conductive polymer for charge dissipation in e-beam lithograp hy

[Jeiwei Chang]

Yun,
We are also interested in PASA. We like to know compatibility to our E-beam
resist. Can you help us. Thank you so much.
Jeiwei  

-----Original Message-----
From: Yun Li [mailto:yunli at stanford.edu]
Sent: Wednesday, August 08, 2001 8:40 AM
To: David Xu
Cc: labmembers at snf.stanford.edu
Subject: Re: conductive polymer for charge dissipation in e-beam
lithography


David,

I used one polymer called PASA suitable for your purpose. Email me
back then I can dig more information for you.

Yun


On Tue, 7 Aug 2001, David Xu wrote:

> Does anyone have information about commercially available conductive
> polymers that can be used with resist for e-beam lithography on quartz
> wafer.
>  
> Thanks.
>  
> Tianzong Xu
> Lightwaves2020, Inc.
>
>
____________________________________________________________________________
____
> Get your FREE download of MSN Explorer at http://explorer.msn.com
>
>

---------------------------------------------------------
Yun Li
Material Science and Engineering
Stanford University

Office:  218 A  Mccullough    Lab: Mccullough X basement.
Tel: 650-723-2939


Residence:
21E Escondido Village
Palo Alto CA 94305
Tel: 650-497-9321

home page: http://www.stanford.edu/~yunli
Machine:   http://nine.stanford.edu
----------------------------------------------------