckwith at snf.stanford.edu >X-Sender: turgut at turgut.pobox.stanford.edu >Date: Mon, 27 Aug 2001 15:27:56 -0700 >To: Sharleen Beckwith >From: Turgut Gur >Subject: Re: RBS > >>Sharleen, > >The old RBS is gone and does not even exist anymore. So I will have >no use of the old records and drawings. But thanks for asking. > >Cheers >Turgut > >>Hi Turgut: >> >>I have drawings, etc. related to the RBS, left behind by Ken >>Williams. Ann said you might want this information. Do you? >> >>Sharleen >> >>>Delivered-To: beckwith at snf.stanford.edu >>>X-Sender: marshall at soe.stanford.edu >>>Date: Mon, 27 Aug 2001 09:48:34 -0700 >>>To: beckwith at snf.stanford.edu >>>From: Ann Marshall >>>Subject: Re: clearing out Ken Williams' file drawers >>> >>>Hi Sharleen, >>>What fun! Actually none of that sounds like stuff we need. >>>Except I'm not sure of the status of the RBS - I think it is >>>considered defunct, but if not, maybe we want to keep records of >>>anything related to it. That is actually Turgut's area, although >>>he is allegedly leaving us in November, so might not want to be >>>bothered. However you might ask him if he has any files on RBS >>>that he would want to add Ken's records to. >>> >>>I may stop by sometime to doublecheck if there's anything relevant >>>for me, or if Turgut doesn't want the RBS stuff, I might want to >>>keep track of it. >>> >>>Thanks. >>>Ann >>>-- >>>Ann Marshall >>>Laboratory for Advanced Materials >>>McCullough Building, Rm. 229 >>>Stanford University >>>Stanford, CA 94305-4045 >>>650-723-3572 >>> >>>mailto:marshall at soe.stanford.edu > > >-- > > > > >===================================================== >Turgut M. Gur, Ph.D. >Technical Director >Geballe Laboratory for Advanced Materials >McCullough Building Rm. 135 >476 Lomita Mall >Stanford University >Stanford, CA 94305-4045 >Tel: (650) 723-6597 >Fax: (650) 723-3044 >turgut at stanford.edu >http://www-lam.stanford.edu/bios/gur.html From mtang at snf.stanford.edu Tue Aug 28 13:29:18 2001 From: mtang at snf.stanford.edu (Mary Tang) Date: Tue, 28 Aug 2001 13:29:18 -0700 Subject: Critical Point Drying Message-ID: <3B8BFF1E.75CF36F0@snf.stanford.edu> Hi all -- Yianni Tousimis from Tousimis, Inc. will be giving a short, informal presentation on critical point drying in MEMS technologies. This will be held on Thursday, Aug. 30, at 2 pm in CIS room 101 (the conference room) and you are all invited. In critical point dryers, CO2 is introduced into a chamber under controlled temperature and high pressure to its triple point (supercritical stage), where there's no clear phase change between gas and liquid. This is a nifty way to dry and clean devices without worrying about stiction or surface tension of liquids. Several groups have asked that SNF acquire a critical point dryer -- here's an opportunity to learn about these systems and what they can do. Mary -- Mary X. Tang, Ph.D. National Nanofabrication Users' Network Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at snf.stanford.edu From shott at snf.stanford.edu Wed Aug 29 15:45:50 2001 From: shott at snf.stanford.edu (John Shott) Date: Wed, 29 Aug 2001 15:45:50 -0700 Subject: Pretty pictures and exciting results for NSF. Message-ID: <3B8D709E.D07896BB@snf.stanford.edu> SNF Lab Members: Our colleagues at Cornell have been asked to represent the NNUN (National Nanofabrication Users Network) at some event at NSF headquarters in Washington in the near future. To help in that regard, they would like to collect some recent photos of exciting structures and devices built in our collective facilities. Do you have any recent results that might be candidates for this purpose? I'm looking for 3 or 4 exciting projects .... In addition to the photos, we would like a handful of textual "bullet" points to give a flavor of the work. As usual, you and your organization will be fully credited with this work. Industrial and non-Stanford academic project are always of great interest at NSF ... Thanks for your cooperation, John p.s. We are nearing the season of our annual NSF review. Within the next month we will be soliciting a single PowerPoint transparency from EACH of you including a photo or two, several bullet points, and appropriate title and affiliation information. From mahnaz at snf.stanford.edu Fri Aug 31 16:51:45 2001 From: mahnaz at snf.stanford.edu (Mahnaz Mansourpour) Date: Fri, 31 Aug 2001 16:51:45 -0700 Subject: Clean up Message-ID: <3B902311.AC7DA629@snf.stanford.edu> Hello all, I really need every ones help, I have few new members that they do not have hanger and I have decided not to buy any new ones as you know the rack can not hold any new ones any way. Please put a ring around your hanger as soon as possible or your hanger will come down on Monday September 10th. As usual I am open to any help and suggestion. mahnaz -------------- next part -------------- An HTML attachment was scrubbed... URL: